Johannes ONVLEE

Person

s-Hertogenbosch, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for adjusting prediction models between facilit...
- Patent number 11,994,848
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Johannes Onvlee
- G05 - CONTROLLING REGULATING
Information Patent Grant
Substrate support, lithographic apparatus and loading method
- Patent number 11,556,063
- Issue date Jan 17, 2023
- ASML Netherlands B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and lithographic projection method
- Patent number 10,459,354
- Issue date Oct 29, 2019
- ASML Netherlands B.V.
- Kevin Van De Ruit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for determining the position of a target stru...
- Patent number 10,444,647
- Issue date Oct 15, 2019
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle cooling by non-uniform gas flow
- Patent number 10,423,081
- Issue date Sep 24, 2019
- ASML Holding N.V.
- Thomas Venturino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gas flow optimization in reticle stage environment
- Patent number 10,031,428
- Issue date Jul 24, 2018
- ASML Netherlands B.V.
- Koen Cuypers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device support, lithographic apparatus, and method of co...
- Patent number 9,977,351
- Issue date May 22, 2018
- ASML Holding N.V.
- Earl William Ebert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Estimating deformation of a patterning device and/or a change in it...
- Patent number 9,857,694
- Issue date Jan 2, 2018
- ASML Netherlands B.V.
- Bearrach Moest
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device support, lithographic apparatus, and method of co...
- Patent number 9,766,557
- Issue date Sep 19, 2017
- ASML Holding N.V.
- Earl William Ebert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate handling apparatus and lithographic apparatus
- Patent number 9,696,633
- Issue date Jul 4, 2017
- ASML Netherlands B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, programmable patterning device and lithogra...
- Patent number 9,645,502
- Issue date May 9, 2017
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle cooling system in a lithographic apparatus
- Patent number 9,632,434
- Issue date Apr 25, 2017
- ASML Holding N.V.
- Earl William Ebert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device support, lithographic apparatus, and method of co...
- Patent number 9,632,433
- Issue date Apr 25, 2017
- ASML Holding N.V.
- Earl William Ebert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,372,412
- Issue date Jun 21, 2016
- ASML Netherlands B.V.
- Erwin John Van Zwet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, programmable patterning device and lithogra...
- Patent number 9,335,638
- Issue date May 10, 2016
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,316,926
- Issue date Apr 19, 2016
- ASML Netherlands B.V.
- Erwin John Van Zwet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,235,140
- Issue date Jan 12, 2016
- ASML Netherlands B.V.
- Erwin John Van Zwet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,134,630
- Issue date Sep 15, 2015
- ASML Netherlands B.V.
- Erwin John Van Zwet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,041,911
- Issue date May 26, 2015
- ASML Netherlands B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 8,947,641
- Issue date Feb 3, 2015
- ASML Netherlands B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated post-exposure bake track
- Patent number 8,636,458
- Issue date Jan 28, 2014
- ASML Netherlands B.V.
- Suzan L. Auer-Jongepier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus and method
- Patent number 8,576,374
- Issue date Nov 5, 2013
- ASML Netherlands B.V.
- Keith Frank Best
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, programmable patterning device and lithogra...
- Patent number 8,531,648
- Issue date Sep 10, 2013
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Controllable radiation lithographic apparatus and method
- Patent number 8,345,225
- Issue date Jan 1, 2013
- ASML Netherlands B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device manufacturing method, method for holding a patterning device...
- Patent number 7,933,000
- Issue date Apr 26, 2011
- ASML Netherlands B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,817,241
- Issue date Oct 19, 2010
- ASML Netherlands B.V.
- Suzan Leonie Auer-Jongepier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of operating a lithographic processing machine, control syst...
- Patent number 7,756,597
- Issue date Jul 13, 2010
- ASML Netherlands B.V.
- Norbertus Josephus Martinus Van Den Nieuwelaar
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Lithographic apparatus and method
- Patent number 7,714,981
- Issue date May 11, 2010
- ASML Netherlands B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, combination of lithographic apparatus and p...
- Patent number 7,679,714
- Issue date Mar 16, 2010
- ASML Netherlands B.V.
- Johannes Onvlee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,633,600
- Issue date Dec 15, 2009
- ASML Netherlands B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DATA-DRIVEN PREDICTION AND IDENTIFICATION OF FAILURE MODES BASED ON...
- Publication number 20240062356
- Publication date Feb 22, 2024
- ASML NETHERLANDS B.V.
