John L. Sturtevant

Person

People

Patents Grantslast 30 patents

Information Patent Grant
Die yield assessment based on pattern-failure rate simulation
- Patent number 11,699,017
- Issue date Jul 11, 2023
- SIEMENS INDUSTRY SOFTWARE INC.
- Young Chang Kim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for calculating printed area metric indicative of...
- Patent number 11,270,054
- Issue date Mar 8, 2022
- SIEMENS INDUSTRY SOFTWARE INC.
- Hyejin Jin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for calculating probability of success or failure...
- Patent number 11,061,373
- Issue date Jul 13, 2021
- SIEMENS INDUSTRY SOFTWARE INC.
- Gurdaman Khaira
- G05 - CONTROLLING REGULATING
Information Patent Grant
Simulation-assisted wafer rework determination
- Patent number 10,445,452
- Issue date Oct 15, 2019
- Mentor Graphics Corporation
- John L. Sturtevant
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Contour alignment for model calibration
- Patent number 8,607,168
- Issue date Dec 10, 2013
- Mentor Graphics Corporation
- Ir Kusnadi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dynamically coupled metrology and lithography
- Patent number 7,349,752
- Issue date Mar 25, 2008
- Integrated Device Technology, Inc.
- John L. Sturtevant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-wavelength exposure for reduction of implant shadowing
- Patent number 6,913,872
- Issue date Jul 5, 2005
- Integrated Device Technology, Inc.
- John L. Sturtevant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-layer deep ultraviolet photoresist process and structure
- Patent number 6,797,456
- Issue date Sep 28, 2004
- Integrated Device Technology, Inc.
- Yiming Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for generating a swing curve and photoresist feature formed...
- Patent number 6,733,936
- Issue date May 11, 2004
- Integrated Device Technology, Inc.
- Yiming Gu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REAL-TIME PATTERNING HOTSPOT ANALYZER
- Publication number 20240219847
- Publication date Jul 4, 2024
- Siemens Industry Software Inc.
- Young Chang Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIE YIELD ASSESSMENT BASED ON PATTERN-FAILURE RATE SIMULATION
- Publication number 20220075274
- Publication date Mar 10, 2022
- Siemens Industry Software Inc.
- Young Chang Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and System for Calculating Printed Area Metric Indicative of...
- Publication number 20220067260
- Publication date Mar 3, 2022
- Siemens Industry Software Inc.
- Hyejin Jin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Simulation-Assisted Wafer Rework Determination
- Publication number 20190102501
- Publication date Apr 4, 2019
- Mentro Graphics Corporation
- John L. Sturtevant
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Contour Alignment For Model Calibration
- Publication number 20110202898
- Publication date Aug 18, 2011
- Mentor Graphics Corporation
- IR KUSNADI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Contour Self-Alignment For Optical Proximity Correction Model Calib...
- Publication number 20110202893
- Publication date Aug 18, 2011
- Ir Kusnadi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

John L. Sturtevant

Person

Patents Grantslast 30 patents

Die yield assessment based on pattern-failure rate simulation

Method and system for calculating printed area metric indicative of...

Method and system for calculating probability of success or failure...

Simulation-assisted wafer rework determination

Contour alignment for model calibration

Dynamically coupled metrology and lithography

Dual-wavelength exposure for reduction of implant shadowing

Dual-layer deep ultraviolet photoresist process and structure

Method for generating a swing curve and photoresist feature formed...

Patents Applicationslast 30 patents

REAL-TIME PATTERNING HOTSPOT ANALYZER

DIE YIELD ASSESSMENT BASED ON PATTERN-FAILURE RATE SIMULATION

Method and System for Calculating Printed Area Metric Indicative of...

Simulation-Assisted Wafer Rework Determination

Contour Alignment For Model Calibration

Contour Self-Alignment For Optical Proximity Correction Model Calib...