John Vu Nguyen

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Chadds Ford, PA, US

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Patents Grantslast 30 patents

Information Patent Grant
High-rate CMP polishing method
- Patent number 10,857,647
- Issue date Dec 8, 2020
- Rohm and Haas Electronic Materials CMP Holdings
- John Vu Nguyen
- B24 - GRINDING POLISHING
Information Patent Grant
Trapezoidal CMP groove pattern
- Patent number 10,857,648
- Issue date Dec 8, 2020
- Rohm and Haas Electronic Materials CMP Holdings
- John Vu Nguyen
- B24 - GRINDING POLISHING
Information Patent Grant
Controlled residence CMP polishing method
- Patent number 10,861,702
- Issue date Dec 8, 2020
- Rohm and Haas Electronic Materials CMP Holdings
- John Vu Nguyen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Biased pulse CMP groove pattern
- Patent number 10,777,418
- Issue date Sep 15, 2020
- Rohm and Haas Electronic Materials CMP Holdings, I
- John Vu Nguyen
- B24 - GRINDING POLISHING
Information Patent Grant
Uniform CMP polishing method
- Patent number 10,586,708
- Issue date Mar 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- John Vu Nguyen
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
BIASED PULSE CMP GROOVE PATTERN
- Publication number 20200381258
- Publication date Dec 3, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- John Vu Nguyen
- B24 - GRINDING POLISHING
Information Patent Application
BIASED PULSE CMP GROOVE PATTERN
- Publication number 20180366333
- Publication date Dec 20, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- John Vu Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-RATE CMP POLISHING METHOD
- Publication number 20180361532
- Publication date Dec 20, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- John Vu Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRAPEZOIDAL CMP GROOVE PATTERN
- Publication number 20180361533
- Publication date Dec 20, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- John Vu Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM CMP POLISHING METHOD
- Publication number 20180366331
- Publication date Dec 20, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- John Vu Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLED RESIDENCE CMP POLISHING METHOD
- Publication number 20180366332
- Publication date Dec 20, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- John Vu Nguyen
- H01 - BASIC ELECTRIC ELEMENTS