John Leonard Sudijono

Person

Singapore, SG

People

Patents Grantslast 30 patents

Information Patent Grant
Chalcogen precursors for deposition of silicon nitride
- Patent number 12,142,477
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Chandan Kr Barik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature growth of transition metal chalcogenides
- Patent number 12,110,584
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Chandan Das
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for selective removal of contact oxides
- Patent number 12,057,299
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Tuck Foong Koh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a diamond film
- Patent number 12,037,679
- Issue date Jul 16, 2024
- Applied Materials, Inc.
- Vicknesh Sahmuganathan
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Semiconductor device patterning methods
- Patent number 11,987,875
- Issue date May 21, 2024
- Applied Materials, Inc.
- Yong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Area selective carbon-based film deposition
- Patent number 11,972,940
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Xinke Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In situ nucleation for nanocrystalline diamond film deposition
- Patent number 11,946,134
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Sze Chieh Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tribological properties of diamond films
- Patent number 11,894,230
- Issue date Feb 6, 2024
- Applied Materials, Inc.
- Vicknesh Sahmuganathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Molybdenum(0) precursors for deposition of molybdenum films
- Patent number 11,760,768
- Issue date Sep 19, 2023
- Applied Materials, Inc.
- Chandan Kr Barik
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chalcogen precursors for deposition of silicon nitride
- Patent number 11,658,025
- Issue date May 23, 2023
- Applied Materials, Inc.
- Chandan Kr Barik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of a passivation film on a metal surface
- Patent number 11,621,161
- Issue date Apr 4, 2023
- Applied Materials, Inc.
- Yong Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tribological properties of diamond films
- Patent number 11,594,416
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Vicknesh Sahmuganathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Area-selective atomic layer deposition of passivation layers
- Patent number 11,569,088
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Yong Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resistance-switching polymer films and methods of manufacture
- Patent number 11,552,265
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Xinke Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer-less low-K dielectric processes
- Patent number 8,624,329
- Issue date Jan 7, 2014
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Yong Meng Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for cleaning and drying of wafers
- Patent number 8,177,993
- Issue date May 15, 2012
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Boon Meng Seah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing method with inert gas injection
- Patent number 8,143,166
- Issue date Mar 27, 2012
- GlobalFoundries Singapore Pte. Ltd.
- Feng Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to remove spacer after salicidation to enhance contact etch...
- Patent number 7,999,325
- Issue date Aug 16, 2011
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Young Way Teh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and method to prevent charge damage from e-beam curing pr...
- Patent number 7,678,586
- Issue date Mar 16, 2010
- Chartered Semiconductor Manufacturing, Ltd.
- Huang Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Spacer-less low-k dielectric processes
- Patent number 7,615,427
- Issue date Nov 10, 2009
- Chartered Semiconductor Manufacturing, Ltd.
- Yong Meng Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite barrier/etch stop layer comprising oxygen doped SiC and S...
- Patent number 7,538,353
- Issue date May 26, 2009
- Chartered Semiconductor Manufacturing Ltd.
- Liu Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Entire encapsulation of Cu interconnects using self-aligned CuSiN film
- Patent number 7,524,755
- Issue date Apr 28, 2009
- Chartered Semiconductor Manufacturing, Ltd.
- Johnny Widodo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of copper/copper surface bonding using a conducting polymer...
- Patent number 7,452,808
- Issue date Nov 18, 2008
- Chartered Semiconductor Manufacturing Ltd.
- Simon Chooi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to remove spacer after salicidation to enhance contact etch...
- Patent number 7,445,978
- Issue date Nov 4, 2008
- Chartered Semiconductor Manufacturing, Ltd.
- Young Way Teh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to form alpha phase Ta and its application to IC manufacturing
- Patent number 7,294,241
- Issue date Nov 13, 2007
- Chartered Semiconductor Manufacturing Ltd.
- Chim Seng Seet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composite stress spacer
- Patent number 7,256,084
- Issue date Aug 14, 2007
- Chartered Semiconductor Manufacturing Ltd.
- Khee Yong Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-rich oxide for copper damascene interconnect incorporating...
- Patent number 7,186,640
- Issue date Mar 6, 2007
- Chartered Semiconductor Manufacturing Ltd.
- Liu Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of phoslon (PNO) for borderless contact fabrication, etch stop/...
- Patent number 7,148,157
- Issue date Dec 12, 2006
- Chartered Semiconductor Manufacturing Ltd.
- Hsia Liang Choo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
He treatment to improve low-k adhesion property
- Patent number 7,144,828
- Issue date Dec 5, 2006
- Chartered Semiconductor Manufacturing Ltd.
- Wei Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of copper/copper surface bonding using a conducting polymer...
- Patent number 7,060,613
- Issue date Jun 13, 2006
- Chartered Semiconductor Manufacturing Ltd.
- Simon Chooi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF SELECTIVELY ETCHING SILICON NITRIDE
- Publication number 20240420962
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Doreen Wei Ying Yong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PLASMA CLEANING OF FUSED SILICA TUBES
- Publication number 20240363317
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Vicknesh Sahmuganathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NANOCRYSTALLINE DIAMOND WITH AMORPHOUS INTERFACIAL LAYER
- Publication number 20240352621
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Sze Chieh Tan
- C30 - CRYSTAL GROWTH
Information Patent Application
DOPING BY MOLECULAR LAYER DEPOSITION
- Publication number 20240332014
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Xinke Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE PATTERNING METHODS
- Publication number 20240271272
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Yong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN SITU NUCLEATION FOR NANOCRYSTALLINE DIAMOND FILM DEPOSITION
- Publication number 20240229231
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Sze Chieh Tan
- B82 - NANO-TECHNOLOGY
Information Patent Application
AREA SELECTIVE CARBON-BASED FILM DEPOSITION
- Publication number 20240234127
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Xinke Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AREA SELECTIVE DEPOSITION THROUGH SURFACE SILYLATION
- Publication number 20240183035
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Xinke Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ISOTROPIC SILICON NITRIDE REMOVAL
- Publication number 20240120210
- Publication date Apr 11, 2024
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION FOR SUB 20 NM PITCH EUV PATTERNING
- Publication number 20240055255
- Publication date Feb 15, 2024
- Applied Materials, Inc.
- Zeqing Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO REDUCE LINE EDGE ROUGHNESS FOR EUV PHOTORESIST PATTERN
- Publication number 20240027912
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Xinke Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING CARBON-BASED SPACER FOR EUV PHOTORESIST PATTERNS
- Publication number 20230402285
- Publication date Dec 14, 2023
- Applied Materials, Inc.
- Xinke Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS
- Publication number 20230382933
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Chandan Kr Barik
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CONFORMAL METAL DICHALCOGENIDES
- Publication number 20230360967
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Chandan Das
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Area Selective Carbon-Based Film Deposition
- Publication number 20230335391
- Publication date Oct 19, 2023
- Applied Materials, Inc.
- Xinke Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING A DIAMOND FILM
- Publication number 20230279540
- Publication date Sep 7, 2023
- Applied Materials, Inc.
- Vicknesh Sahmuganathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS TO REDUCE UNCD FILM ROUGHNESS
- Publication number 20230260800
- Publication date Aug 17, 2023
- Applied Materials, Inc.
- Vicknesh Sahmuganathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHALCOGEN PRECURSORS FOR DEPOSITION OF SILICON NITRIDE
- Publication number 20230253201
- Publication date Aug 10, 2023
- Applied Materials, Inc.
- Chandan Kr Barik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN SITU NUCLEATION FOR NANOCRYSTALLINE DIAMOND FILM DEPOSITION
- Publication number 20230235452
- Publication date Jul 27, 2023
- Applied Materials, Inc.
- Sze Chieh Tan
- B82 - NANO-TECHNOLOGY
Information Patent Application
CONFORMAL METAL DICHALCOGENIDES
- Publication number 20230207314
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Chandan Das
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPOR-PHASE PRECURSOR SEEDING FOR DIAMOND FILM DEPOSITION
- Publication number 20230175120
- Publication date Jun 8, 2023
- Applied Materials, Inc.
- Sze Chieh Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TRIBOLOGICAL PROPERTIES OF DIAMOND FILMS
- Publication number 20230170217
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Vicknesh Sahmuganathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE PATTERNING METHODS
- Publication number 20230142926
- Publication date May 11, 2023
- Applied Materials, Inc.
- Yong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WATER VAPOR PLASMA TO ENHANCE SURFACE HYDROPHILICITY
- Publication number 20230100863
- Publication date Mar 30, 2023
- Prayudi LIANTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SELECTIVE REMOVAL OF CONTACT OXIDES
- Publication number 20230100602
- Publication date Mar 30, 2023
- Tuck Foong KOH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW TEMPERATURE GROWTH OF TRANSITION METAL CHALCOGENIDES
- Publication number 20220411918
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Chandan Das
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOVEL OXIDANTS AND STRAINED-RING PRECURSORS
- Publication number 20220406595
- Publication date Dec 22, 2022
- Applied Materials, Inc.
- Chandan Kr Barik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS
- Publication number 20220356197
- Publication date Nov 10, 2022
- Applied Materials, Inc.
- Chandan Kr Barik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ISOTROPIC SILICON NITRIDE REMOVAL
- Publication number 20220293430
- Publication date Sep 15, 2022
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHALCOGEN PRECURSORS FOR DEPOSITION OF SILICON NITRIDE
- Publication number 20220230874
- Publication date Jul 21, 2022
- Applied Materials, Inc.
- Chandan Kr Barik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

