John C. Forster

Person

Mt. View, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Rating substrate support assemblies based on impedance circuit elec...
- Patent number 12,205,791
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Symmetric plasma source to generate pie-shaped treatment
- Patent number 12,142,458
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal oxide preclean chamber with improved selectivity and flow con...
- Patent number 12,100,576
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Smart dynamic load simulator for RF power delivery control system
- Patent number 12,080,519
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Jie Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning of SIN with CCP plasma or RPS clean
- Patent number 12,027,354
- Issue date Jul 2, 2024
- Applied Materials, Inc.
- Jothilingam Ramalingam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature detachable very high frequency (VHF) electrostatic...
- Patent number 12,014,906
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- William R. Johanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for reducing sputtering of a grounded shield...
- Patent number 11,915,917
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Alan Ritchie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning of sin with CCP plasma or RPS clean
- Patent number 11,915,918
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Jothilingam Ramalingam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,898,236
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Zhiyong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems to modulate film stress
- Patent number 11,887,818
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Tsutomu Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma source for spatial plasma enhanced atomic layer de...
- Patent number 11,823,871
- Issue date Nov 21, 2023
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma source for rotating susceptor
- Patent number 11,315,769
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shaped electrodes for improved plasma exposure from vertical plasma...
- Patent number 11,315,763
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for producing low angle depositions
- Patent number 11,170,982
- Issue date Nov 9, 2021
- Applied Materials, Inc.
- Anantha K. Subramani
- B08 - CLEANING
Information Patent Grant
Methods and systems to modulate film stress
- Patent number 11,158,489
- Issue date Oct 26, 2021
- Applied Materials, Inc.
- Tsutomu Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for depositing metal films with plasma treatment
- Patent number 11,133,155
- Issue date Sep 28, 2021
- Applied Materials, Inc.
- Daping Yao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Geometrically selective deposition of dielectric films utilizing lo...
- Patent number 11,081,318
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Kenichi Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source for rotating susceptor
- Patent number 10,903,056
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma source to generate pie shaped treatment
- Patent number 10,879,042
- Issue date Dec 29, 2020
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shaped electrodes for improved plasma exposure from vertical plasma...
- Patent number 10,763,085
- Issue date Sep 1, 2020
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for reducing sputtering of a grounded shield...
- Patent number 10,692,706
- Issue date Jun 23, 2020
- Applied Materials, Inc.
- Alan Ritchie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support for plasma etch operations
- Patent number 10,593,521
- Issue date Mar 17, 2020
- Applied Materials, Inc.
- Larry Frazier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for depositing metal films with plasma treatment
- Patent number 10,453,657
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- Daping Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lateral plasma/radical source
- Patent number 10,121,655
- Issue date Nov 6, 2018
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process kit for deposition and etching
- Patent number 10,099,245
- Issue date Oct 16, 2018
- Applied Materials, Inc.
- John Forster
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Self-ionized and inductively-coupled plasma for sputtering and resp...
- Patent number 10,047,430
- Issue date Aug 14, 2018
- Applied Materials, Inc.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck design for high temperature RF applications
- Patent number 9,984,911
- Issue date May 29, 2018
- Applied Materials, Inc.
- Ryan Hanson
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Elongated capacitively coupled plasma source for high temperature l...
- Patent number 9,721,757
- Issue date Aug 1, 2017
- Applied Materials, Inc.
- John C. Forster
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for depositing electronically conductive pasti...
- Patent number 9,666,416
- Issue date May 30, 2017
- Applied Materials, Inc.
- John C. Forster
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for improved darkspace gap design in RF sputte...
- Patent number 9,373,485
- Issue date Jun 21, 2016
- Applied Materials, Inc.
- John C. Forster
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
SMART DYNAMIC LOAD SIMULATOR FOR RF POWER DELIVERY CONTROL SYSTEM
