John R.C. Futrell

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for defining evaluation points for optical proximity correc...
- Patent number 8,584,058
- Issue date Nov 12, 2013
- Micron Technology, Inc.
- John R. C. Futrell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for defining evaluation points for optical proximity correc...
- Patent number 8,037,446
- Issue date Oct 11, 2011
- Micron Technology, Inc.
- John R. C. Futrell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for checking lithography data
- Patent number 7,549,143
- Issue date Jun 16, 2009
- Micron Technology, Inc.
- Husayn Alvarez-Gomariz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for checking lithography data
- Patent number 7,549,142
- Issue date Jun 16, 2009
- Micron Technology, Inc.
- Husayn Alvarez-Gomariz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming patterned reticles
- Patent number 7,350,182
- Issue date Mar 25, 2008
- Micron Technology, Inc.
- H. Daniel Dulman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming patterned reticles
- Patent number 7,107,572
- Issue date Sep 12, 2006
- Micron Technology, Inc.
- H. Daniel Dulman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for checking lithography data
- Patent number 7,096,452
- Issue date Aug 22, 2006
- Micron Technology, Inc.
- Husayn Alvarez-Gomariz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming patterned reticles
- Patent number 7,093,227
- Issue date Aug 15, 2006
- Micron Technology, Inc.
- H. Daniel Dulman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming patterned reticles
- Patent number 7,086,031
- Issue date Aug 1, 2006
- Micron Technology, Inc.
- H. Daniel Dulman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming patterned reticles
- Patent number 7,073,161
- Issue date Jul 4, 2006
- Micron Technology, Inc.
- H. Daniel Dulman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming patterned reticles
- Patent number 6,842,889
- Issue date Jan 11, 2005
- Micron Technology, Inc.
- H. Daniel Dulman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction methods, and methods forming radiation...
- Patent number 6,447,961
- Issue date Sep 10, 2002
- Micron Technology, Inc.
- John R C Futrell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Insert testing system
- Patent number 6,313,650
- Issue date Nov 6, 2001
- Micron Technology, Inc.
- Salman Akram
- G01 - MEASURING TESTING
Information Patent Grant
Metallized recess in a substrate
- Patent number 6,248,429
- Issue date Jun 19, 2001
- Micron Technology, Inc.
- Salman Akram
- G01 - MEASURING TESTING
Information Patent Grant
Optical proximity correction methods, and methods of forming radiat...
- Patent number 6,245,468
- Issue date Jun 12, 2001
- Micron Technology, Inc.
- John RC Futrell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for designing and making photolithographic reticle, reticle,...
- Patent number 6,238,824
- Issue date May 29, 2001
- Micron Technology, Inc.
- John R. Futrell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making a metallized recess in a substrate
- Patent number 6,169,021
- Issue date Jan 2, 2001
- Micron Technology, Inc.
- Salman Akram
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR DEFINING EVALUATION POINTS FOR OPTICAL PROXIMITY CORREC...
- Publication number 20120030638
- Publication date Feb 2, 2012
- Micron Technology, Inc.
- John R. C. Futrell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR DEFINING EVALUATION POINTS FOR OPTICAL PROXIMITY CORREC...
- Publication number 20100017778
- Publication date Jan 21, 2010
- Micron Technology, Inc.
- John R. C. Futrell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR CHECKING LITHOGRAPHY DATA
- Publication number 20060235663
- Publication date Oct 19, 2006
- Micron Technology, Inc.
- Husayn Alvarez-Gomariz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR CHECKING LITHOGRAPHY DATA
- Publication number 20060234140
- Publication date Oct 19, 2006
- Micron Technology, Inc.
- Husayn Alvarez-Gomariz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of forming patterned reticles
- Publication number 20050008949
- Publication date Jan 13, 2005
- H. Daniel Dulman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of forming patterned reticles
- Publication number 20050008950
- Publication date Jan 13, 2005
- H. Daniel Dulman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of forming patterned reticles
- Publication number 20050008952
- Publication date Jan 13, 2005
- H. Daniel Dulman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of forming patterned reticles
- Publication number 20050008953
- Publication date Jan 13, 2005
- H. Daniel Dulman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of forming patterned reticles
- Publication number 20050008951
- Publication date Jan 13, 2005
- H. Daniel Dulman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and device for checking lithography data
- Publication number 20040268291
- Publication date Dec 30, 2004
- Micron Technology, Inc.
- Husayn Alvarez-Gomariz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of forming patterned reticles
- Publication number 20040031013
- Publication date Feb 12, 2004
- H. Daniel Dulman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical proximity correction methods, and methods of forming radiat...
- Publication number 20010023043
- Publication date Sep 20, 2001
- John RC Futrell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

John R.C. Futrell

Person

Patents Grantslast 30 patents

Methods for defining evaluation points for optical proximity correc...

Methods for defining evaluation points for optical proximity correc...

Method and device for checking lithography data

Method and device for checking lithography data

Methods of forming patterned reticles

Methods of forming patterned reticles

Method and device for checking lithography data

Methods of forming patterned reticles

Methods of forming patterned reticles

Methods of forming patterned reticles

Methods of forming patterned reticles

Optical proximity correction methods, and methods forming radiation...

Insert testing system

Metallized recess in a substrate

Optical proximity correction methods, and methods of forming radiat...

Method for designing and making photolithographic reticle, reticle,...

Method of making a metallized recess in a substrate

Patents Applicationslast 30 patents

METHODS FOR DEFINING EVALUATION POINTS FOR OPTICAL PROXIMITY CORREC...

METHODS FOR DEFINING EVALUATION POINTS FOR OPTICAL PROXIMITY CORREC...

METHOD AND DEVICE FOR CHECKING LITHOGRAPHY DATA

METHOD AND DEVICE FOR CHECKING LITHOGRAPHY DATA

Methods of forming patterned reticles

Methods of forming patterned reticles

Methods of forming patterned reticles

Methods of forming patterned reticles

Methods of forming patterned reticles

Method and device for checking lithography data

Methods of forming patterned reticles

Optical proximity correction methods, and methods of forming radiat...