Johannes Marcus Maria BELTMAN

Person

Knegsel, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology method, target and substrate
- Patent number 11,428,521
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,204,239
- Issue date Dec 21, 2021
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for reticle optimization
- Patent number 10,725,372
- Issue date Jul 28, 2020
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,718,604
- Issue date Jul 21, 2020
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,386,176
- Issue date Aug 20, 2019
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization of target arrangement and associated target
- Patent number 10,331,043
- Issue date Jun 25, 2019
- ASML Netherlands B.V.
- Henricus Wilhelmus Maria Van Buel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20230016664
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20220057192
- Publication date Feb 24, 2022
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20200348125
- Publication date Nov 5, 2020
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20190346256
- Publication date Nov 14, 2019
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR RETICLE OPTIMIZATION
- Publication number 20180011398
- Publication date Jan 11, 2018
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZATION OF TARGET ARRANGEMENT AND ASSOCIATED TARGET
- Publication number 20170176871
- Publication date Jun 22, 2017
- ASML NETHERLANDS B.V.
- Henricus Wilhelmus Maria VAN BUEL
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20160061589
- Publication date Mar 3, 2016
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING

Johannes Marcus Maria BELTMAN

Person

Patents Grantslast 30 patents

Metrology method, target and substrate

Metrology method, target and substrate

Method and apparatus for reticle optimization

Metrology method, target and substrate

Metrology method, target and substrate

Optimization of target arrangement and associated target

Patents Applicationslast 30 patents

METROLOGY METHOD, TARGET AND SUBSTRATE

METROLOGY METHOD, TARGET AND SUBSTRATE

METROLOGY METHOD, TARGET AND SUBSTRATE

METROLOGY METHOD, TARGET AND SUBSTRATE

METHOD AND APPARATUS FOR RETICLE OPTIMIZATION

OPTIMIZATION OF TARGET ARRANGEMENT AND ASSOCIATED TARGET

METROLOGY METHOD, TARGET AND SUBSTRATE