John Leonard Sudijono

Person

Patents Grantslast 30 patents

Chalcogen precursors for deposition of silicon nitride

Low temperature growth of transition metal chalcogenides

Methods for selective removal of contact oxides

Method of forming a diamond film

Semiconductor device patterning methods

Area selective carbon-based film deposition

In situ nucleation for nanocrystalline diamond film deposition

Tribological properties of diamond films

Molybdenum(0) precursors for deposition of molybdenum films

Chalcogen precursors for deposition of silicon nitride

Selective deposition of a passivation film on a metal surface

Tribological properties of diamond films

Area-selective atomic layer deposition of passivation layers

Resistance-switching polymer films and methods of manufacture

Spacer-less low-K dielectric processes

Apparatus and methods for cleaning and drying of wafers

Polishing method with inert gas injection

Method to remove spacer after salicidation to enhance contact etch...

Structure and method to prevent charge damage from e-beam curing pr...

Spacer-less low-k dielectric processes

Composite barrier/etch stop layer comprising oxygen doped SiC and S...

Entire encapsulation of Cu interconnects using self-aligned CuSiN film

Method of copper/copper surface bonding using a conducting polymer...

Method to remove spacer after salicidation to enhance contact etch...

Method to form alpha phase Ta and its application to IC manufacturing

Composite stress spacer

Silicon-rich oxide for copper damascene interconnect incorporating...

Use of phoslon (PNO) for borderless contact fabrication, etch stop/...

He treatment to improve low-k adhesion property

Method of copper/copper surface bonding using a conducting polymer...

Patents Applicationslast 30 patents

METHODS OF SELECTIVELY ETCHING SILICON NITRIDE

METHOD OF PLASMA CLEANING OF FUSED SILICA TUBES

NANOCRYSTALLINE DIAMOND WITH AMORPHOUS INTERFACIAL LAYER

DOPING BY MOLECULAR LAYER DEPOSITION

SEMICONDUCTOR DEVICE PATTERNING METHODS

IN SITU NUCLEATION FOR NANOCRYSTALLINE DIAMOND FILM DEPOSITION

AREA SELECTIVE CARBON-BASED FILM DEPOSITION

AREA SELECTIVE DEPOSITION THROUGH SURFACE SILYLATION

ISOTROPIC SILICON NITRIDE REMOVAL

SELECTIVE DEPOSITION FOR SUB 20 NM PITCH EUV PATTERNING

METHOD TO REDUCE LINE EDGE ROUGHNESS FOR EUV PHOTORESIST PATTERN

METHOD OF FORMING CARBON-BASED SPACER FOR EUV PHOTORESIST PATTERNS

MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS

CONFORMAL METAL DICHALCOGENIDES

Area Selective Carbon-Based Film Deposition

METHOD OF FORMING A DIAMOND FILM

METHODS TO REDUCE UNCD FILM ROUGHNESS

CHALCOGEN PRECURSORS FOR DEPOSITION OF SILICON NITRIDE

IN SITU NUCLEATION FOR NANOCRYSTALLINE DIAMOND FILM DEPOSITION

CONFORMAL METAL DICHALCOGENIDES

VAPOR-PHASE PRECURSOR SEEDING FOR DIAMOND FILM DEPOSITION

TRIBOLOGICAL PROPERTIES OF DIAMOND FILMS

SEMICONDUCTOR DEVICE PATTERNING METHODS

WATER VAPOR PLASMA TO ENHANCE SURFACE HYDROPHILICITY

METHODS FOR SELECTIVE REMOVAL OF CONTACT OXIDES

LOW TEMPERATURE GROWTH OF TRANSITION METAL CHALCOGENIDES

NOVEL OXIDANTS AND STRAINED-RING PRECURSORS

MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS

ISOTROPIC SILICON NITRIDE REMOVAL

CHALCOGEN PRECURSORS FOR DEPOSITION OF SILICON NITRIDE