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Jonathan Jung-Ching Ho
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Fremont, CA, US
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last 30 patents
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Patent Grant
Double exposure semiconductor process for improved process margin
Patent number
7,951,722
Issue date
May 31, 2011
Xilinx, Inc.
Jonathan Jung-Ching Ho
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of fabricating CMOS devices using fluid-based dielectric mat...
Patent number
7,737,020
Issue date
Jun 15, 2010
Xilinx, Inc.
Jonathan Jung-Ching Ho
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Method and apparatus for compensating an integrated circuit layout...
Patent number
7,673,270
Issue date
Mar 2, 2010
Xilinx, Inc.
Yan Wang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
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Patent Application
Double exposure semiconductor process for improved process margin
Publication number
20090042389
Publication date
Feb 12, 2009
Xilinx, Inc.
Jonathan Jung-Ching Ho
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY