John Madsen

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Massive overlay metrology sampling with multiple measurement columns
- Patent number 11,899,375
- Issue date Feb 13, 2024
- KLA Corporation
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-calibrating overlay metrology
- Patent number 11,880,142
- Issue date Jan 23, 2024
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of overlay error using device inspection system
- Patent number 11,784,097
- Issue date Oct 10, 2023
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Self-calibrated overlay metrology using a skew training sample
- Patent number 11,604,063
- Issue date Mar 14, 2023
- KLA Corporation
- Stilian Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Self-calibrating overlay metrology
- Patent number 11,604,420
- Issue date Mar 14, 2023
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Loosely-coupled inspection and metrology system for high-volume pro...
- Patent number 11,562,289
- Issue date Jan 24, 2023
- KLA Corporation
- Song Wu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement of overlay error using device inspection system
- Patent number 10,943,838
- Issue date Mar 9, 2021
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and systems for co-located metrology
- Patent number 10,804,167
- Issue date Oct 13, 2020
- KLA-Tencor Corporation
- David Y. Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Signal response metrology for scatterometry based overlay measurements
- Patent number 10,352,876
- Issue date Jul 16, 2019
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement of small box size targets
- Patent number 10,139,352
- Issue date Nov 27, 2018
- KLA-Tenor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Statistical model-based metrology
- Patent number 10,101,670
- Issue date Oct 16, 2018
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
On-device metrology
- Patent number 9,875,946
- Issue date Jan 23, 2018
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High brightness liquid droplet X-ray source for semiconductor metro...
- Patent number 9,693,439
- Issue date Jun 27, 2017
- KLA-Tencor Corporation
- Guorong V. Zhuang
- G01 - MEASURING TESTING
Information Patent Grant
Metrology through use of feed forward feed sideways and measurement...
- Patent number 9,559,019
- Issue date Jan 31, 2017
- KLA-Tencor Corporation
- Michael Adel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology through use of feed forward feed sideways and measurement...
- Patent number 8,930,156
- Issue date Jan 6, 2015
- KLA-Tencor Corporation
- Michael Adel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical metrology using targets with field enhancement elements
- Patent number 8,879,073
- Issue date Nov 4, 2014
- KLA-Tencor Corporation
- Jonathan M. Madsen
- G01 - MEASURING TESTING
Information Patent Grant
Metrology systems and methods for high aspect ratio and large later...
- Patent number 8,860,937
- Issue date Oct 14, 2014
- KLA-Tencor Corp.
- Thaddeus Gerard Dziura
- G01 - MEASURING TESTING
Information Patent Grant
Automated system check for metrology unit
- Patent number 8,825,444
- Issue date Sep 2, 2014
- Nanometrics Incorporated
- Pablo I. Rovira
- G05 - CONTROLLING REGULATING
Information Patent Grant
Transferring, buffering and measuring a substrate in a metrology sy...
- Patent number 7,301,623
- Issue date Nov 27, 2007
- Nanometrics Incorporated
- Jonathan M. Madsen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PARALLEL SCANNING OVERLAY METROLOGY WITH OPTICAL META-SURFACES
- Publication number 20240337606
- Publication date Oct 10, 2024
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS
- Publication number 20240027919
- Publication date Jan 25, 2024
- KLA Corporation
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS
- Publication number 20230359129
- Publication date Nov 9, 2023
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-CALIBRATING OVERLAY METROLOGY
- Publication number 20230221656
- Publication date Jul 13, 2023
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-CALIBRATED OVERLAY METROLOGY USING A SKEW TRAINING SAMPLE
- Publication number 20220412734
- Publication date Dec 29, 2022
- Stilian Pandev
- G01 - MEASURING TESTING
Information Patent Application
SELF-CALIBRATING OVERLAY METROLOGY
- Publication number 20220357673
- Publication date Nov 10, 2022
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measurement of Overlay Error Using Device Inspection System
- Publication number 20210159128
- Publication date May 27, 2021
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Methods And Systems For Co-Located Metrology
- Publication number 20200243400
- Publication date Jul 30, 2020
- KLA-Tencor Corporation
- David Y. Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Loosely-Coupled Inspection and Metrology System for High-Volume Pro...
- Publication number 20200184372
- Publication date Jun 11, 2020
- KLA-Tencor Corporation
- Song Wu
- G01 - MEASURING TESTING
Information Patent Application
Measurement of Overlay Error Using Device Inspection System
- Publication number 20190252270
- Publication date Aug 15, 2019
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Measurement Of Small Box Size Targets
- Publication number 20160109375
- Publication date Apr 21, 2016
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Application
Signal Response Metrology For Scatterometry Based Overlay Measurements
- Publication number 20150323316
- Publication date Nov 12, 2015
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY THROUGH USE OF FEED FORWARD FEED SIDEWAYS AND MEASUREMENT...
- Publication number 20150112624
- Publication date Apr 23, 2015
- KLA-Tencor Corporation
- Michael Adel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ON-DEVICE METROLOGY
- Publication number 20140316730
- Publication date Oct 23, 2014
- Andrei V. Shchegrov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STATISTICAL MODEL-BASED METROLOGY
- Publication number 20140297211
- Publication date Oct 2, 2014
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Metrology Using Targets With Field Enhancement Elements
- Publication number 20130222795
- Publication date Aug 29, 2013
- KLA-Tencor Corporation
- Jonathan M. Madsen
- G01 - MEASURING TESTING
Information Patent Application
DETERMINATION OF MATERIAL OPTICAL PROPERTIES FOR OPTICAL METROLOGY...
- Publication number 20110276319
- Publication date Nov 10, 2011
- Jonathan Michael Madsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY THROUGH USE OF FEED FORWARD FEED SIDEWAYS AND MEASUREMENT...
- Publication number 20100017005
- Publication date Jan 21, 2010
- KLA-Tencor Corporation
- Michael Adel
- H01 - BASIC ELECTRIC ELEMENTS

John Madsen

Person

Patents Grantslast 30 patents

Massive overlay metrology sampling with multiple measurement columns

Self-calibrating overlay metrology

Measurement of overlay error using device inspection system

Self-calibrated overlay metrology using a skew training sample

Self-calibrating overlay metrology

Loosely-coupled inspection and metrology system for high-volume pro...

Measurement of overlay error using device inspection system

Methods and systems for co-located metrology

Signal response metrology for scatterometry based overlay measurements

Measurement of small box size targets

Statistical model-based metrology

On-device metrology

High brightness liquid droplet X-ray source for semiconductor metro...

Metrology through use of feed forward feed sideways and measurement...

Metrology through use of feed forward feed sideways and measurement...

Optical metrology using targets with field enhancement elements

Metrology systems and methods for high aspect ratio and large later...

Automated system check for metrology unit

Transferring, buffering and measuring a substrate in a metrology sy...

Patents Applicationslast 30 patents

PARALLEL SCANNING OVERLAY METROLOGY WITH OPTICAL META-SURFACES

MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS

MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS

SELF-CALIBRATING OVERLAY METROLOGY

SELF-CALIBRATED OVERLAY METROLOGY USING A SKEW TRAINING SAMPLE

SELF-CALIBRATING OVERLAY METROLOGY

Measurement of Overlay Error Using Device Inspection System

Methods And Systems For Co-Located Metrology

Loosely-Coupled Inspection and Metrology System for High-Volume Pro...

Measurement of Overlay Error Using Device Inspection System

Measurement Of Small Box Size Targets

Signal Response Metrology For Scatterometry Based Overlay Measurements

METROLOGY THROUGH USE OF FEED FORWARD FEED SIDEWAYS AND MEASUREMENT...

ON-DEVICE METROLOGY

STATISTICAL MODEL-BASED METROLOGY

Optical Metrology Using Targets With Field Enhancement Elements

DETERMINATION OF MATERIAL OPTICAL PROPERTIES FOR OPTICAL METROLOGY...

METROLOGY THROUGH USE OF FEED FORWARD FEED SIDEWAYS AND MEASUREMENT...