John Scott Hallock

Person

Potomac, MD, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of photoresist ash residue removal
- Patent number 6,734,120
- Issue date May 11, 2004
- Axcelis Technologies, Inc.
- Ivan Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for reducing edge roughness in patterned photoresist
- Patent number 6,709,807
- Issue date Mar 23, 2004
- Axcelis Technologies, Inc.
- John S. Hallock
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for reducing edge roughness in patterned photoresist
- Patent number 6,582,891
- Issue date Jun 24, 2003
- Axcelis Technologies, Inc.
- John S. Hallock
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for removal of photoresist after post ion implantation
- Patent number 6,524,936
- Issue date Feb 25, 2003
- Axcelis Technologies, Inc.
- John Scott Hallock
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
UV assisted chemical modification of photoresist
- Patent number 6,503,693
- Issue date Jan 7, 2003
- Axcelis Technologies, Inc.
- Robert Douglas Mohondro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Oxygen scavenger compositions
- Patent number 6,387,461
- Issue date May 14, 2002
- Cryovac, Inc.
- Cynthia Louise Ebner
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Oxygen scavenging system and compositions
- Patent number 6,258,883
- Issue date Jul 10, 2001
- Cryovac, Inc.
- Cynthia Louise Ebner
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Drying process for low-k dielectric films
- Publication number 20040099283
- Publication date May 27, 2004
- Axcelis Technologies, Inc.
- Carlo Waldfried
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for reducing edge roughness in patterned photoresist
- Publication number 20030049571
- Publication date Mar 13, 2003
- Axcelis Technologies, Inc.
- John S. Hallock
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Process for removal of photoresist after post ion implantation
- Publication number 20020151156
- Publication date Oct 17, 2002
- John Scott Hallock
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

John Scott Hallock

Person

Patents Grantslast 30 patents

Method of photoresist ash residue removal

Process for reducing edge roughness in patterned photoresist

Process for reducing edge roughness in patterned photoresist

Process for removal of photoresist after post ion implantation

UV assisted chemical modification of photoresist

Oxygen scavenger compositions

Oxygen scavenging system and compositions

Patents Applicationslast 30 patents

Drying process for low-k dielectric films

Process for reducing edge roughness in patterned photoresist

Process for removal of photoresist after post ion implantation