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John Pohl
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Leicester, GB
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last 30 patents
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Patent Grant
Self-aligned STI process using nitride hard mask
Patent number
6,551,874
Issue date
Apr 22, 2003
Infineon Technologies, AG
John Pohl
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Method of measuring combined critical dimension and overlay in sing...
Patent number
6,440,759
Issue date
Aug 27, 2002
Infineon Technologies AG
Martin Commons
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
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Patent Application
Self-aligned STI process using nitride hard mask
Publication number
20030045051
Publication date
Mar 6, 2003
Infineon Technologies North America Corp.
John Pohl
H01 - BASIC ELECTRIC ELEMENTS