Johannes Jacobus Matheus Baselmans

Person

Oirscho, NL

People

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140347642
- Publication date Nov 27, 2014
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140098357
- Publication date Apr 10, 2014
- ASML Netherland B.V.
- Bob STREEFKERK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140071420
- Publication date Mar 13, 2014
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20120194790
- Publication date Aug 2, 2012
- Carl Zeiss SMT AG
- Johannes Catharinus Hubertus Mulkens
- G02 - OPTICS
Information Patent Application
Illumination beam measurement
- Publication number 20070070329
- Publication date Mar 29, 2007
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus Baselmans
- G01 - MEASURING TESTING
Information Patent Application
Method and system for maskless lithography real-time pattern raster...
- Publication number 20070002419
- Publication date Jan 4, 2007
- ASML Holding N.V.
- Azat M. Latypov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060139600
- Publication date Jun 29, 2006
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Prewetting of substrate before immersion exposure
- Publication number 20060121209
- Publication date Jun 8, 2006
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, method of calibrating, and device manufactu...
- Publication number 20050006563
- Publication date Jan 13, 2005
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Johannes Jacobus Matheus Baselmans

Person

Patents Applicationslast 30 patents

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Illumination beam measurement

Method and system for maskless lithography real-time pattern raster...

Lithographic apparatus and device manufacturing method

Prewetting of substrate before immersion exposure

Lithographic apparatus, method of calibrating, and device manufactu...