John Shamaly

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Wilton, CT, US

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Patents Grantslast 30 patents

Information Patent Grant
Catadioptric lithography system and method with reticle stage ortho...
- Patent number 6,977,716
- Issue date Dec 20, 2005
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric lithography system and method with reticle stage ortho...
- Patent number 6,757,110
- Issue date Jun 29, 2004
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Catadioptric lithography system and method with reticle stage ortho...
- Publication number 20040201830
- Publication date Oct 14, 2004
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Catadioptric lithography system and method with reticle stage ortho...
- Publication number 20030223125
- Publication date Dec 4, 2003
- ASML US, Inc.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY