Johannes Wilhelmus De Klerk

Person

Knegsel, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Parameter control in a lithographic apparatus using polarization
- Patent number 8,675,176
- Issue date Mar 18, 2014
- ASML Netherlands B.V.
- Marinus Johanes Maria Van Dam
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,514,365
- Issue date Aug 20, 2013
- ASML Netherlands B.V.
- Frederik Eduard De Jong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and computer pr...
- Patent number 8,068,210
- Issue date Nov 29, 2011
- ASML Netherlands B.V.
- Johannes Wilhelmus De Klerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for patterning a radiation beam, patterning device for patte...
- Patent number 7,889,316
- Issue date Feb 15, 2011
- ASML Netherlands B.V.
- Wilhelmus Petrus De Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for exposing a substrate and lithographic projection apparatus
- Patent number 7,732,110
- Issue date Jun 8, 2010
- ASML Netherlands B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and exchangeabl...
- Patent number 7,724,351
- Issue date May 25, 2010
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for exposing a substrate and lithographic projection apparatus
- Patent number 7,670,731
- Issue date Mar 2, 2010
- ASML Netherlands B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for exposing a substrate and lithographic projection apparatus
- Patent number 7,655,368
- Issue date Feb 2, 2010
- ASML Netherlands B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, excimer laser and device manufacturing method
- Patent number 7,595,863
- Issue date Sep 29, 2009
- ASML Netherlands B.V.
- Robertus Cornelis Martinus Kruif
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of reducing a wave front aberration, and computer program pr...
- Patent number 7,580,113
- Issue date Aug 25, 2009
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic projection apparatus and a device manufacturing method
- Patent number 7,511,799
- Issue date Mar 31, 2009
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and computer pr...
- Patent number 7,355,674
- Issue date Apr 8, 2008
- ASML Netherlands B.V.
- Johannes Wilhelmus De Klerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR EXPOSING A SUBSTRATE AND LITHOGRAPHIC PROJECTION APPARATUS
- Publication number 20090190115
- Publication date Jul 30, 2009
- ASML NETHERLANDS B.V.
- Jozef Maria FINDERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20080297744
- Publication date Dec 4, 2008
- ASML NETHERLANDS B.V.
- Frederik Eduard De Jong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method and computer pr...
- Publication number 20080165340
- Publication date Jul 10, 2008
- ASML NETHERLANDS B.V.
- Johannes Wilhelmus De Klerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of reducing a wave front aberration, and computer program pr...
- Publication number 20070296938
- Publication date Dec 27, 2007
- ASML NETHERLANDS B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for patterning a radiation beam, patterning device for patte...
- Publication number 20070263190
- Publication date Nov 15, 2007
- ASML NETHERLANDS B.V.
- Wilhelmus Petrus De Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic projection apparatus and a device manufacturing method
- Publication number 20070177123
- Publication date Aug 2, 2007
- ASML NETHERLANDS B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for exposing a substrate and lithographic projection apparatus
- Publication number 20070099100
- Publication date May 3, 2007
- ASML NETHERLANDS B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Parameter control in a lithographic apparatus using polarization
- Publication number 20060192149
- Publication date Aug 31, 2006
- ASML NETHERLANDS B.V.
- Marinus Johannes Maria Van Dam
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic apparatus, excimer laser and device manufacturing method
- Publication number 20060146310
- Publication date Jul 6, 2006
- ASML NETHERLANDS B.V.
- Robertus Cornelis Martinus De Kruif
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Johannes Wilhelmus De Klerk

Person

Patents Grantslast 30 patents

Parameter control in a lithographic apparatus using polarization

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method and computer pr...

Method for patterning a radiation beam, patterning device for patte...

Method for exposing a substrate and lithographic projection apparatus

Lithographic apparatus, device manufacturing method and exchangeabl...

Method for exposing a substrate and lithographic projection apparatus

Method for exposing a substrate and lithographic projection apparatus

Lithographic apparatus, excimer laser and device manufacturing method

Method of reducing a wave front aberration, and computer program pr...

Lithographic projection apparatus and a device manufacturing method

Lithographic apparatus, device manufacturing method and computer pr...

Patents Applicationslast 30 patents

METHOD FOR EXPOSING A SUBSTRATE AND LITHOGRAPHIC PROJECTION APPARATUS

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method and computer pr...

Method of reducing a wave front aberration, and computer program pr...

Method for patterning a radiation beam, patterning device for patte...

Lithographic projection apparatus and a device manufacturing method

Method for exposing a substrate and lithographic projection apparatus

Parameter control in a lithographic apparatus using polarization

Lithographic apparatus, excimer laser and device manufacturing method