Jonathan G. England

Person

Horsham, GB

People

Patents Grantslast 30 patents

Information Patent Grant
In situ angle measurement using channeling
- Patent number 11,387,073
- Issue date Jul 12, 2022
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of doping a polycrystalline transistor channel for vertical...
- Patent number 9,018,064
- Issue date Apr 28, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Andrew M. Waite
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for generating three dimensional structures
- Patent number 8,937,019
- Issue date Jan 20, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan G. England
- B44 - DECORATIVE ARTS
Information Patent Grant
Method of implanting high aspect ratio features
- Patent number 8,846,508
- Issue date Sep 30, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan Gerald England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for temperature-controlled ion implantation
- Patent number 8,450,193
- Issue date May 28, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan Gerald England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for low-temperature ion implantation
- Patent number 8,319,196
- Issue date Nov 27, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan G. England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam assisted modification of thin film materials
- Patent number 8,003,498
- Issue date Aug 23, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan G. England
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Techniques for temperature controlled ion implantation
- Patent number 7,993,698
- Issue date Aug 9, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Julian Blake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for low-temperature ion implantation
- Patent number 7,935,942
- Issue date May 3, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring energy contamination using time-of-flight techniques
- Patent number 7,888,636
- Issue date Feb 15, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Bon Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for temperature-controlled ion implantation
- Patent number 7,655,933
- Issue date Feb 2, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan Gerald England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for forming shallow junctions
- Patent number 7,642,150
- Issue date Jan 5, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Edwin A. Arevalo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation device with a dual pumping mode and method thereof
- Patent number 7,622,722
- Issue date Nov 24, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan Gerald England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for improving ion implantation based on ion beam angle-re...
- Patent number 7,561,983
- Issue date Jul 14, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Atul Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for providing a ribbon-shaped gas cluster ion beam
- Patent number 7,547,900
- Issue date Jun 16, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Anthony Renau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for low-temperature ion implantation
- Patent number 7,528,392
- Issue date May 5, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan Gerald England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for preventing parasitic beamlets from affecting ion imp...
- Patent number 7,482,598
- Issue date Jan 27, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Russell J. Low
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for reducing effects of photoresist outgassing
- Patent number 7,476,878
- Issue date Jan 13, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Russell J. Low
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for improving ion implanter productivity
- Patent number 7,446,326
- Issue date Nov 4, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Craig R. Chaney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for glitch recovery in stationary-beam ion im...
- Patent number 7,361,913
- Issue date Apr 22, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Russell J. Low
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for uniformity tuning in an ion implanter system
- Patent number 7,355,188
- Issue date Apr 8, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam apparatus and a method for neutralizing space charge in an...
- Patent number 6,515,408
- Issue date Feb 4, 2003
- Applied Materials, Inc.
- Jonathan Gerald England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam stop apparatus for an ion implanter
- Patent number 6,093,456
- Issue date Jul 25, 2000
- Applied Materials, Inc.
- Jonathan Gerald England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for ion beam scanning in an ion implanter
- Patent number 6,060,715
- Issue date May 9, 2000
- Applied Materials, Inc.
- Jonathan Gerald England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter with post mass selection deceleration
- Patent number 5,969,366
- Issue date Oct 19, 1999
- Applied Materials, Inc.
- Jonathan Gerald England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter with post mass selection deceleration
- Patent number 5,932,882
- Issue date Aug 3, 1999
- Applied Materials, Inc.
- Jonathan Gerald England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and a method of monitoring high energy n...
- Patent number 5,883,391
- Issue date Mar 16, 1999
- Applied Materials, Inc.
- Babak Adibi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spectrum analyzer in an ion implanter
- Patent number 5,457,324
- Issue date Oct 10, 1995
- Applied Materials, Inc.
- David G. Armour
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma flood system for the reduction of charging of wafers during...
- Patent number 5,399,871
- Issue date Mar 21, 1995
- Applied Materials, Inc.
- Hiroyuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spectrum analyzer in an ion implanter
- Patent number 5,384,465
- Issue date Jan 24, 1995
- Applied Materials, Inc.
- David G. Armour
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
In Situ Angle Measurement Using Channeling
- Publication number 20210305011
- Publication date Sep 30, 2021
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR GENERATING THREE DIMENSIONAL STRUCTURES
- Publication number 20130284697
- Publication date Oct 31, 2013
- Jonathan G. England
- B44 - DECORATIVE ARTS
Information Patent Application
TECHNIQUE FOR LOW-TEMPERATURE ION IMPLANTATION
- Publication number 20110207308
- Publication date Aug 25, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan G. ENGLAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM ASSISTED MODIFICATION OF THIN FILM MATERIALS
- Publication number 20090124064
- Publication date May 14, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan G. ENGLAND
- C30 - CRYSTAL GROWTH
Information Patent Application
PARTICLE BEAM ASSISTED MODIFICATION OF THIN FILM MATERIALS
- Publication number 20090124066
- Publication date May 14, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan G. ENGLAND
- C30 - CRYSTAL GROWTH
Information Patent Application
PARTICLE BEAM ASSISTED MODIFICATION OF THIN FILM MATERIALS
- Publication number 20090124065
- Publication date May 14, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan G. ENGLAND
- C30 - CRYSTAL GROWTH
Information Patent Application
MEASURING ENERGY CONTAMINATION USING TIME-OF-FLIGHT TECHNIQUES
- Publication number 20090114813
- Publication date May 7, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Bon Woong KOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE WAFER IMPLANTER FOR SILICON-ON-INSULATOR WAFER FABRICATION
- Publication number 20090084988
- Publication date Apr 2, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Julian Blake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR PROVIDING A RIBBON-SHAPED GAS CLUSTER ION BEAM
- Publication number 20080149826
- Publication date Jun 26, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Anthony RENAU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR LOW-TEMPERATURE ION IMPLANTATION
- Publication number 20080124903
- Publication date May 29, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan Gerald ENGLAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR LOW-TEMPERATURE ION IMPLANTATION
- Publication number 20080121821
- Publication date May 29, 2008
- Varian Semiconductor Equipment Associates Inc.
- Richard Stephen Muka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUES FOR FORMING SHALLOW JUNCTIONS
- Publication number 20080108208
- Publication date May 8, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Edwin A. Arevalo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION DEVICE WITH A DUAL PUMPING MODE AND METHOD THEREOF
- Publication number 20080105833
- Publication date May 8, 2008
- Varian Semiconductor Equipment Associates,
- Jonathan Gerald England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR REMOVING MOLECULAR FRAGMENTS FROM AN ION IMPLANTER
- Publication number 20080105828
- Publication date May 8, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Christopher R. HATEM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUE FOR IMPROVING ION IMPLANTATION BASED ON ION BEAM ANGLE-RE...
- Publication number 20080078952
- Publication date Apr 3, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Atul GUPTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Techniques for temperature controlled ion implantation
- Publication number 20080076194
- Publication date Mar 27, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Julian Blake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for low-temperature ion implantation
- Publication number 20080044938
- Publication date Feb 21, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR TEMPERATURE-CONTROLLED ION IMPLANTATION
- Publication number 20080044257
- Publication date Feb 21, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan Gerald ENGLAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR TEMPERATURE-CONTROLLED ION IMPLANTATION
- Publication number 20080042078
- Publication date Feb 21, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan Gerald ENGLAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of implanting ions and ion sources used for same
- Publication number 20070178678
- Publication date Aug 2, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Christopher Hatem
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUES FOR REDUCING EFFECTS OF PHOTORESIST OUTGASSING
- Publication number 20070125957
- Publication date Jun 7, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Russell J. Low
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR PREVENTING PARASITIC BEAMLETS FROM AFFECTING ION IMP...
- Publication number 20070125955
- Publication date Jun 7, 2007
- Varian Semiconductor Equipment Associates Inc.
- Russell J. LOW
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for improving ion implanter productivity
- Publication number 20070045570
- Publication date Mar 1, 2007
- Craig R. Chaney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for uniformity tuning in an ion implanter system
- Publication number 20060284114
- Publication date Dec 21, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for glitch recovery in stationary-beam ion im...
- Publication number 20060219954
- Publication date Oct 5, 2006
- Russell J. Low
- H01 - BASIC ELECTRIC ELEMENTS

Jonathan G. England

Person

Patents Grantslast 30 patents

In situ angle measurement using channeling

Method of doping a polycrystalline transistor channel for vertical...

Techniques for generating three dimensional structures

Method of implanting high aspect ratio features

Techniques for temperature-controlled ion implantation

Technique for low-temperature ion implantation

Particle beam assisted modification of thin film materials

Techniques for temperature controlled ion implantation

Technique for low-temperature ion implantation

Measuring energy contamination using time-of-flight techniques

Techniques for temperature-controlled ion implantation

Techniques for forming shallow junctions

Ion implantation device with a dual pumping mode and method thereof

Technique for improving ion implantation based on ion beam angle-re...

Techniques for providing a ribbon-shaped gas cluster ion beam

Techniques for low-temperature ion implantation

Techniques for preventing parasitic beamlets from affecting ion imp...

Techniques for reducing effects of photoresist outgassing

Technique for improving ion implanter productivity

Methods and apparatus for glitch recovery in stationary-beam ion im...

Technique for uniformity tuning in an ion implanter system

Ion beam apparatus and a method for neutralizing space charge in an...

Beam stop apparatus for an ion implanter

Method and apparatus for ion beam scanning in an ion implanter

Ion implanter with post mass selection deceleration

Ion implanter with post mass selection deceleration

Ion implantation apparatus and a method of monitoring high energy n...

Spectrum analyzer in an ion implanter

Plasma flood system for the reduction of charging of wafers during...

Spectrum analyzer in an ion implanter

Patents Applicationslast 30 patents

In Situ Angle Measurement Using Channeling

TECHNIQUES FOR GENERATING THREE DIMENSIONAL STRUCTURES

TECHNIQUE FOR LOW-TEMPERATURE ION IMPLANTATION

PARTICLE BEAM ASSISTED MODIFICATION OF THIN FILM MATERIALS

PARTICLE BEAM ASSISTED MODIFICATION OF THIN FILM MATERIALS

PARTICLE BEAM ASSISTED MODIFICATION OF THIN FILM MATERIALS

MEASURING ENERGY CONTAMINATION USING TIME-OF-FLIGHT TECHNIQUES

SINGLE WAFER IMPLANTER FOR SILICON-ON-INSULATOR WAFER FABRICATION

TECHNIQUES FOR PROVIDING A RIBBON-SHAPED GAS CLUSTER ION BEAM

TECHNIQUES FOR LOW-TEMPERATURE ION IMPLANTATION

TECHNIQUES FOR LOW-TEMPERATURE ION IMPLANTATION

TECHNIQUES FOR FORMING SHALLOW JUNCTIONS

ION IMPLANTATION DEVICE WITH A DUAL PUMPING MODE AND METHOD THEREOF

TECHNIQUES FOR REMOVING MOLECULAR FRAGMENTS FROM AN ION IMPLANTER

TECHNIQUE FOR IMPROVING ION IMPLANTATION BASED ON ION BEAM ANGLE-RE...

Techniques for temperature controlled ion implantation

Technique for low-temperature ion implantation

TECHNIQUES FOR TEMPERATURE-CONTROLLED ION IMPLANTATION

TECHNIQUES FOR TEMPERATURE-CONTROLLED ION IMPLANTATION

Methods of implanting ions and ion sources used for same

TECHNIQUES FOR REDUCING EFFECTS OF PHOTORESIST OUTGASSING

TECHNIQUES FOR PREVENTING PARASITIC BEAMLETS FROM AFFECTING ION IMP...

Technique for improving ion implanter productivity

Technique for uniformity tuning in an ion implanter system

Methods and apparatus for glitch recovery in stationary-beam ion im...