Johannes Wangler

Person

Koenigsbronn, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Facet mirror
- Patent number 10,599,041
- Issue date Mar 24, 2020
- Carl Zeiss SMT GmbH
- Stig Bieling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus having a multi-mirr...
- Patent number 10,146,135
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Michael Layh
- G02 - OPTICS
Information Patent Grant
Illumination optical unit for EUV projection lithography
- Patent number 10,018,917
- Issue date Jul 10, 2018
- Carl Zeiss SMT GmbH
- Stig Bieling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,897,925
- Issue date Feb 20, 2018
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Assembly for a projection exposure apparatus for EUV projection lit...
- Patent number 9,791,784
- Issue date Oct 17, 2017
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for a microlithographic projection exposure app...
- Patent number 9,575,414
- Issue date Feb 21, 2017
- Carl Zeiss SMT GmbH
- Johannes Wangler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monitor system for determining orientations of mirror elements and...
- Patent number 9,563,129
- Issue date Feb 7, 2017
- Carl Zeiss SMT GmbH
- Johannes Wangler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,239,229
- Issue date Jan 19, 2016
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Illumination system for a microlithographic projection exposure app...
- Patent number 9,217,930
- Issue date Dec 22, 2015
- Carl Zeiss SMT GmbH
- Johannes Wangler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,019,475
- Issue date Apr 28, 2015
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,013,684
- Issue date Apr 21, 2015
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 9,001,309
- Issue date Apr 7, 2015
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 8,891,057
- Issue date Nov 18, 2014
- Carl Zeiss SMT GmbH
- Michael Layh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic exposure method as well as a projection exposure...
- Patent number 8,767,181
- Issue date Jul 1, 2014
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for a microlithographic projection exposure app...
- Patent number 8,730,455
- Issue date May 20, 2014
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus having a multi-mirr...
- Patent number 8,724,086
- Issue date May 13, 2014
- Carl Zeiss SMT GmbH
- Michael Layh
- G02 - OPTICS
Information Patent Grant
Optical integrator for an illumination system of a microlithographi...
- Patent number 8,520,307
- Issue date Aug 27, 2013
- Carl Zeiss SMT GmbH
- Oliver Wolf
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Illumination system for a microlithographic projection exposure app...
- Patent number 8,395,756
- Issue date Mar 12, 2013
- Carl Zeiss SMT GmbH
- Johannes Wangler
- G02 - OPTICS
Information Patent Grant
Method and device for monitoring multiple mirror arrays in an illum...
- Patent number 8,339,577
- Issue date Dec 25, 2012
- Carl Zeiss SMT GmbH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Grant
Illumination optical unit for projection lithography
- Patent number 8,294,877
- Issue date Oct 23, 2012
- Carl Zeiss SMT GmbH
- Johannes Wangler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic exposure apparatus
- Patent number 8,134,687
- Issue date Mar 13, 2012
- Carl Zeiss SMT GmbH
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for a microlithographic projection exposure app...
- Patent number 8,004,656
- Issue date Aug 23, 2011
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,977,651
- Issue date Jul 12, 2011
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical integrator for an illumination system of a microlithographi...
- Patent number 7,880,969
- Issue date Feb 1, 2011
- Carl Zeiss SMT AG
- Oliver Wolf
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Illumination system particularly for microlithography
- Patent number RE42065
- Issue date Jan 25, 2011
- Carl Zeiss SMT AG
- Martin Antoni
- 355 - Photocopying
Information Patent Grant
Microlithographic exposure method as well as a projection exposure...
- Patent number 7,847,921
- Issue date Dec 7, 2010
- Carl Zeiss SMT AG
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system particularly for microlithography
- Patent number RE41667
- Issue date Sep 14, 2010
- Carl Zeiss SMT AG
- Martin Antoni
- 250 - Radiant energy
Information Patent Grant
Illumination system for a microlithography projection exposure inst...
- Patent number 7,714,983
- Issue date May 11, 2010
- Carl Zeiss SMT AG
- Jess Koehler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical device with raster elements, and illumination system with t...
- Patent number 7,605,386
- Issue date Oct 20, 2009
- Carl Zeiss SMT AG
- Wolfgang Singer
- G02 - OPTICS
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,592,598
- Issue date Sep 22, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20180246415
- Publication date Aug 30, 2018
- Carl Zeiss SMT GMBH
- Stefan Xalter
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY
- Publication number 20170160642
- Publication date Jun 8, 2017
- Carl Zeiss SMT GMBH
- Stig Bieling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20160266502
- Publication date Sep 15, 2016
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20160077446
- Publication date Mar 17, 2016
- Carl Zeiss SMT GMBH
- Johannes Wangler
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20150300807
- Publication date Oct 22, 2015
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G01 - MEASURING TESTING
Information Patent Application
MONITOR SYSTEM FOR DETERMINING ORIENTATIONS OF MIRROR ELEMENTS AND...
- Publication number 20150198894
- Publication date Jul 16, 2015
- Carl Zeiss SMT GMBH
- Johannes Wangler
- G01 - MEASURING TESTING
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS HAVING A MULTI-MIRR...
- Publication number 20150177623
- Publication date Jun 25, 2015
- Carl Zeiss SMT GMBH
- Michael Layh
- G02 - OPTICS
Information Patent Application
ASSEMBLY FOR A PROJECTION EXPOSURE APPARATUS FOR EUV PROJECTION LIT...
- Publication number 20150062549
- Publication date Mar 5, 2015
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
FACET MIRROR
- Publication number 20150049321
- Publication date Feb 19, 2015
- Carl Zeiss SMT GMBH
- Stig Bieling
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20140233006
- Publication date Aug 21, 2014
- Stefan Xalter
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20140226141
- Publication date Aug 14, 2014
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20140211188
- Publication date Jul 31, 2014
- Carl Zeiss SMT GMBH
- Michael Layh
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20130148092
- Publication date Jun 13, 2013
- Carl Zeiss SMT GMBH
- Johannes Wangler
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATU...
- Publication number 20130077077
- Publication date Mar 28, 2013
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20120293784
- Publication date Nov 22, 2012
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY
- Publication number 20120206704
- Publication date Aug 16, 2012
- Carl Zeiss SMT GMBH
- Johannes Wangler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM FOR GENERATING A LIGHT BEAM FOR TREATING A SUBSTRATE
- Publication number 20120154895
- Publication date Jun 21, 2012
- CARL ZEISS LASER OPTICS GmbH
- Holger Muenz
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL SYSTEM FOR GENERATING A LIGHT BEAM FOR TREATING A SUBSTRATE
- Publication number 20120153189
- Publication date Jun 21, 2012
- CARL ZEISS LASER OPTICS GmbH
- Johannes Wangler
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20110285978
- Publication date Nov 24, 2011
- Carl Zeiss SMT GMBH
- Damian FIOLKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHI...
- Publication number 20110083542
- Publication date Apr 14, 2011
- Carl Zeiss SMT GMBH
- Oliver Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...
- Publication number 20110069296
- Publication date Mar 24, 2011
- Carl Zeiss SMT AG
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20100283984
- Publication date Nov 11, 2010
- Carl Zeiss SMT AG
- Michael Layh
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20100283985
- Publication date Nov 11, 2010
- Carl Zeiss SMT AG
- Michael Layh
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INST...
- Publication number 20100195077
- Publication date Aug 5, 2010
- Carl Zeiss SMT AG
- Jess Koehler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...
- Publication number 20100039629
- Publication date Feb 18, 2010
- Carl Zeiss SMT AG
- Stefan Xalter
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
- Publication number 20090316128
- Publication date Dec 24, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Application
ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED MET...
- Publication number 20090262324
- Publication date Oct 22, 2009
- Carl Zeiss SMT AG
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
- Publication number 20090073410
- Publication date Mar 19, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Application
MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...
- Publication number 20090040496
- Publication date Feb 12, 2009
- Carl Zeiss
- Toralf GRUNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHI...
- Publication number 20090021839
- Publication date Jan 22, 2009
- Carl Zeiss SMT AG
- Oliver Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Johannes Wangler

Person

Patents Grantslast 30 patents

Facet mirror

Microlithographic projection exposure apparatus having a multi-mirr...

Illumination optical unit for EUV projection lithography

Method and device for monitoring multiple mirror arrays in an illum...

Assembly for a projection exposure apparatus for EUV projection lit...

Illumination system for a microlithographic projection exposure app...

Monitor system for determining orientations of mirror elements and...

Method and device for monitoring multiple mirror arrays in an illum...

Illumination system for a microlithographic projection exposure app...

Method and device for monitoring multiple mirror arrays in an illum...

Method and device for monitoring multiple mirror arrays in an illum...

Method and device for monitoring multiple mirror arrays in an illum...

Microlithographic projection exposure apparatus

Microlithographic exposure method as well as a projection exposure...

Illumination system for a microlithographic projection exposure app...

Microlithographic projection exposure apparatus having a multi-mirr...

Optical integrator for an illumination system of a microlithographi...

Illumination system for a microlithographic projection exposure app...

Method and device for monitoring multiple mirror arrays in an illum...

Illumination optical unit for projection lithography

Illumination system of a microlithographic exposure apparatus

Illumination system for a microlithographic projection exposure app...

Illumination system particularly for microlithography

Optical integrator for an illumination system of a microlithographi...

Illumination system particularly for microlithography

Microlithographic exposure method as well as a projection exposure...

Illumination system particularly for microlithography

Illumination system for a microlithography projection exposure inst...

Optical device with raster elements, and illumination system with t...

Illumination system particularly for microlithography

Patents Applicationslast 30 patents

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

MONITOR SYSTEM FOR DETERMINING ORIENTATIONS OF MIRROR ELEMENTS AND...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS HAVING A MULTI-MIRR...

ASSEMBLY FOR A PROJECTION EXPOSURE APPARATUS FOR EUV PROJECTION LIT...

FACET MIRROR

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATU...

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY

OPTICAL SYSTEM FOR GENERATING A LIGHT BEAM FOR TREATING A SUBSTRATE

OPTICAL SYSTEM FOR GENERATING A LIGHT BEAM FOR TREATING A SUBSTRATE

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHI...

MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INST...

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUM...

ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY

ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED MET...

ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY

MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE...

OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHI...