John L. Nistler

Person

Martindale, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Phase-shift photomask for patterning high density features
- Patent number 6,780,568
- Issue date Aug 24, 2004
- Advanced Micron Devices, Inc.
- John L. Nistler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metallization system for use in a semiconductor component
- Patent number 6,750,544
- Issue date Jun 15, 2004
- Advanced Micro Devices
- John D. Spano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor feature having support islands
- Patent number 6,562,521
- Issue date May 13, 2003
- Advanced Micro Devices, Inc.
- John L. Nistler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Infrared inspection for determining residual films on semiconductor...
- Patent number 6,452,180
- Issue date Sep 17, 2002
- Advanced Micro Devices, Inc.
- John L. Nistler
- G01 - MEASURING TESTING
Information Patent Grant
Phase-shift photomask for patterning high density features
- Patent number 6,410,191
- Issue date Jun 25, 2002
- Advanced Micro Devices, Inc.
- John L. Nistler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multipurpose defect test structure with switchable voltage contrast...
- Patent number 6,297,644
- Issue date Oct 2, 2001
- Advanced Micro Devices, Inc.
- Richard W. Jarvis
- G01 - MEASURING TESTING
Information Patent Grant
Modifying a design layer of an integrated circuit using overlying a...
- Patent number 6,226,781
- Issue date May 1, 2001
- Advanced Micro Devices, Inc.
- John L. Nistler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and test structure for low-temperature integration of high d...
- Patent number 6,210,999
- Issue date Apr 3, 2001
- Advanced Micro Devices, Inc.
- Mark I. Gardner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining proximity effects on electrical characterist...
- Patent number 6,188,233
- Issue date Feb 13, 2001
- Advanced Micro Devices, Inc.
- Mark W. Michael
- G01 - MEASURING TESTING
Information Patent Grant
Fabrication of a non-ldd graded p-channel mosfet
- Patent number 6,096,616
- Issue date Aug 1, 2000
- Advanced Micro Devices, Inc.
- John L. Nistler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of adjusting currents on a semiconductor device having trans...
- Patent number 6,083,272
- Issue date Jul 4, 2000
- Advanced Micro Devices, Inc.
- John L. Nistler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon implantation into selective areas of a refractory metal to...
- Patent number 6,072,222
- Issue date Jun 6, 2000
- Advanced Micro Devices, Inc.
- John L. Nistler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Useable drop-in strategy for correct electrical analysis of semicon...
- Patent number 5,990,488
- Issue date Nov 23, 1999
- Advanced Micro Devices, Inc.
- John L. Nistler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Voting technique for the manufacture of defect-free printing phase...
- Patent number 5,308,722
- Issue date May 3, 1994
- Advanced Micro Devices
- John L. Nistler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

John L. Nistler

Person

Patents Grantslast 30 patents

Phase-shift photomask for patterning high density features

Metallization system for use in a semiconductor component

Semiconductor feature having support islands

Infrared inspection for determining residual films on semiconductor...

Phase-shift photomask for patterning high density features

Multipurpose defect test structure with switchable voltage contrast...

Modifying a design layer of an integrated circuit using overlying a...

Method and test structure for low-temperature integration of high d...

Method for determining proximity effects on electrical characterist...

Fabrication of a non-ldd graded p-channel mosfet

Method of adjusting currents on a semiconductor device having trans...

Silicon implantation into selective areas of a refractory metal to...

Useable drop-in strategy for correct electrical analysis of semicon...

Voting technique for the manufacture of defect-free printing phase...