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Jonathan C. Shaw

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  • Oakland, CA, US
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Patents Grantslast 30 patents

  • Information Patent Grant

    Method of processing dram
    • Patent number 11,751,382
    • Issue date Sep 5, 2023
    • Applied Materials, Inc.
    • Lequn Liu
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Selective anisotropic metal etch
    • Patent number 11,658,043
    • Issue date May 23, 2023
    • Applied Materials, Inc.
    • Jonathan Shaw
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Method of processing DRAM
    • Patent number 11,329,052
    • Issue date May 10, 2022
    • Applied Materials, Inc.
    • Lequn Liu
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

  • Information Patent Application

    Method Of Processing DRAM
    • Publication number 20220238533
    • Publication date Jul 28, 2022
    • Applied Materials, Inc.
    • Lequn Liu
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SELECTIVE ANISOTROPIC METAL ETCH
    • Publication number 20220068661
    • Publication date Mar 3, 2022
    • Applied Materials, Inc.
    • Jonathan SHAW
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD OF PROCESSING DRAM
    • Publication number 20210035982
    • Publication date Feb 4, 2021
    • Applied Materials, Inc.
    • Lequn Liu
    • H01 - BASIC ELECTRIC ELEMENTS