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John W. Coburn
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San Jose, CA, US
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Patents Grants
last 30 patents
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Patent Grant
Methods and systems for preparing a copper containing substrate for...
Patent number
7,148,073
Issue date
Dec 12, 2006
KLA-Tencor Technologies Corp.
David Soltz
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma etching method using low ionization potential gas
Patent number
6,475,920
Issue date
Nov 5, 2002
Micron Technology, Inc.
John W. Coburn
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etching method using low ionization potential gas
Patent number
6,228,775
Issue date
May 8, 2001
Micron Technology, Inc.
John W. Coburn
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Etching process with vibrationally excited SF.sub.6
Patent number
4,331,504
Issue date
May 25, 1982
International Business Machines Corporation
Tung J. Chuang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma method for forming a metal containing polymer
Patent number
4,226,896
Issue date
Oct 7, 1980
International Business Machines Corporation
John W. Coburn
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information
Patent Grant
Utilizing saturated and unsaturated halocarbon gases in plasma etch...
Patent number
4,162,185
Issue date
Jul 24, 1979
International Business Machines Corporation
John W. Coburn
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Plasma etching method using low ionization potential gas
Publication number
20010012694
Publication date
Aug 9, 2001
John W. Coburn
H01 - BASIC ELECTRIC ELEMENTS