- Publication number 20240395505
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Jie Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD...
- Publication number 20240186128
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Alan RITCHIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROTARY ELECTRICAL FEEDTHROUGH INTEGRATION FOR PROCESS CHAMBER
- Publication number 20240018646
- Publication date Jan 18, 2024
- Applied Materials, Inc.
- ANANTHA SUBRAMANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SMART DYNAMIC LOAD SIMULATOR FOR RF POWER DELIVERY CONTROL SYSTEM
- Publication number 20230411119
- Publication date Dec 21, 2023
- Applied Materials, Inc.
- Jie Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE DETACHABLE VERY HIGH FREQUENCY (VHF) ELECTROSTATIC...
- Publication number 20230162954
- Publication date May 25, 2023
- William R. JOHANSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20230122956
- Publication date Apr 20, 2023
- Zhiyong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING OF SIN WITH CCP PLASMA OR RPS CLEAN
- Publication number 20220415636
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Jothilingam Ramalingam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING OF SIN WITH CCP PLASMA OR RPS CLEAN
- Publication number 20220415637
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Jothilingam Ramalingam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...
- Publication number 20220238300
- Publication date Jul 28, 2022
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND SYSTEMS TO MODULATE FILM STRESS
- Publication number 20220028660
- Publication date Jan 27, 2022
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL OXIDE PRECLEAN CHAMBER WITH IMPROVED SELECTIVITY AND FLOW CON...
- Publication number 20210343508
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- Andrew NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Symmetric Plasma Source to Generate Pie-Shaped Treatment
- Publication number 20210210312
- Publication date Jul 8, 2021
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Source For Rotating Susceptor
- Publication number 20210166923
- Publication date Jun 3, 2021
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...
- Publication number 20210050187
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Shaped Electrodes For Improved Plasma Exposure From Vertical Plasma...
- Publication number 20200395194
- Publication date Dec 17, 2020
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD...
- Publication number 20200312640
- Publication date Oct 1, 2020
- Applied Materials, Inc.
- Alan RITCHIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PRODUCING LOW ANGLE DEPOSITIONS
- Publication number 20200051794
- Publication date Feb 13, 2020
- ANANTHA K. SUBRAMANI
- B08 - CLEANING
Information Patent Application
APPARATUS FOR DEPOSITING METAL FILMS WITH PLASMA TREATMENT
- Publication number 20200020509
- Publication date Jan 16, 2020
- Applied Materials, Inc.
- DAPING YAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERNET-BASED SEMICONDUCTOR MANUFACTURING EQUIPMENT HEALTH AND DIA...
- Publication number 20190196461
- Publication date Jun 27, 2019
- Applied Materials, Inc.
- DINESH SAIGAL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Geometrically Selective Deposition Of Dielectric Films Utilizing Lo...
- Publication number 20190189400
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- Kenichi Ohno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Shaped Electrodes For Improved Plasma Exposure From Vertical Plasma...
- Publication number 20190189404
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESP...
- Publication number 20180327893
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Source For Rotating Susceptor
- Publication number 20180330927
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods And Systems To Modulate Film Stress
- Publication number 20180130642
- Publication date May 10, 2018
- Applied Materials, Inc.
- Tsutomu Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR DEPOSITING METAL FILMS WITH PLASMA TREATMENT
- Publication number 20180012732
- Publication date Jan 11, 2018
- DAPING YAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Symmetric Plasma Source To Generate Pie Shaped Treatment
- Publication number 20170213701
- Publication date Jul 27, 2017
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Lateral Plasma/Radical Source
- Publication number 20170148626
- Publication date May 25, 2017
- Applied Materials, Inc.
- Anantha K. Subramani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Module With Slotted Ground Plate
- Publication number 20170076917
- Publication date Mar 16, 2017
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Elongated Capacitively Coupled Plasma Source For High Temperature L...
- Publication number 20160276136
- Publication date Sep 22, 2016
- Applied Materials, Inc.
- John C. Forster
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK DESIGN FOR HIGH TEMPERATURE RF APPLICATIONS
- Publication number 20160172227
- Publication date Jun 16, 2016
- Applied Materials, Inc.
- Ryan HANSON
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER

John C. Forster

Person

Patents Grantslast 30 patents

Rating substrate support assemblies based on impedance circuit elec...

Symmetric plasma source to generate pie-shaped treatment

Metal oxide preclean chamber with improved selectivity and flow con...

Smart dynamic load simulator for RF power delivery control system

Cleaning of SIN with CCP plasma or RPS clean

High temperature detachable very high frequency (VHF) electrostatic...

Methods and apparatus for reducing sputtering of a grounded shield...

Cleaning of sin with CCP plasma or RPS clean

Methods and apparatus for processing a substrate

Methods and systems to modulate film stress

Microwave plasma source for spatial plasma enhanced atomic layer de...

Plasma source for rotating susceptor

Shaped electrodes for improved plasma exposure from vertical plasma...

Methods and apparatus for producing low angle depositions

Methods and systems to modulate film stress

Apparatus for depositing metal films with plasma treatment

Geometrically selective deposition of dielectric films utilizing lo...

Plasma source for rotating susceptor

Symmetric plasma source to generate pie shaped treatment

Shaped electrodes for improved plasma exposure from vertical plasma...

Methods and apparatus for reducing sputtering of a grounded shield...

Substrate support for plasma etch operations

Apparatus for depositing metal films with plasma treatment

Lateral plasma/radical source

Process kit for deposition and etching

Self-ionized and inductively-coupled plasma for sputtering and resp...

Electrostatic chuck design for high temperature RF applications

Elongated capacitively coupled plasma source for high temperature l...

Apparatus and method for depositing electronically conductive pasti...

Apparatus and method for improved darkspace gap design in RF sputte...

Patents Applicationslast 30 patents

SMART DYNAMIC LOAD SIMULATOR FOR RF POWER DELIVERY CONTROL SYSTEM

METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD...

ROTARY ELECTRICAL FEEDTHROUGH INTEGRATION FOR PROCESS CHAMBER

SMART DYNAMIC LOAD SIMULATOR FOR RF POWER DELIVERY CONTROL SYSTEM

HIGH TEMPERATURE DETACHABLE VERY HIGH FREQUENCY (VHF) ELECTROSTATIC...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

CLEANING OF SIN WITH CCP PLASMA OR RPS CLEAN

CLEANING OF SIN WITH CCP PLASMA OR RPS CLEAN

RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...

METHODS AND SYSTEMS TO MODULATE FILM STRESS

METAL OXIDE PRECLEAN CHAMBER WITH IMPROVED SELECTIVITY AND FLOW CON...

Symmetric Plasma Source to Generate Pie-Shaped Treatment

Plasma Source For Rotating Susceptor

Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...

Shaped Electrodes For Improved Plasma Exposure From Vertical Plasma...

METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD...

METHODS AND APPARATUS FOR PRODUCING LOW ANGLE DEPOSITIONS

APPARATUS FOR DEPOSITING METAL FILMS WITH PLASMA TREATMENT

INTERNET-BASED SEMICONDUCTOR MANUFACTURING EQUIPMENT HEALTH AND DIA...

Geometrically Selective Deposition Of Dielectric Films Utilizing Lo...

Shaped Electrodes For Improved Plasma Exposure From Vertical Plasma...

SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESP...

Plasma Source For Rotating Susceptor

Methods And Systems To Modulate Film Stress

APPARATUS FOR DEPOSITING METAL FILMS WITH PLASMA TREATMENT

Symmetric Plasma Source To Generate Pie Shaped Treatment

Lateral Plasma/Radical Source

Plasma Module With Slotted Ground Plate

Elongated Capacitively Coupled Plasma Source For High Temperature L...

ELECTROSTATIC CHUCK DESIGN FOR HIGH TEMPERATURE RF APPLICATIONS