John Martin McIntosh

Person

Orlando, FL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Monitoring and control of a fabrication process
- Patent number 7,972,440
- Issue date Jul 5, 2011
- Agere Systems Inc.
- Erik C. Houge
- B24 - GRINDING POLISHING
Information Patent Grant
Overlay metrology using scatterometry profiling
- Patent number 6,985,229
- Issue date Jan 10, 2006
- Agere Systems, INC
- Cynthia C. Lee
- G01 - MEASURING TESTING
Information Patent Grant
Substrate topography compensation at mask design: 3D OPC topography...
- Patent number 6,893,800
- Issue date May 17, 2005
- Agere Systems, INC
- Scott Jessen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calibration standard for high resolution electron microscopy
- Patent number 6,750,447
- Issue date Jun 15, 2004
- Agere Systems, INC
- Erik Cho Houge
- G01 - MEASURING TESTING
Information Patent Grant
Probe having a microstylet
- Patent number 6,727,720
- Issue date Apr 27, 2004
- Agere Systems Inc.
- Erik C. Houge
- G01 - MEASURING TESTING
Information Patent Grant
Three dimensional reconstruction metrology
- Patent number 6,714,892
- Issue date Mar 30, 2004
- Agere Systems, INC
- Erik Cho Houge
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Abnormal photoresist line/space profile detection through signal pr...
- Patent number 6,708,574
- Issue date Mar 23, 2004
- Agere Systems, INC
- Erik Cho Houge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process control using three dimensional reconstruction metrology
- Patent number 6,651,226
- Issue date Nov 18, 2003
- Agere Systems, INC
- Erik Cho Houge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Control of semiconductor processing
- Patent number 6,641,746
- Issue date Nov 4, 2003
- Agere Systems, INC
- Erik Cho Houge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mass spectrometer particle counter
- Patent number 6,633,032
- Issue date Oct 14, 2003
- Agere Systems Inc.
- Erik Cho Houge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of focused ion beam pattern transfer using a smart dynamic t...
- Patent number 6,627,885
- Issue date Sep 30, 2003
- Agere Systems Inc.
- John M. McIntosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray system
- Patent number 6,606,371
- Issue date Aug 12, 2003
- Agere Systems Inc.
- Michael Antonell
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method of determining a crystallographic quality of a material loca...
- Patent number 6,577,970
- Issue date Jun 10, 2003
- Agere Systems Inc.
- Erik C. Houge
- G01 - MEASURING TESTING
Information Patent Grant
Monitoring system for determining progress in a fabrication activity
- Patent number 6,569,690
- Issue date May 27, 2003
- Agere Systems Guardian Corp.
- Erik Cho Houge
- B24 - GRINDING POLISHING
Information Patent Grant
Scanning electron microscope system and method of manufacturing an...
- Patent number 6,556,703
- Issue date Apr 29, 2003
- Agere Systems Inc.
- Brittin Charles Kane
- G01 - MEASURING TESTING
Information Patent Grant
Method of determining accuracy error in line width metrology device
- Patent number 6,369,891
- Issue date Apr 9, 2002
- Agere Systems Guardian Corp.
- Brittin C. Kane
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of analyzing semiconductor surface with patterned feature us...
- Patent number 6,326,618
- Issue date Dec 4, 2001
- Agere Systems Guardian Corp.
- Brittin C. Kane
- G01 - MEASURING TESTING
Information Patent Grant
Method of sectioning of photoresist for shape evaluation
- Patent number 6,265,235
- Issue date Jul 24, 2001
- Lucent Technologies, Inc.
- John M. McIntosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method analyzing a semiconductor surface using line width metrology...
- Patent number 6,258,610
- Issue date Jul 10, 2001
- Agere Systems Guardian Corp.
- James W. Blatchford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of monitoring a patterned transfer process using line width...
- Patent number 6,225,639
- Issue date May 1, 2001
- Agere Systems Guardian Corp.
- Thomas E. Adams
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Location of defects using dye penetration
- Patent number 6,097,484
- Issue date Aug 1, 2000
- Lucent Technologies, Inc.
- John M. McIntosh
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Monitoring and control of a fabrication process
- Publication number 20060048697
- Publication date Mar 9, 2006
- Erik C Houge
- B24 - GRINDING POLISHING
Information Patent Application
Method for metal patterning and improved linewidth control
- Publication number 20030228755
- Publication date Dec 11, 2003
- Thomas Craig Esry
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Overlay metrology using scatterometry profiling
- Publication number 20030223066
- Publication date Dec 4, 2003
- Cynthia C. Lee
- G01 - MEASURING TESTING
Information Patent Application
ABNORMAL PHOTORESIST LINE/SPACE PROFILE DETECTION THROUGH SIGNAL PR...
- Publication number 20030219916
- Publication date Nov 27, 2003
- Erik Cho Houge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterned implant metrology
- Publication number 20030184769
- Publication date Oct 2, 2003
- Erik Cho Houge
- G01 - MEASURING TESTING
Information Patent Application
Control of semiconductor processing
- Publication number 20030062339
- Publication date Apr 3, 2003
- Erik Cho Houge
- G05 - CONTROLLING REGULATING
Information Patent Application
Probe having a microstylet and method of manufacturing the same
- Publication number 20030042922
- Publication date Mar 6, 2003
- Erik C. Houge
- B82 - NANO-TECHNOLOGY
Information Patent Application
Process control using three dimensional reconstruction metrology
- Publication number 20020170021
- Publication date Nov 14, 2002
- Erik Cho Houge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Three dimensional reconstruction metrology
- Publication number 20020156594
- Publication date Oct 24, 2002
- Erik Cho Houge
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Laboratory specimen sampler with integrated specimen mount
- Publication number 20020150509
- Publication date Oct 17, 2002
- Erik C. Houge
- G01 - MEASURING TESTING
Information Patent Application
Method of determining a crystallographic quality of a material loca...
- Publication number 20020128789
- Publication date Sep 12, 2002
- Erik C. Houge
- G01 - MEASURING TESTING

John Martin McIntosh

Person

Patents Grantslast 30 patents

Monitoring and control of a fabrication process

Overlay metrology using scatterometry profiling

Substrate topography compensation at mask design: 3D OPC topography...

Calibration standard for high resolution electron microscopy

Probe having a microstylet

Three dimensional reconstruction metrology

Abnormal photoresist line/space profile detection through signal pr...

Process control using three dimensional reconstruction metrology

Control of semiconductor processing

Mass spectrometer particle counter

Method of focused ion beam pattern transfer using a smart dynamic t...

X-ray system

Method of determining a crystallographic quality of a material loca...

Monitoring system for determining progress in a fabrication activity

Scanning electron microscope system and method of manufacturing an...

Method of determining accuracy error in line width metrology device

Method of analyzing semiconductor surface with patterned feature us...

Method of sectioning of photoresist for shape evaluation

Method analyzing a semiconductor surface using line width metrology...

Method of monitoring a patterned transfer process using line width...

Location of defects using dye penetration

Patents Applicationslast 30 patents

Monitoring and control of a fabrication process

Method for metal patterning and improved linewidth control

Overlay metrology using scatterometry profiling

ABNORMAL PHOTORESIST LINE/SPACE PROFILE DETECTION THROUGH SIGNAL PR...

Patterned implant metrology

Control of semiconductor processing

Probe having a microstylet and method of manufacturing the same

Process control using three dimensional reconstruction metrology

Three dimensional reconstruction metrology

Laboratory specimen sampler with integrated specimen mount

Method of determining a crystallographic quality of a material loca...