John Berg

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Fabrication of films having controlled stoichiometry using molecula...
- Patent number 12,037,700
- Issue date Jul 16, 2024
- PSIQUANTUM, CORP.
- Yong Liang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Fabrication of films having controlled stoichiometry using molecula...
- Patent number 11,680,337
- Issue date Jun 20, 2023
- PSIQUANTUM, CORP.
- Yong Liang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Triple-damascene interposer
- Patent number 8,913,402
- Issue date Dec 16, 2014
- American Semiconductor, Inc.
- John E. Berg
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Non-volatile electromechanical field effect devices and circuits us...
- Patent number 7,943,464
- Issue date May 17, 2011
- Nantero, Inc.
- John E. Berg
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Non-volatile electromechanical field effect devices and circuits us...
- Patent number 7,595,527
- Issue date Sep 29, 2009
- Nantero Inc.
- Claude L. Bertin
- G11 - INFORMATION STORAGE
Information Patent Grant
Non-volatile electromechanical field effect devices and circuits us...
- Patent number 7,274,064
- Issue date Sep 25, 2007
- Nanatero, Inc.
- Claude L. Bertin
- G11 - INFORMATION STORAGE
Information Patent Grant
Programmable number of metal lines and effective metal width along...
- Patent number 6,476,635
- Issue date Nov 5, 2002
- Cypress Semiconductor Corp.
- Irfan Rahim
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Method of fabricating a MOS device
- Patent number 6,436,195
- Issue date Aug 20, 2002
- Zilog, Inc.
- John A. Smythe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating a high quality thin oxide
- Patent number 6,190,973
- Issue date Feb 20, 2001
- Zilog Inc.
- John E. Berg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of eliminating gate leakage in nitrogen annealed oxides
- Patent number 6,165,846
- Issue date Dec 26, 2000
- Zilog, Inc.
- Timothy K. Carns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a MOS device
- Patent number 6,156,653
- Issue date Dec 5, 2000
- Zilog, Inc.
- John A. Smythe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating high threshold metal oxide silicon read-only-...
- Patent number 5,631,180
- Issue date May 20, 1997
- Zilog, Inc.
- Alex Gyure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High threshold metal oxide silicon read-only-memory transistors
- Patent number 5,498,896
- Issue date Mar 12, 1996
- Zilog, Inc.
- Alex Gyure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating high threshold metal oxide silicon read-only-...
- Patent number 5,389,565
- Issue date Feb 14, 1995
- Zilog, Inc.
- Alex Gyure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of eliminating metal voiding in a titanium nitride/aluminum...
- Patent number 5,338,423
- Issue date Aug 16, 1994
- Zilog, Inc.
- Gregory Hindman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ti/TiN/Ti contact metallization
- Patent number 5,317,187
- Issue date May 31, 1994
- Zilog, Inc.
- Gregory Hindman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of doping a polysilicon layer on a semiconductor wafer
- Patent number 5,244,831
- Issue date Sep 14, 1993
- Zilog, Inc.
- Gregory Hindman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ti/TiN/Ti contact metallization
- Patent number 5,240,880
- Issue date Aug 31, 1993
- Zilog, Inc.
- Gregory Hindman
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FABRICATION OF FILMS HAVING CONTROLLED STOICHIOMETRY USING MOLECULA...
- Publication number 20230349067
- Publication date Nov 2, 2023
- Psiquantum, Corp.
- Yong Liang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FABRICATION OF FILMS HAVING CONTROLLED STOICHIOMETRY USING MOLECULA...
- Publication number 20210310152
- Publication date Oct 7, 2021
- Psiquantum, Corp.
- Yong Liang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
NON-VOLATILE ELECTROMECHANICAL FIELD EFFECT DEVICES AND CIRCUITS US...
- Publication number 20100075467
- Publication date Mar 25, 2010
- Claude L. BERTIN
- G11 - INFORMATION STORAGE
Information Patent Application
Removable Card And A Mobile Wireless Communication Device
- Publication number 20090075698
- Publication date Mar 19, 2009
- Zhimin Ding
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
NON-VOLATILE ELECTROMECHANICAL FIELD EFFECT DEVICES AND CIRCUITS US...
- Publication number 20080017888
- Publication date Jan 24, 2008
- Claude L. BERTIN
- G11 - INFORMATION STORAGE
Information Patent Application
Non-volatile electromechanical field effect devices and circuits us...
- Publication number 20050237781
- Publication date Oct 27, 2005
- Nantero, Inc.
- Claude L. Bertin
- G11 - INFORMATION STORAGE
Information Patent Application
Method of fabricating a MOS device
- Publication number 20020168855
- Publication date Nov 14, 2002
- John A. Smythe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Fabrication of films having controlled stoichiometry using molecula...

Fabrication of films having controlled stoichiometry using molecula...

Triple-damascene interposer

Non-volatile electromechanical field effect devices and circuits us...

Non-volatile electromechanical field effect devices and circuits us...

Non-volatile electromechanical field effect devices and circuits us...

Programmable number of metal lines and effective metal width along...

Method of fabricating a MOS device

Method of fabricating a high quality thin oxide

Method of eliminating gate leakage in nitrogen annealed oxides

Method of fabricating a MOS device

Method of fabricating high threshold metal oxide silicon read-only-...

High threshold metal oxide silicon read-only-memory transistors

Method of fabricating high threshold metal oxide silicon read-only-...

Method of eliminating metal voiding in a titanium nitride/aluminum...

Ti/TiN/Ti contact metallization

Method of doping a polysilicon layer on a semiconductor wafer

Ti/TiN/Ti contact metallization

Patents Applicationslast 30 patents

FABRICATION OF FILMS HAVING CONTROLLED STOICHIOMETRY USING MOLECULA...

FABRICATION OF FILMS HAVING CONTROLLED STOICHIOMETRY USING MOLECULA...

NON-VOLATILE ELECTROMECHANICAL FIELD EFFECT DEVICES AND CIRCUITS US...

Removable Card And A Mobile Wireless Communication Device

NON-VOLATILE ELECTROMECHANICAL FIELD EFFECT DEVICES AND CIRCUITS US...

Non-volatile electromechanical field effect devices and circuits us...

Method of fabricating a MOS device