Johannes Hubertus Josephina Moors

Person

Helmond, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus
- Patent number 12,117,736
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,846,887
- Issue date Dec 19, 2023
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,340,532
- Issue date May 24, 2022
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 11,294,291
- Issue date Apr 5, 2022
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, a projection system and a device manufactur...
- Patent number 10,310,394
- Issue date Jun 4, 2019
- ASML Netherlands B.V.
- Yuri Johannes Gabriel Van De Vijver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 10,222,702
- Issue date Mar 5, 2019
- ASML Netherlands B.V.
- Arno Jan Bleeker
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus, spectral purity filter and device manufactu...
- Patent number 10,001,709
- Issue date Jun 19, 2018
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element comprising oriented carbon nanotube sheet and litho...
- Patent number 9,897,930
- Issue date Feb 20, 2018
- ASML Netherlands B.V.
- Leonid Aizikovitch Sjmaenok
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 9,632,419
- Issue date Apr 25, 2017
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, spectral purity filter and device manufactu...
- Patent number 9,594,306
- Issue date Mar 14, 2017
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation source, lithographic apparatus, and device manufacturing...
- Patent number 9,529,283
- Issue date Dec 27, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Source-collector device, lithographic apparatus, and device manufac...
- Patent number 9,411,238
- Issue date Aug 9, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Module and method for producing extreme ultraviolet radiation
- Patent number 9,363,879
- Issue date Jun 7, 2016
- ASML Netherlands B.V.
- Tjarko Adriaan Rudolf Van Empel
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiation source with a debris mitigation system, lithographic appa...
- Patent number 9,207,548
- Issue date Dec 8, 2015
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiation source, lithographic apparatus and device manufacturing m...
- Patent number 9,164,403
- Issue date Oct 20, 2015
- ASML Netherlands B.V.
- Antonius Theodorus Wilhelmus Kempen
- B08 - CLEANING
Information Patent Grant
Method for removing a contamination layer from an optical surface a...
- Patent number 8,980,009
- Issue date Mar 17, 2015
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Grant
Radiation source, lithographic apparatus and device manufacturing m...
- Patent number 8,946,661
- Issue date Feb 3, 2015
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithographic apparatus comprising an internal sensor and a mini-rea...
- Patent number 8,928,855
- Issue date Jan 6, 2015
- ASML Netherlands B.V.
- Johannes Hubertus Josephina Moors
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Module and method for producing extreme ultraviolet radiation
- Patent number 8,901,521
- Issue date Dec 2, 2014
- ASML Netherlands B.V.
- Tjarko Adriaan Rudolf Van Empel
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Thermal conditioning system for thermal conditioning a part of a li...
- Patent number 8,610,089
- Issue date Dec 17, 2013
- ASML Netherlands B.V.
- Sjoerd Nicolaas Lambertus Donders
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Optical arrangement, in particular projection exposure apparatus fo...
- Patent number 8,585,224
- Issue date Nov 19, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus and contamination detection method
- Patent number 8,547,551
- Issue date Oct 1, 2013
- ASML Netherlands B.V.
- Anastasius Jacobus Anicetus Bruinsma
- G01 - MEASURING TESTING
Information Patent Grant
Radiation source and lithographic apparatus
- Patent number 8,507,882
- Issue date Aug 13, 2013
- ASML Netherlands B.V.
- Gerardus Hubertus Petrus Maria Swinkels
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Particle cleaning of optical elements for microlithography
- Patent number 8,477,285
- Issue date Jul 2, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus and method of manufacturing an electrostatic...
- Patent number 8,476,167
- Issue date Jul 2, 2013
- ASML Netherlands B.V.
- Hubert Adriaan Van Mierlo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithographic apparatus comprising a magnet, method for the protecti...
- Patent number 8,446,560
- Issue date May 21, 2013
- ASML Netherlands B.V.
- Johannes Hubertus Josephina Moors
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for detecting at least one contamination species...
- Patent number 8,445,873
- Issue date May 21, 2013
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G01 - MEASURING TESTING
Information Patent Grant
Source module, radiation source and lithographic apparatus
- Patent number 8,405,055
- Issue date Mar 26, 2013
- ASML Netherlands B.V.
- Dzmitry Labetski
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Optical arrangement, in particular projection exposure apparatus fo...
- Patent number 8,382,301
- Issue date Feb 26, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation system and lithographic apparatus
- Patent number 8,368,040
- Issue date Feb 5, 2013
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20240160109
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGI...
- Publication number 20230063156
- Publication date Mar 2, 2023
- ASML Holding N.V.
- Ronald Peter ALBRIGHT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND ELECTROSTATIC CLAMP DESIGNS
- Publication number 20230008474
- Publication date Jan 12, 2023
- ASML Holding N.V.
- Victor Antonio PEREZ-FALCON
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
A LITHOGRAPHIC APPARATUS
- Publication number 20220342315
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20220291591
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20210109452
- Publication date Apr 15, 2021
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20210026258
- Publication date Jan 28, 2021
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation Source
- Publication number 20180031979
- Publication date Feb 1, 2018
- ASML NETHERLANDS B.V.
- Arno Jan BLEEKER
- G02 - OPTICS
Information Patent Application
Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...
- Publication number 20170160646
- Publication date Jun 8, 2017
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS, A PROJECTION SYSTEM AND A DEVICE MANUFACTUR...
- Publication number 20170097579
- Publication date Apr 6, 2017
- ASML NETHERLANDS B.V.
- Yuri Johannes Gabriel VAN DE VIJVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODULE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION
- Publication number 20150077729
- Publication date Mar 19, 2015
- ASML NETHERLANDS B.V.
- Tjarko Adriaan Rudolf VAN EMPEL
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFAC...
- Publication number 20140375974
- Publication date Dec 25, 2014
- Andrei Mikhailovich Yakunin
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Radiation Source
- Publication number 20140253894
- Publication date Sep 11, 2014
- ASML Netherland B.V.
- Jan Bernard Plechelmus Van Schoot
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...
- Publication number 20140085619
- Publication date Mar 27, 2014
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- B82 - NANO-TECHNOLOGY
Information Patent Application
RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING M...
- Publication number 20130327955
- Publication date Dec 12, 2013
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR REMOVING A CONTAMINATION LAYER FROM AN OPTICAL SURFACE A...
- Publication number 20130186430
- Publication date Jul 25, 2013
- ASML NETHERLANDS B.V.
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Application
OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...
- Publication number 20130148200
- Publication date Jun 13, 2013
- ASML NETHERLANDS B.V.
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Application
Optical apparatus, lithographic apparatus and device manufacturing...
- Publication number 20070158579
- Publication date Jul 12, 2007
- ASML NETHERLANDS B.V.
- Johannes Hubertus Josephina Moors
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation source
- Publication number 20070152175
- Publication date Jul 5, 2007
- ASML NETHERLANDS B.V.
- Johannes Hubertus Josephina Moors
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic apparatus having a monitoring device for detecting con...
- Publication number 20070138414
- Publication date Jun 21, 2007
- ASML NETHERLANDS B.V.
- Lucas Henricus Johannes Stevens
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus and method of manufacturing an electrostatic...
- Publication number 20070139855
- Publication date Jun 21, 2007
- ASML NETHERLANDS B.V.
- Hubert Adriaan Van Mierlo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for detecting at least one contamination species...
- Publication number 20070140910
- Publication date Jun 21, 2007
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- G01 - MEASURING TESTING
Information Patent Application
RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS
- Publication number 20070125963
- Publication date Jun 7, 2007
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic apparatus comprising an electrical discharge generator...
- Publication number 20070062557
- Publication date Mar 22, 2007
- ASML NETHERLANDS B.V.
- Tatyana Victorovna Rakhimova
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic device, device manufacturing method and device manufac...
- Publication number 20060268246
- Publication date Nov 30, 2006
- ASML NETHERLANDS B.V.
- Johannes Henricus Wilhelmus Jacobs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060219950
- Publication date Oct 5, 2006
- ASML NETHERLANDS B.V.
- Levinus Pieter Bakker
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20060219931
- Publication date Oct 5, 2006
- ASML NETHERLANDS B.V.
- Jan E. Van Der Werf
- G01 - MEASURING TESTING
Information Patent Application
Multi-layer spectral purity filter, lithographic apparatus includin...
- Publication number 20060221440
- Publication date Oct 5, 2006
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, illumination system, filter system and meth...
- Publication number 20060139604
- Publication date Jun 29, 2006
- ASML NETHERLANDS B.V.
- Arnoud Cornelis Wassink
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic system, method for adapting transmission characteristi...
- Publication number 20060082751
- Publication date Apr 20, 2006
- ASML NETHERLANDS B.V.
- Johannes Hubertus Josephina Moors
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Johannes Hubertus Josephina Moors

Person

Patents Grantslast 30 patents

Lithographic apparatus

Prolonging optical element lifetime in an EUV lithography system

Prolonging optical element lifetime in an EUV lithography system

Lithographic apparatus

Lithographic apparatus, a projection system and a device manufactur...

Radiation source

Lithographic apparatus, spectral purity filter and device manufactu...

Optical element comprising oriented carbon nanotube sheet and litho...

Radiation source

Lithographic apparatus, spectral purity filter and device manufactu...

Radiation source, lithographic apparatus, and device manufacturing...

Source-collector device, lithographic apparatus, and device manufac...

Module and method for producing extreme ultraviolet radiation

Radiation source with a debris mitigation system, lithographic appa...

Radiation source, lithographic apparatus and device manufacturing m...

Method for removing a contamination layer from an optical surface a...

Radiation source, lithographic apparatus and device manufacturing m...

Lithographic apparatus comprising an internal sensor and a mini-rea...

Module and method for producing extreme ultraviolet radiation

Thermal conditioning system for thermal conditioning a part of a li...

Optical arrangement, in particular projection exposure apparatus fo...

Lithographic apparatus and contamination detection method

Radiation source and lithographic apparatus

Particle cleaning of optical elements for microlithography

Lithographic apparatus and method of manufacturing an electrostatic...

Lithographic apparatus comprising a magnet, method for the protecti...

System and method for detecting at least one contamination species...

Source module, radiation source and lithographic apparatus

Optical arrangement, in particular projection exposure apparatus fo...

Radiation system and lithographic apparatus

Patents Applicationslast 30 patents

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGI...

LITHOGRAPHIC APPARATUS AND ELECTROSTATIC CLAMP DESIGNS

A LITHOGRAPHIC APPARATUS

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

LITHOGRAPHIC APPARATUS

Radiation Source

Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...

LITHOGRAPHIC APPARATUS, A PROJECTION SYSTEM AND A DEVICE MANUFACTUR...

MODULE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION

SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFAC...

Radiation Source

Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...

RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING M...

METHOD FOR REMOVING A CONTAMINATION LAYER FROM AN OPTICAL SURFACE A...

OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...

Optical apparatus, lithographic apparatus and device manufacturing...

Radiation source

Lithographic apparatus having a monitoring device for detecting con...

Lithographic apparatus and method of manufacturing an electrostatic...

System and method for detecting at least one contamination species...

RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS

Lithographic apparatus comprising an electrical discharge generator...

Lithographic device, device manufacturing method and device manufac...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method, and device man...

Multi-layer spectral purity filter, lithographic apparatus includin...

Lithographic apparatus, illumination system, filter system and meth...

Lithographic system, method for adapting transmission characteristi...