John Ye

Person

Brighton, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for ion beam profiling
- Patent number 7,701,230
- Issue date Apr 20, 2010
- Axcelis Technologies, Inc.
- John Zheng Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Closed loop dose control for ion implantation
- Patent number 7,557,363
- Issue date Jul 7, 2009
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of ion beam control in response to a beam glitch
- Patent number 7,507,977
- Issue date Mar 24, 2009
- Axcelis Technologies, Inc.
- Que Weiguo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for ion beam containment in an ion beam guide
- Patent number 6,759,665
- Issue date Jul 6, 2004
- Axcelis Technologies, Inc.
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for ion beam containment in an ion beam guide
- Patent number 6,703,628
- Issue date Mar 9, 2004
- Axceliss Technologies, Inc
- John Zheng Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Waveguide for microwave excitation of plasma in an ion beam guide
- Patent number 6,541,781
- Issue date Apr 1, 2003
- Axcelis Technologies, Inc.
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for removing particles entrained in an ion beam
- Patent number 6,525,326
- Issue date Feb 25, 2003
- Axcelis Technologies, Inc.
- Eric R. Harrington
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR ION BEAM PROFILING
- Publication number 20080265866
- Publication date Oct 30, 2008
- John Zheng Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method of ion beam control in response to a beam glitch
- Publication number 20080067433
- Publication date Mar 20, 2008
- Axcelis Technologies, Inc.
- Que Weiguo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Closed loop dose control for ion implantation
- Publication number 20070278427
- Publication date Dec 6, 2007
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for ion beam containment in an ion beam guide
- Publication number 20030201402
- Publication date Oct 30, 2003
- John Zheng Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for ion beam containment in an ion beam guide
- Publication number 20020014587
- Publication date Feb 7, 2002
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method and system for ion beam profiling

Closed loop dose control for ion implantation

System and method of ion beam control in response to a beam glitch

Method and system for ion beam containment in an ion beam guide

Method and system for ion beam containment in an ion beam guide

Waveguide for microwave excitation of plasma in an ion beam guide

System and method for removing particles entrained in an ion beam

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR ION BEAM PROFILING

System and method of ion beam control in response to a beam glitch

Closed loop dose control for ion implantation

Method and system for ion beam containment in an ion beam guide

Method and system for ion beam containment in an ion beam guide