Johannes F. M. Westendorp

Person

Rockport, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
CVD of tantalum and tantalum nitride films from tantalum halide pre...
- Patent number 6,900,129
- Issue date May 31, 2005
- Tokyo Electron Limited
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD of Ta films from tanatalum halide precursors
- Patent number 6,413,860
- Issue date Jul 2, 2002
- Tokyo Electron Limited
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD of integrated Ta and TaNx films from tantalum halide precursors
- Patent number 6,410,432
- Issue date Jun 25, 2002
- Tokyo Electron Limited
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal CVD of TaN films from tantalum halide precursors
- Patent number 6,410,433
- Issue date Jun 25, 2002
- Tokyo Electron Limited
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treated thermal CVD of TaN films from tantalum halide precur...
- Patent number 6,268,288
- Issue date Jul 31, 2001
- Tokyo Electron Limited
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD of TaN films from tantalum halide precursors
- Patent number 6,265,311
- Issue date Jul 24, 2001
- Tokyo Electron Limited
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etch rate enhancement by background oxygen control in a...
- Patent number 6,143,144
- Issue date Nov 7, 2000
- Tokyo ElectronLimited
- Stephen N. Golovato
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CVD of tantalum and tantalum nitride films from tantalum halide pre...
- Publication number 20020013051
- Publication date Jan 31, 2002
- Tokyo Electron Limited of TBS Broadcast Center
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Johannes F. M. Westendorp

Person

Patents Grantslast 30 patents

CVD of tantalum and tantalum nitride films from tantalum halide pre...

PECVD of Ta films from tanatalum halide precursors

CVD of integrated Ta and TaNx films from tantalum halide precursors

Thermal CVD of TaN films from tantalum halide precursors

Plasma treated thermal CVD of TaN films from tantalum halide precur...

PECVD of TaN films from tantalum halide precursors

Method for etch rate enhancement by background oxygen control in a...

Patents Applicationslast 30 patents

CVD of tantalum and tantalum nitride films from tantalum halide pre...