Jonathan D. Chapple-Sokol

Person

Essex Junction, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Titanium tungsten liner used with copper interconnects
- Patent number 9,685,370
- Issue date Jun 20, 2017
- GLOBALFOUNDRIES Inc.
- Jonathan D. Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Achieving uniform capacitance between an electrostatic chuck and a...
- Patent number 9,196,519
- Issue date Nov 24, 2015
- GLOBALFOUNDRIES Inc.
- Shawn A. Adderly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electromigration resistant aluminum-based metal interconnect structure
- Patent number 8,084,864
- Issue date Dec 27, 2011
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electromigration resistant aluminum-based metal interconnect structure
- Patent number 8,003,536
- Issue date Aug 23, 2011
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal seed layer deposition
- Patent number 7,879,716
- Issue date Feb 1, 2011
- International Business Machines Corporation
- Steven P Barkyoumb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Suppression of localized metal precipitate formation and correspond...
- Patent number 7,649,262
- Issue date Jan 19, 2010
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Suppression of localized metal precipitate formation and correspond...
- Patent number 7,572,650
- Issue date Aug 11, 2009
- International Business Machnines Corporation
- Jonathan D. Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal seed layer deposition
- Patent number 7,235,487
- Issue date Jun 26, 2007
- International Business Machines Corporation
- Steven P Barkyoumb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Suppression of localized metal precipitate formation and correspond...
- Patent number 7,173,338
- Issue date Feb 6, 2007
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming refractory metal contact in an opening, and resul...
- Patent number 6,762,121
- Issue date Jul 13, 2004
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Borderless contact to diffusion with respect to gate conductor and...
- Patent number 6,498,096
- Issue date Dec 24, 2002
- International Business Machines Corporation
- James Allan Bruce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metallurgy for semiconductor devices
- Patent number 6,426,558
- Issue date Jul 30, 2002
- International Business Machines Corporation
- Jonathan Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Borderless contact to diffusion with respect to gate conductor and...
- Patent number 6,215,190
- Issue date Apr 10, 2001
- International Business Machines Corporation
- James Allen Bruce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of aluminum oxide low pressure chemical vapor deposition (LP...
- Patent number 5,665,608
- Issue date Sep 9, 1997
- International Business Machines Corporation
- Jonathan Daniel Chapple-Sokol
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Aluminum oxide LPCVD system
- Patent number 5,648,113
- Issue date Jul 15, 1997
- International Business Machines Corporation
- Steven George Barbee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
One dimensional silicon quantum wire devices and the method of manu...
- Patent number 5,612,255
- Issue date Mar 18, 1997
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for depositing a titanium or tantalum nitride or nitride sil...
- Patent number 5,603,988
- Issue date Feb 18, 1997
- Morton International, Inc.
- Michael Shapiro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Aluminum oxide LPCVD system
- Patent number 5,540,777
- Issue date Jul 30, 1996
- International Business Machines Corporation
- Steven G. Barbee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluid delivery apparatus having an infrared feedline sensor
- Patent number 5,534,066
- Issue date Jul 9, 1996
- International Business Machines Corporation
- James A. O'Neill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching of silicon dioxide selectively to silicon nitride and polys...
- Patent number 5,505,816
- Issue date Apr 9, 1996
- International Business Machines Corporation
- Michael S. Barnes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluid delivery apparatus and method having an infrared feedline sensor
- Patent number 5,492,718
- Issue date Feb 20, 1996
- International Business Machines Corporation
- James A. O'Neill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual phase and hybrid phase shifting mask fabrication using a surfa...
- Patent number 5,465,859
- Issue date Nov 14, 1995
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aluminum oxide low pressure chemical vapor deposition (LPCVD) syste...
- Patent number 5,431,734
- Issue date Jul 11, 1995
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Storage capacitor with a conducting oxide electrode for metal-oxide...
- Patent number 5,383,088
- Issue date Jan 17, 1995
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making semiconductor quantum dot light emitting/detecting...
- Patent number 5,354,707
- Issue date Oct 11, 1994
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor quantum dot light emitting/detecting devices
- Patent number 5,293,050
- Issue date Mar 8, 1994
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Safe method for etching silicon dioxide
- Patent number 5,268,069
- Issue date Dec 7, 1993
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
LPCVD reactor for high efficiency, high uniformity deposition
- Patent number 5,134,963
- Issue date Aug 4, 1992
- International Business Machines Corporation
- Steven G. Barbee
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
TITANIUM TUNGSTEN LINER USED WITH COPPER INTERCONNECTS
- Publication number 20160181151
- Publication date Jun 23, 2016
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACHIEVING UNIFORM CAPACITANCE BETWEEN AN ELECTROSTATIC CHUCK AND A...
- Publication number 20150138686
- Publication date May 21, 2015
- International Business Machines Corporation
- Shawn A. Adderly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROMIGRATION RESISTANT ALUMINUM-BASED METAL INTERCONNECT STRUCTURE
- Publication number 20110221064
- Publication date Sep 15, 2011
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROMIGRATION RESISTANT ALUMINUM-BASED METAL INTERCONNECT STRUCTURE
- Publication number 20100237503
- Publication date Sep 23, 2010
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPRESSION OF LOCALIZED METAL PRECIPITATE FORMATION AND CORRESPOND...
- Publication number 20090294968
- Publication date Dec 3, 2009
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNGSTEN LINER FOR ALUMINUM-BASED ELECTROMIGRATION RESISTANT INTERC...
- Publication number 20090230555
- Publication date Sep 17, 2009
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL SEED LAYER DEPOSITION
- Publication number 20070155164
- Publication date Jul 5, 2007
- Steven P. Barkyoumb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPRESSION OF LOCALIZED METAL PRECIPITATE FORMATION AND CORRESPOND...
- Publication number 20070040277
- Publication date Feb 22, 2007
- Jonathan D. Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL SEED LAYER DEPOSITION
- Publication number 20050253265
- Publication date Nov 17, 2005
- International Business Machines Corporation
- Steven P. Barkyoumb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPRESSION OF LOCALIZED METAL PRECIPITATE FORMATION AND CORRESPOND...
- Publication number 20050194689
- Publication date Sep 8, 2005
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING REFRACTORY METAL CONTACT IN AN OPENING, AND RESUL...
- Publication number 20040191562
- Publication date Sep 30, 2004
- International Business Machines Corporation
- Jonathan Chapple-Sokol
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming refractory metal contact in an opening, and resul...
- Publication number 20030165705
- Publication date Sep 4, 2003
- International Business Machines Corporation
- Jonathan D. Chapple-Sokol
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for making air gap insulation for semiconducto...
- Publication number 20020145201
- Publication date Oct 10, 2002
- Douglas Scott Armbrust
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Borderless contact to diffusion with respect to gate conductor and...
- Publication number 20010019886
- Publication date Sep 6, 2001
- International Business Machines Corporation
- James Allan Bruce
- H01 - BASIC ELECTRIC ELEMENTS

Jonathan D. Chapple-Sokol

Person

Patents Grantslast 30 patents

Titanium tungsten liner used with copper interconnects

Achieving uniform capacitance between an electrostatic chuck and a...

Electromigration resistant aluminum-based metal interconnect structure

Electromigration resistant aluminum-based metal interconnect structure

Metal seed layer deposition

Suppression of localized metal precipitate formation and correspond...

Suppression of localized metal precipitate formation and correspond...

Metal seed layer deposition

Suppression of localized metal precipitate formation and correspond...

Method of forming refractory metal contact in an opening, and resul...

Borderless contact to diffusion with respect to gate conductor and...

Metallurgy for semiconductor devices

Borderless contact to diffusion with respect to gate conductor and...

Method of aluminum oxide low pressure chemical vapor deposition (LP...

Aluminum oxide LPCVD system

One dimensional silicon quantum wire devices and the method of manu...

Method for depositing a titanium or tantalum nitride or nitride sil...

Aluminum oxide LPCVD system

Fluid delivery apparatus having an infrared feedline sensor

Etching of silicon dioxide selectively to silicon nitride and polys...

Fluid delivery apparatus and method having an infrared feedline sensor

Dual phase and hybrid phase shifting mask fabrication using a surfa...

Aluminum oxide low pressure chemical vapor deposition (LPCVD) syste...

Storage capacitor with a conducting oxide electrode for metal-oxide...

Method of making semiconductor quantum dot light emitting/detecting...

Semiconductor quantum dot light emitting/detecting devices

Safe method for etching silicon dioxide

LPCVD reactor for high efficiency, high uniformity deposition

Patents Applicationslast 30 patents

TITANIUM TUNGSTEN LINER USED WITH COPPER INTERCONNECTS

ACHIEVING UNIFORM CAPACITANCE BETWEEN AN ELECTROSTATIC CHUCK AND A...

ELECTROMIGRATION RESISTANT ALUMINUM-BASED METAL INTERCONNECT STRUCTURE

ELECTROMIGRATION RESISTANT ALUMINUM-BASED METAL INTERCONNECT STRUCTURE

SUPPRESSION OF LOCALIZED METAL PRECIPITATE FORMATION AND CORRESPOND...

TUNGSTEN LINER FOR ALUMINUM-BASED ELECTROMIGRATION RESISTANT INTERC...

METAL SEED LAYER DEPOSITION

SUPPRESSION OF LOCALIZED METAL PRECIPITATE FORMATION AND CORRESPOND...

METAL SEED LAYER DEPOSITION

SUPPRESSION OF LOCALIZED METAL PRECIPITATE FORMATION AND CORRESPOND...

METHOD OF FORMING REFRACTORY METAL CONTACT IN AN OPENING, AND RESUL...

Method of forming refractory metal contact in an opening, and resul...

Method and apparatus for making air gap insulation for semiconducto...

Borderless contact to diffusion with respect to gate conductor and...