John Tom Stewart IV

Person

San Diego, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Cleaning a structure surface in an EUV chamber
- Patent number 12,189,313
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Guiding device and associated system
- Patent number 11,822,252
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Dzmitry Labetski
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Cleaning a structure surface in an EUV chamber
- Patent number 11,347,154
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Guiding device and associated system
- Patent number 10,955,749
- Issue date Mar 23, 2021
- ASML Netherlands B.V.
- Dzmitry Labetski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing the effect of plasma on an object in an extreme ultraviole...
- Patent number 10,904,993
- Issue date Jan 26, 2021
- ASML Netherlands B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of controlling debris in an EUV light source
- Patent number 10,490,313
- Issue date Nov 26, 2019
- ASML Netherlands B.V.
- Alexander I. Ershov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing the effect of plasma on an object in an extreme ultraviole...
- Patent number 10,349,509
- Issue date Jul 9, 2019
- ASML Netherlands B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus for and method of controlling debris in an EUV light source
- Patent number 10,128,017
- Issue date Nov 13, 2018
- ASML Netherlands B.V.
- Alexander I. Ershov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Extreme ultraviolet light source
- Patent number 10,064,261
- Issue date Aug 28, 2018
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet light source utilizing a target of finite extent
- Patent number 9,826,616
- Issue date Nov 21, 2017
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet light source
- Patent number 9,357,625
- Issue date May 31, 2016
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet light source
- Patent number 9,338,870
- Issue date May 10, 2016
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20240085796
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
- Publication number 20220179328
- Publication date Jun 9, 2022
- ASML NETHERLANDS B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20210141311
- Publication date May 13, 2021
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
- Publication number 20210063899
- Publication date Mar 4, 2021
- Chunguang Xia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCING THE EFFECT OF PLASMA ON AN OBJECT IN AN EXTREME ULTRAVIOLE...
- Publication number 20190274210
- Publication date Sep 5, 2019
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD OF CONTROLLING DEBRIS IN AN EUV LIGHT SOURCE
- Publication number 20190080811
- Publication date Mar 14, 2019
- ASML NETHERLANDS B.V.
- Alexander I. Ershov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
REDUCING THE EFFECT OF PLASMA ON AN OBJECT IN AN EXTREME ULTRAVIOLE...
- Publication number 20180343730
- Publication date Nov 29, 2018
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS FOR AND METHOD OF CONTROLLING DEBRIS IN AN EUV LIGHT SOURCE
- Publication number 20180330841
- Publication date Nov 15, 2018
- ASML NETHERLANDS B.V.
- Alexander I. Ershov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20180124906
- Publication date May 3, 2018
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
REDUCING THE EFFECT OF PLASMA ON AN OBJECT IN AN EXTREME ULTRAVIOLE...
- Publication number 20170311429
- Publication date Oct 26, 2017
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20160255708
- Publication date Sep 1, 2016
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
System and Method for Isolating Gain Elements in a Laser System
- Publication number 20160165709
- Publication date Jun 9, 2016
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20160007434
- Publication date Jan 7, 2016
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Extreme Ultraviolet Light Source
- Publication number 20150189728
- Publication date Jul 2, 2015
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

John Tom Stewart IV

Person

Patents Grantslast 30 patents

Cleaning a structure surface in an EUV chamber

Guiding device and associated system

Cleaning a structure surface in an EUV chamber

Guiding device and associated system

Reducing the effect of plasma on an object in an extreme ultraviole...

Method of controlling debris in an EUV light source

Reducing the effect of plasma on an object in an extreme ultraviole...

Apparatus for and method of controlling debris in an EUV light source

Extreme ultraviolet light source

Extreme ultraviolet light source utilizing a target of finite extent

Extreme ultraviolet light source

Extreme ultraviolet light source

Patents Applicationslast 30 patents

GUIDING DEVICE AND ASSOCIATED SYSTEM

CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER

GUIDING DEVICE AND ASSOCIATED SYSTEM

CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER

REDUCING THE EFFECT OF PLASMA ON AN OBJECT IN AN EXTREME ULTRAVIOLE...

METHOD OF CONTROLLING DEBRIS IN AN EUV LIGHT SOURCE

REDUCING THE EFFECT OF PLASMA ON AN OBJECT IN AN EXTREME ULTRAVIOLE...

APPARATUS FOR AND METHOD OF CONTROLLING DEBRIS IN AN EUV LIGHT SOURCE

EXTREME ULTRAVIOLET LIGHT SOURCE

REDUCING THE EFFECT OF PLASMA ON AN OBJECT IN AN EXTREME ULTRAVIOLE...

EXTREME ULTRAVIOLET LIGHT SOURCE

System and Method for Isolating Gain Elements in a Laser System

EXTREME ULTRAVIOLET LIGHT SOURCE

Extreme Ultraviolet Light Source