Johannes Eisenmenger

Person

Ulm, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for illuminating an object field of a projection exposure sy...
- Patent number 10,409,167
- Issue date Sep 10, 2019
- Carl Zeiss SMT GmbH
- Martin Endres
- G02 - OPTICS
Information Patent Grant
Lighting system of a microlithographic projection exposure system a...
- Patent number 10,274,828
- Issue date Apr 30, 2019
- Carl Zeiss SMT GmbH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for controlling positioning of multiple adjustabl...
- Patent number 10,018,803
- Issue date Jul 10, 2018
- Carl Zeiss SMT GmbH
- Jan Horn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lighting system of a microlithographic projection exposure system a...
- Patent number 9,977,334
- Issue date May 22, 2018
- Carl Zeiss SMT GmbH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical component
- Patent number 9,915,872
- Issue date Mar 13, 2018
- Carl Zeiss SMT GmbH
- Johannes Eisenmenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lighting system of a microlithographic projection exposure system a...
- Patent number 9,910,360
- Issue date Mar 6, 2018
- Carl Zeiss SMT GmbH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,897,925
- Issue date Feb 20, 2018
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror array
- Patent number 9,874,819
- Issue date Jan 23, 2018
- Carl Zeiss SMT GmbH
- Stig Bieling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monitor system for determining orientations of mirror elements and...
- Patent number 9,563,129
- Issue date Feb 7, 2017
- Carl Zeiss SMT GmbH
- Johannes Wangler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system for a microlithographic projection exposure apparatus
- Patent number 9,535,331
- Issue date Jan 3, 2017
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,239,229
- Issue date Jan 19, 2016
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,019,475
- Issue date Apr 28, 2015
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,013,684
- Issue date Apr 21, 2015
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,001,309
- Issue date Apr 7, 2015
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 8,339,577
- Issue date Dec 25, 2012
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20180246415
- Publication date Aug 30, 2018
- Carl Zeiss SMT GMBH
- Stefan Xalter
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
LIGHTING SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM A...
- Publication number 20180129137
- Publication date May 10, 2018
- Carl Zeiss SMT GMBH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR CONTROLLING POSITIONING OF MULTIPLE ADJUSTABL...
- Publication number 20170038555
- Publication date Feb 9, 2017
- Carl Zeiss SMT GMBH
- Jan Horn
- G02 - OPTICS
Information Patent Application
LIGHTING SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM A...
- Publication number 20160357113
- Publication date Dec 8, 2016
- Carl Zeiss SMT GMBH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHTING SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM A...
- Publication number 20160349624
- Publication date Dec 1, 2016
- Carl Zeiss SMT GMBH
- Markus Deguenther
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ILLUMINATING AN OBJECT FIELD OF A PROJECTION EXPOSURE SY...
- Publication number 20160342094
- Publication date Nov 24, 2016
- Carl Zeiss SMT GMBH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR ARRAY
- Publication number 20160342095
- Publication date Nov 24, 2016
- Carl Zeiss SMT GMBH
- Stig Bieling
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20160266502
- Publication date Sep 15, 2016
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL COMPONENT
- Publication number 20160109807
- Publication date Apr 21, 2016
- Carl Zeiss SMT GMBH
- Johannes Eisenmenger
- G02 - OPTICS
Information Patent Application
OPTICAL COMPONENT
- Publication number 20160077442
- Publication date Mar 17, 2016
- Carl Zeiss SMT GMBH
- Adrian Staicu
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20150300807
- Publication date Oct 22, 2015
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Application
MONITOR SYSTEM FOR DETERMINING ORIENTATIONS OF MIRROR ELEMENTS AND...
- Publication number 20150198894
- Publication date Jul 16, 2015
- Carl Zeiss SMT GMBH
- Johannes Wangler
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20150029477
- Publication date Jan 29, 2015
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20140233006
- Publication date Aug 21, 2014
- Stefan Xalter
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20140226141
- Publication date Aug 14, 2014
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20120293784
- Publication date Nov 22, 2012
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G02 - OPTICS
Information Patent Application
OPTICAL MEASUREMENT APPARATUS FOR A PROJECTION EXPOSURE SYSTEM
- Publication number 20100079738
- Publication date Apr 1, 2010
- Carl Zeiss SMT AG
- Johannes Eisenmenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20100039629
- Publication date Feb 18, 2010
- Carl Zeiss SMT AG
- Stefan Xalter
- G02 - OPTICS

Johannes Eisenmenger

Person

Patents Grantslast 30 patents

Method for illuminating an object field of a projection exposure sy...

Lighting system of a microlithographic projection exposure system a...

Device and method for controlling positioning of multiple adjustabl...

Lighting system of a microlithographic projection exposure system a...

Optical component

Lighting system of a microlithographic projection exposure system a...

Method and device for monitoring multiple mirror arrays in an illum...

Mirror array

Monitor system for determining orientations of mirror elements and...

Optical system for a microlithographic projection exposure apparatus

Method and device for monitoring multiple mirror arrays in an illum...

Method and device for monitoring multiple mirror arrays in an illum...

Method and device for monitoring multiple mirror arrays in an illum...

Method and device for monitoring multiple mirror arrays in an illum...

Method and device for monitoring multiple mirror arrays in an illum...

Patents Applicationslast 30 patents

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

LIGHTING SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM A...

DEVICE AND METHOD FOR CONTROLLING POSITIONING OF MULTIPLE ADJUSTABL...

LIGHTING SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM A...

LIGHTING SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM A...

METHOD FOR ILLUMINATING AN OBJECT FIELD OF A PROJECTION EXPOSURE SY...

MIRROR ARRAY

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

OPTICAL COMPONENT

OPTICAL COMPONENT

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

MONITOR SYSTEM FOR DETERMINING ORIENTATIONS OF MIRROR ELEMENTS AND...

OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

OPTICAL MEASUREMENT APPARATUS FOR A PROJECTION EXPOSURE SYSTEM

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...