John P. Stirniman

Person

Vancouver, WA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Flash-based anti-aliasing techniques for high-accuracy high-efficie...
- Patent number 8,490,032
- Issue date Jul 16, 2013
- Synopsys, Inc.
- Michael L. Rieger
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Flash-based updating techniques for high-accuracy high efficiency m...
- Patent number 7,831,954
- Issue date Nov 9, 2010
- Synopsys, Inc.
- Michael L. Rieger
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Flash-based anti-aliasing techniques for high-accuracy high efficie...
- Patent number 7,617,478
- Issue date Nov 10, 2009
- Synopsys, Inc.
- Michael L. Rieger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model of sensitivity of a simulated layout to a change in original...
- Patent number 7,458,059
- Issue date Nov 25, 2008
- Synopsys, Inc.
- John P. Stirniman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Calculating etch proximity-correction using object-precision techni...
- Patent number 7,234,129
- Issue date Jun 19, 2007
- Synopsys, Inc.
- Dan Beale
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calculating etch proximity-correction using image-precision techniques
- Patent number 7,207,029
- Issue date Apr 17, 2007
- Synopsys, Inc.
- Dan Beale
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Proximity correction software for wafer lithography
- Patent number 6,289,499
- Issue date Sep 11, 2001
- Avant! Corporation
- Michael L. Rieger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Proximity correction system for wafer lithography
- Patent number 6,081,658
- Issue date Jun 27, 2000
- Avant! Corporation
- Michael L. Rieger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FLASH-BASED ANTI-ALIASING TECHNIQUES FOR HIGH-ACCURACY HIGH-EFFICIE...
- Publication number 20110016438
- Publication date Jan 20, 2011
- Synopsys, Inc.
- Michael L. Rieger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FLASH-BASED UPDATING TECHNIQUES FOR HIGH-ACCURACY HIGH EFFICIENCY M...
- Publication number 20090083693
- Publication date Mar 26, 2009
- Synopsys, Inc.
- Michael L. Rieger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FLASH-BASED ANTI-ALIASING TECHNIQUES FOR HIGH-ACCURACY HIGH EFFICIE...
- Publication number 20090083692
- Publication date Mar 26, 2009
- Synopsys, Inc.
- Michael L. Rieger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Model of sensitivity of a simulated layout to a change in original...
- Publication number 20070101310
- Publication date May 3, 2007
- John P. Stirniman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Calculating etch proximity-correction using image-precision techniques
- Publication number 20060075378
- Publication date Apr 6, 2006
- Dan Beale
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calculating etch proximity-correction using object-precision techni...
- Publication number 20060075380
- Publication date Apr 6, 2006
- Dan Beale
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

John P. Stirniman

Person

Patents Grantslast 30 patents

Flash-based anti-aliasing techniques for high-accuracy high-efficie...

Flash-based updating techniques for high-accuracy high efficiency m...

Flash-based anti-aliasing techniques for high-accuracy high efficie...

Model of sensitivity of a simulated layout to a change in original...

Calculating etch proximity-correction using object-precision techni...

Calculating etch proximity-correction using image-precision techniques

Proximity correction software for wafer lithography

Proximity correction system for wafer lithography

Patents Applicationslast 30 patents

FLASH-BASED ANTI-ALIASING TECHNIQUES FOR HIGH-ACCURACY HIGH-EFFICIE...

FLASH-BASED UPDATING TECHNIQUES FOR HIGH-ACCURACY HIGH EFFICIENCY M...

FLASH-BASED ANTI-ALIASING TECHNIQUES FOR HIGH-ACCURACY HIGH EFFICIE...

Model of sensitivity of a simulated layout to a change in original...

Calculating etch proximity-correction using image-precision techniques

Calculating etch proximity-correction using object-precision techni...