Johannes Zellner

Person

Oberkochen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
EUV collector for use in an EUV projection exposure apparatus
- Patent number 10,578,972
- Issue date Mar 3, 2020
- Carl Zeiss SMT GmbH
- Holger Kierey
- G02 - OPTICS
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 9,372,411
- Issue date Jun 21, 2016
- Carl Zeiss SMT GmbH
- Johannes Zellner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective for microlithography
- Patent number 9,304,408
- Issue date Apr 5, 2016
- Carl Zeiss SMT GmbH
- Johannes Zellner
- G02 - OPTICS
Information Patent Grant
Microlithographic imaging optical system including multiple mirrors
- Patent number 9,195,145
- Issue date Nov 24, 2015
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
Imaging optical system and illumination optical system
- Patent number 9,182,578
- Issue date Nov 10, 2015
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
Imaging optics and projection exposure installation for microlithog...
- Patent number 9,057,964
- Issue date Jun 16, 2015
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
Microlithographic imaging optical system including multiple mirrors
- Patent number 8,873,122
- Issue date Oct 28, 2014
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
Projection objective for microlithography
- Patent number 8,629,972
- Issue date Jan 14, 2014
- Carl Zeiss SMT GmbH
- Johannes Zellner
- G02 - OPTICS
Information Patent Grant
Projection objective
- Patent number 8,027,022
- Issue date Sep 27, 2011
- Carl Zeiss SMT GmbH
- Johannes Zellner
- G02 - OPTICS
Information Patent Grant
Illumination system and microlithographic projection exposure appar...
- Patent number 7,999,917
- Issue date Aug 16, 2011
- Carl Zeiss SMT GmbH
- Johannes Zellner
- G02 - OPTICS
Information Patent Grant
Symmetrical objective having four lens groups for microlithography
- Patent number 7,697,211
- Issue date Apr 13, 2010
- Carl Zeiss SMT AG
- David R. Shafer
- G02 - OPTICS
Information Patent Grant
Projection objective
- Patent number 7,557,902
- Issue date Jul 7, 2009
- Carl Zeiss SMT AG
- Udo Dinger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical component, comprising a material with a predetermined homog...
- Patent number 7,524,072
- Issue date Apr 28, 2009
- Carl Zeiss SMT AG
- Timo Laufer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Projection exposure apparatus and projection optical system
- Patent number 7,477,355
- Issue date Jan 13, 2009
- Carl Zeiss SMT AG
- Jean-Noel Fehr
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL SYSTEM FOR A CAMERA AND CAMERA HAVING AN OPTICAL SYSTEM
- Publication number 20240414419
- Publication date Dec 12, 2024
- Carl-Zeiss AG
- Chang Liu
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
OPTICAL SYSTEM
- Publication number 20230333364
- Publication date Oct 19, 2023
- Carl-Zeiss AG
- Alexander Epple
- G02 - OPTICS
Information Patent Application
EUV COLLECTOR FOR USE IN AN EUV PROJECTION EXPOSURE APPARATUS
- Publication number 20190033723
- Publication date Jan 31, 2019
- Carl Zeiss SMT GMBH
- Holger Kierey
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC IMAGING OPTICAL SYSTEM INCLUDING MULTIPLE MIRRORS
- Publication number 20150022799
- Publication date Jan 22, 2015
- Carl Zeiss SMT GMBH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20140185024
- Publication date Jul 3, 2014
- Johannes Zellner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
- Publication number 20140104588
- Publication date Apr 17, 2014
- Carl Zeiss SMT GMBH
- Johannes Zellner
- G02 - OPTICS
Information Patent Application
IMAGING OPTICAL SYSTEM AND ILLUMINATION OPTICAL SYSTEM
- Publication number 20120147347
- Publication date Jun 14, 2012
- Carl Zeiss SMT GMBH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOG...
- Publication number 20120069315
- Publication date Mar 22, 2012
- Carl Zeiss SMT GMBH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOG...
- Publication number 20120069314
- Publication date Mar 22, 2012
- Carl Zeiss SMT GMBH
- Johannes Zellner
- G02 - OPTICS
Information Patent Application
IMAGING OPTICAL SYSTEM
- Publication number 20110165522
- Publication date Jul 7, 2011
- Carl Zeiss SMT GMBH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
- Publication number 20110026003
- Publication date Feb 3, 2011
- Carl Zeiss SMT AG
- Johannes Zellner
- G02 - OPTICS
Information Patent Application
SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY
- Publication number 20090080086
- Publication date Mar 26, 2009
- Carl Zeiss SMT AG
- David R. Shafer
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE
- Publication number 20090027644
- Publication date Jan 29, 2009
- Carl Zeiss SMT AG
- Johannes Zellner
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPAR...
- Publication number 20090021713
- Publication date Jan 22, 2009
- Carl Zeiss SMT AG
- Johannes Zellner
- G02 - OPTICS
Information Patent Application
Lithographic apparatus and method
- Publication number 20080073596
- Publication date Mar 27, 2008
- ASML NETHERLANDS B.V.
- Antonius Theodorus Anna Maria Derksen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Euv projection lens with mirrors made from material with differing...
- Publication number 20070035814
- Publication date Feb 15, 2007
- Udo Dinger
- G02 - OPTICS
Information Patent Application
Projection exposure apparatus and projection optical system
- Publication number 20060119822
- Publication date Jun 8, 2006
- Carl Zeiss SMT AG
- Jean-Noel Fehr
- G02 - OPTICS
Information Patent Application
Optical component, comprising a material with a predetermined homog...
- Publication number 20050185307
- Publication date Aug 25, 2005
- Carl Zeiss SMT AG
- Timo Laufer
- G02 - OPTICS

Johannes Zellner

Person

Patents Grantslast 30 patents

EUV collector for use in an EUV projection exposure apparatus

Projection objective of a microlithographic projection exposure app...

Projection objective for microlithography

Microlithographic imaging optical system including multiple mirrors

Imaging optical system and illumination optical system

Imaging optics and projection exposure installation for microlithog...

Microlithographic imaging optical system including multiple mirrors

Projection objective for microlithography

Projection objective

Illumination system and microlithographic projection exposure appar...

Symmetrical objective having four lens groups for microlithography

Projection objective

Optical component, comprising a material with a predetermined homog...

Projection exposure apparatus and projection optical system

Patents Applicationslast 30 patents

OPTICAL SYSTEM FOR A CAMERA AND CAMERA HAVING AN OPTICAL SYSTEM

OPTICAL SYSTEM

EUV COLLECTOR FOR USE IN AN EUV PROJECTION EXPOSURE APPARATUS

MICROLITHOGRAPHIC IMAGING OPTICAL SYSTEM INCLUDING MULTIPLE MIRRORS

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY

IMAGING OPTICAL SYSTEM AND ILLUMINATION OPTICAL SYSTEM

IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOG...

IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOG...

IMAGING OPTICAL SYSTEM

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY

SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY

PROJECTION OBJECTIVE

ILLUMINATION SYSTEM AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPAR...

Lithographic apparatus and method

Euv projection lens with mirrors made from material with differing...

Projection exposure apparatus and projection optical system

Optical component, comprising a material with a predetermined homog...