- Huina XU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CONTAMINANT ANALYZING METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND...
- Publication number 20230137537
- Publication date May 4, 2023
- ASML Holding N.V.
- Michal Emanuel PAWLOWSKI
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS AND LOADING METHOD
- Publication number 20230134837
- Publication date May 4, 2023
- ASML NETHERLANDS B.V.
- Johannes ONVLEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR ADJUSTING PREDICTION MODELS BETWEEN FACILIT...
- Publication number 20220197264
- Publication date Jun 23, 2022
- ASML NETHERLANDS B.V.
- Johannes ONVLEE
- G05 - CONTROLLING REGULATING
Information Patent Application
METHODS AND APPARATUS FOR DETERMINING THE POSITION OF A TARGET STRU...
- Publication number 20190219936
- Publication date Jul 18, 2019
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS AND LOADING METHOD
- Publication number 20190113853
- Publication date Apr 18, 2019
- ASML NETHERLANDS B.V.
- Johannes ONVLEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC PROJECTION METHOD
- Publication number 20180095369
- Publication date Apr 5, 2018
- ASML NETHERLANDS B.V.
- Kevin VAN DE RUIT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle Cooling by Non-Uniform Gas Flow
- Publication number 20170363973
- Publication date Dec 21, 2017
- ASML Holding N.V.
- Thomas VENTURINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Patterning Device Support, Lithographic Apparatus, And Method Of Co...
- Publication number 20170307986
- Publication date Oct 26, 2017
- ASML Holding N.V.
- Earl William EBERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Patterning Device Support, Lithographic Apparatus, And Method Of Co...
- Publication number 20170160652
- Publication date Jun 8, 2017
- ASML Holding N.V.
- Earl William EBERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Estimating Deformation of a Patterning Device and/or a Change in It...
- Publication number 20170068171
- Publication date Mar 9, 2017
- ASML NETHERLANDS B.V.
- Bearrach MOEST
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20150370177
- Publication date Dec 24, 2015
- ASML NETHERLANDS B.V.
- Erwin John VAN ZWET
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Gas Flow Optimization in Reticle Stage Environment
- Publication number 20150355557
- Publication date Dec 10, 2015
- ASML NETHERLANDS B.V.
- Koen CUYPERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Patterning Device Support, Lithographic Apparatus, And Method Of Co...
- Publication number 20150301456
- Publication date Oct 22, 2015
- ASML Holding N.V.
- Earl William EBERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle Cooling System In A Lithographic Apparatus
- Publication number 20150241796
- Publication date Aug 27, 2015
- ASML Holding N.V.
- Earl William EBERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle Cleaning by Means of Sticky Surface
- Publication number 20150241797
- Publication date Aug 27, 2015
- ASML NETHERLANDS B.V.
- Johannes Onvlee
- B08 - CLEANING
Information Patent Application
Reticle Heater to Keep Reticle Heating Uniform
- Publication number 20150212432
- Publication date Jul 30, 2015
- ASML NETHERLANDS B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Heating and Cooling Systems in a Lithographic Apparatus
- Publication number 20150192856
- Publication date Jul 9, 2015
- ASML NETHERLANDS B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...
- Publication number 20140071421
- Publication date Mar 13, 2014
- ASML NETHERLANDS B.V.
- Pieter Willem Herman De Jager
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...
- Publication number 20140055764
- Publication date Feb 27, 2014
- ASML NETHERLANDS B.V.
- Pieter Willem Herman DE JAGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20130250267
- Publication date Sep 26, 2013
- ASML NETHERLANDS B.V.
- Erwin John Van Zwet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HANDLING APPARATUS AND LITHOGRAPHIC APPARATUS
- Publication number 20130021593
- Publication date Jan 24, 2013
- ASML NETHERLANDS B.V.
- Johannes Onvlee
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20120314194
- Publication date Dec 13, 2012
- ASML NETHERLANDS B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20120307223
- Publication date Dec 6, 2012
- ASML NETHERLANDS B.V.
- Erwin John Van Zwet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20120307222
- Publication date Dec 6, 2012
- Erwin John Van Zwet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...
- Publication number 20110188016
- Publication date Aug 4, 2011
- ASML NETHERLANDS B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20100178612
- Publication date Jul 15, 2010
- ASML NETHERLANDS B.V.
- Johannes ONVLEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND ALIGNMENT METHOD
- Publication number 20100060869
- Publication date Mar 11, 2010
- ASML NETHERLANDS B.V.
- Oleg Viacheslavovich Voznyi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Controllable radiation lithographic apparatus and method
- Publication number 20100045954
- Publication date Feb 25, 2010
- ASML NETHERLANDS B.V.
- Johannes ONVLEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20090237635
- Publication date Sep 24, 2009
- ASML NETHERLANDS B.V.
- Keith Frank Best
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Johannes ONVLEE

Person

Patents Grantslast 30 patents

Systems and methods for adjusting prediction models between facilit...

Substrate support, lithographic apparatus and loading method

Lithographic apparatus and lithographic projection method

Methods and apparatus for determining the position of a target stru...

Reticle cooling by non-uniform gas flow

Gas flow optimization in reticle stage environment

Patterning device support, lithographic apparatus, and method of co...

Estimating deformation of a patterning device and/or a change in it...

Patterning device support, lithographic apparatus, and method of co...

Substrate handling apparatus and lithographic apparatus

Lithographic apparatus, programmable patterning device and lithogra...

Reticle cooling system in a lithographic apparatus

Patterning device support, lithographic apparatus, and method of co...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, programmable patterning device and lithogra...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and method

Integrated post-exposure bake track

Lithographic apparatus and method

Lithographic apparatus, programmable patterning device and lithogra...

Controllable radiation lithographic apparatus and method

Device manufacturing method, method for holding a patterning device...

Lithographic apparatus and device manufacturing method

Method of operating a lithographic processing machine, control syst...

Lithographic apparatus and method

Lithographic apparatus, combination of lithographic apparatus and p...

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

DATA-DRIVEN PREDICTION AND IDENTIFICATION OF FAILURE MODES BASED ON...

CONTAMINANT ANALYZING METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND...

SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS AND LOADING METHOD

SYSTEMS AND METHODS FOR ADJUSTING PREDICTION MODELS BETWEEN FACILIT...

METHODS AND APPARATUS FOR DETERMINING THE POSITION OF A TARGET STRU...

SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS AND LOADING METHOD

LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC PROJECTION METHOD

Reticle Cooling by Non-Uniform Gas Flow

Patterning Device Support, Lithographic Apparatus, And Method Of Co...

Patterning Device Support, Lithographic Apparatus, And Method Of Co...

Estimating Deformation of a Patterning Device and/or a Change in It...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Gas Flow Optimization in Reticle Stage Environment

Patterning Device Support, Lithographic Apparatus, And Method Of Co...

Reticle Cooling System In A Lithographic Apparatus

Reticle Cleaning by Means of Sticky Surface

Reticle Heater to Keep Reticle Heating Uniform

Heating and Cooling Systems in a Lithographic Apparatus

LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...

LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

SUBSTRATE HANDLING APPARATUS AND LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND ALIGNMENT METHOD

Controllable radiation lithographic apparatus and method

LITHOGRAPHIC APPARATUS AND METHOD