John C. Stover

Person

North Attleboro, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Particle deposition system with enhanced speed and diameter accuracy
- Patent number 6,833,028
- Issue date Dec 21, 2004
- The Scatter Works Inc.
- Craig A. Scheer
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for classifying defects occurring at or near a...
- Patent number 6,760,100
- Issue date Jul 6, 2004
- ADE Corporation
- Vladimir I. Ivakhnenko
- G01 - MEASURING TESTING
Information Patent Grant
Wafer inspection system for distinguishing pits and particles
- Patent number 6,509,965
- Issue date Jan 21, 2003
- ADE Optical Systems Corporation
- Michael E. Fossey
- G01 - MEASURING TESTING
Information Patent Grant
Method for discriminating between holes in and particles on a film...
- Patent number 6,486,946
- Issue date Nov 26, 2002
- ADE Corporation
- John C. Stover
- G01 - MEASURING TESTING
Information Patent Grant
Wafer inspection system for distinguishing pits and particles
- Patent number 6,292,259
- Issue date Sep 18, 2001
- ADE Optical Systems Corporation
- Michael E. Fossey
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for distinguishing particles from subsurface d...
- Patent number 6,169,601
- Issue date Jan 2, 2001
- ADE Optical Systems
- Yuri A. Eremin
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for identifying the material of a particle oc...
- Patent number 6,122,047
- Issue date Sep 19, 2000
- ADE Optical Systems Corporation
- John C. Stover
- G01 - MEASURING TESTING
Information Patent Grant
Wafer inspection system for distinguishing pits and particles
- Patent number 6,118,525
- Issue date Sep 12, 2000
- ADE Optical Systems Corporation
- Michael E. Fossey
- G01 - MEASURING TESTING
Information Patent Grant
Process for particle size measurement
- Patent number 6,091,493
- Issue date Jul 18, 2000
- Scatter Works, Inc.
- John C. Stover
- G01 - MEASURING TESTING
Information Patent Grant
Calibration standard for microroughness measuring instruments
- Patent number 5,955,654
- Issue date Sep 21, 1999
- VLSI Standards, Inc.
- John C. Stover
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Particle deposition system with enhanced speed and diameter accuracy
- Publication number 20050118332
- Publication date Jun 2, 2005
- The Scatter Works Inc.
- Craig A. Scheer
- G01 - MEASURING TESTING
Information Patent Application
Wafer inspection system for distinguishing pits and particles
- Publication number 20040085533
- Publication date May 6, 2004
- ADE Optical Systems Corporation
- Michael E. Fossey
- G01 - MEASURING TESTING
Information Patent Application
Wafer inspection system for distinguishing pits and particles
- Publication number 20030071992
- Publication date Apr 17, 2003
- ADE Optical Systems Corporation, a Massachusetts corporation
- Michael E. Fossey
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for classifying defects occurring at or near a...
- Publication number 20020154295
- Publication date Oct 24, 2002
- ADE Corporation
- Vladimir I. Ivakhnenko
- G01 - MEASURING TESTING
Information Patent Application
Wafer inspection system for distinguishing pits and particles
- Publication number 20010048523
- Publication date Dec 6, 2001
- ADE Optical Systems Corporation, a Massachusetts corporation
- Michael E. Fossey
- G01 - MEASURING TESTING

John C. Stover

Person

Patents Grantslast 30 patents

Particle deposition system with enhanced speed and diameter accuracy

Method and apparatus for classifying defects occurring at or near a...

Wafer inspection system for distinguishing pits and particles

Method for discriminating between holes in and particles on a film...

Wafer inspection system for distinguishing pits and particles

Method and apparatus for distinguishing particles from subsurface d...

Methods and apparatus for identifying the material of a particle oc...

Wafer inspection system for distinguishing pits and particles

Process for particle size measurement

Calibration standard for microroughness measuring instruments

Patents Applicationslast 30 patents

Particle deposition system with enhanced speed and diameter accuracy

Wafer inspection system for distinguishing pits and particles

Wafer inspection system for distinguishing pits and particles

Method and apparatus for classifying defects occurring at or near a...

Wafer inspection system for distinguishing pits and particles