Jong Yoon Kim

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Spin-orbit torque MRAM structure and manufacture thereof
- Patent number 12,201,030
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Minrui Yu
- G01 - MEASURING TESTING
Information Patent Grant
System for providing interactive participation-type drawing making...
- Patent number 12,141,433
- Issue date Nov 12, 2024
- i-Scream arts Co., Ltd.
- Jong-min Kim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Silicon carbon nanocomposite (SCN) material, fabrication process th...
- Patent number 12,057,588
- Issue date Aug 6, 2024
- EoCell Limited
- Bong Chull Kim
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Spin-orbit torque MRAM structure and manufacture thereof
- Patent number 11,723,283
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Minrui Yu
- G11 - INFORMATION STORAGE
Information Patent Grant
Apparatus, system, and method for integrating conductive coil with...
- Patent number 11,662,871
- Issue date May 30, 2023
- Meta Platforms Technologies, LLC
- Young Bae Kim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Carbon layer covered mask in 3D applications
- Patent number 11,384,428
- Issue date Jul 12, 2022
- Applied Materials, Inc.
- Mang-Mang Ling
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Damage free metal conductor formation
- Patent number 11,289,342
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etching a structure for MRAM applications
- Patent number 11,145,808
- Issue date Oct 12, 2021
- Applied Materials, Inc.
- Jong Mun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Residual removal
- Patent number 10,964,527
- Issue date Mar 30, 2021
- Applied Materials, Inc.
- Jong Mun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching copper indium gallium selenide (CIGS) material
- Patent number 10,957,548
- Issue date Mar 23, 2021
- Applied Materials, Inc.
- Mang-Mang Ling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of patterning nickel silicide layers on a semiconductor device
- Patent number 10,692,734
- Issue date Jun 23, 2020
- Applied Materials, Inc.
- Jong Mun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Damage free metal conductor formation
- Patent number 10,685,849
- Issue date Jun 16, 2020
- Applied Materials, Inc.
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon dioxide-polysilicon multi-layered stack etching with plasma...
- Patent number 10,643,854
- Issue date May 5, 2020
- Applied Materials, Inc.
- Daisuke Shimizu
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Recursive pumping for symmetrical gas exhaust to control critical d...
- Patent number 9,909,213
- Issue date Mar 6, 2018
- Applied Materials, Inc.
- Sergio Fukuda Shoji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching oxide-nitride stacks using C4F6H2
- Patent number 9,748,366
- Issue date Aug 29, 2017
- Applied Materials, Inc.
- Jong Mun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for obtaining 3D face model using portable camera
- Patent number 9,710,912
- Issue date Jul 18, 2017
- TRICUBICS INC.
- Jong Min Kim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Maintaining mask integrity to form openings in wafers
- Patent number 9,589,832
- Issue date Mar 7, 2017
- Applied Materials, Inc.
- Daisuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch processes for opening mask layers
- Patent number 9,305,804
- Issue date Apr 5, 2016
- Applied Materials, Inc.
- Jong Mun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon dioxide-polysilicon multi-layered stack etching with plasma...
- Patent number 9,299,574
- Issue date Mar 29, 2016
- Applied Materials, Inc.
- Daisuke Shimizu
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Methods for etching materials using synchronized RF pulses
- Patent number 9,269,587
- Issue date Feb 23, 2016
- Applied Materials, Inc.
- Daisuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Boron-doped carbon-based hardmask etch processing
- Patent number 9,129,911
- Issue date Sep 8, 2015
- Applied Materials, Inc.
- Kenny Linh Doan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch processes for boron-doped carbonaceous mask layers
- Patent number 8,778,207
- Issue date Jul 15, 2014
- Applied Materials, Inc.
- Jong Mun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching substrate
- Patent number 8,668,837
- Issue date Mar 11, 2014
- Applied Materials, Inc.
- Kenny Linh Doan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Maintaining mask integrity to form openings in wafers
- Patent number 8,603,921
- Issue date Dec 10, 2013
- Applied Materials, Inc.
- Daisuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor with distribution of etch gases across a wafer...
- Patent number 8,187,415
- Issue date May 29, 2012
- Applied Materials, Inc.
- Jong Mun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Halogen-free amorphous carbon mask etch having high selectivity to...
- Patent number 7,807,064
- Issue date Oct 5, 2010
- Applied Materials, Inc.
- Jong Mun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for distributed network authentication and access control
- Patent number 7,185,360
- Issue date Feb 27, 2007
- Hereuare Communications, Inc.
- Francis M. Anton, Jr.
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
High-speed internet access system
- Patent number 7,002,971
- Issue date Feb 21, 2006
- Hybrid Patents Incorporated
- Frederick Enns
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
High-speed internet access system
- Patent number 6,785,288
- Issue date Aug 31, 2004
- Hybrid Patents Incorporated
- Frederick Enns
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
High-speed internet access system
- Patent number 6,658,010
- Issue date Dec 2, 2003
- Hybrid Networks, Inc.
- Frederick Enns
- H04 - ELECTRIC COMMUNICATION TECHNIQUE

Patents Applicationslast 30 patents

Information Patent Application
FABRICATION OF HIGH ASPECT RATIO ELECTRONIC DEVICES WITH MINIMAL SI...
- Publication number 20240321641
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Hao Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REDUCING MICRO AND MACRO SCALLOPING ON SEMICONDUCTOR DE...
- Publication number 20240249936
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Mang-Mang LING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPIN-ORBIT TORQUE MRAM STRUCTURE AND MANUFACTURE THEREOF
- Publication number 20230389441
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Minrui YU
- G11 - INFORMATION STORAGE
Information Patent Application
ARTIFICIAL INTELLIGENCE SYSTEM TO PROVIDE SYNERGISTIC EDUCATION LIN...
- Publication number 20230351907
- Publication date Nov 2, 2023
- I-SCREAM ARTS CO., LTD.
- Ji-hoon KIM
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Application
SYSTEMS FOR PROVIDING RESPONSIVE-TYPE DRAWING MAKING SERVICE AND ME...
- Publication number 20230334734
- Publication date Oct 19, 2023
- Pabloarts Company Inc.
- Jong-min KIM
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM FOR PROVIDING INTERACTIVE PARTICIPATION-TYPE DRAWING MAKING...
- Publication number 20230325070
- Publication date Oct 12, 2023
- Pabloarts Company Inc.
- Jong-min KIM
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SPIN-ORBIT TORQUE MRAM STRUCTURE AND MANUFACTURE THEREOF
- Publication number 20210351342
- Publication date Nov 11, 2021
- Applied Materials, Inc.
- Minrui YUI
- G11 - INFORMATION STORAGE
Information Patent Application
MAGNETIC MEMORY AND METHOD OF FABRICATION
- Publication number 20210234091
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Jong Mun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for etching a structure for MRAM Applications
- Publication number 20210143323
- Publication date May 13, 2021
- Applied Materials, Inc.
- Jong Mun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON LAYER COVERED MASK IN 3D APPLICATIONS
- Publication number 20210017641
- Publication date Jan 21, 2021
- Applied Materials, Inc.
- Mang-Mang LING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon Carbon Nanocomposite (SCN) Material, Fabrication Process Th...
- Publication number 20200354222
- Publication date Nov 12, 2020
- EoCell Limited
- Bong Chull KIM
- B82 - NANO-TECHNOLOGY
Information Patent Application
DAMAGE FREE METAL CONDUCTOR FORMATION
- Publication number 20200350178
- Publication date Nov 5, 2020
- Applied Materials, Inc.
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING COPPER INDIUM GALLIUM SELENIDE (CIGS) MATERIAL
- Publication number 20200152470
- Publication date May 14, 2020
- Applied Materials, Inc.
- MANG-MANG LING
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHODS OF PATTERNING NICKEL SILICIDE LAYERS ON A SEMICONDUCTOR DEVICE
- Publication number 20200135492
- Publication date Apr 30, 2020
- Applied Materials, Inc.
- JONG MUN KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIDUAL REMOVAL
- Publication number 20190393024
- Publication date Dec 26, 2019
- Applied Materials, Inc.
- Jong Mun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RECURSIVE PUMPING FOR SYMMETRICAL GAS EXHAUST TO CONTROL CRITICAL D...
- Publication number 20180142354
- Publication date May 24, 2018
- Applied Materials, Inc.
- Sergio Fukuda SHOJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON DIOXIDE-POLYSILICON MULTI-LAYERED STACK ETCHING WITH PLASMA...
- Publication number 20160086771
- Publication date Mar 24, 2016
- Daisuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PROVIDING VIRTUAL PLASTIC SURGERY SNS SERVICE
- Publication number 20150272691
- Publication date Oct 1, 2015
- Tricubics Inc.
- Jong Min KIM
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
METHOD AND APPARATUS FOR OBTAINING 3D FACE MODEL USING PORTABLE CAMERA
- Publication number 20150279044
- Publication date Oct 1, 2015
- Tricubics Inc.
- Jong Min KIM
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ETCHING OXIDE-NITRIDE STACKS USING C4F6H2
- Publication number 20150097276
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Jong Mun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCH PROCESSES FOR OPENING MASK LAYERS
- Publication number 20150099367
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Jong Mun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCHING MATERIALS USING SYNCHRONIZED RF PULSES
- Publication number 20150072530
- Publication date Mar 12, 2015
- Applied Materials, Inc.
- Jong Mun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RECURSIVE PUMPING FOR SYMMETRICAL GAS EXHAUST TO CONTROL CRITICAL D...
- Publication number 20150041061
- Publication date Feb 12, 2015
- Applied Materials, Inc.
- Sergio Fukuda SHOJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS KIT FOR EDGE CRITICAL DIMENSION UNIFORMITY CONTROL
- Publication number 20150001180
- Publication date Jan 1, 2015
- Applied Materials, Inc.
- Kenny Linh DOAN
- B32 - LAYERED PRODUCTS
Information Patent Application
ETCH PROCESS HAVING ADAPTIVE CONTROL WITH ETCH DEPTH OF PRESSURE AN...
- Publication number 20140342570
- Publication date Nov 20, 2014
- Applied Materials, Inc.
- Kenny Linh Doan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BORON-DOPED CARBON-BASED HARDMASK ETCH PROCESSING
- Publication number 20140213059
- Publication date Jul 31, 2014
- Kenny Linh Doan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON DIOXIDE-POLYSILICON MULTI-LAYERED STACK ETCHING WITH PLASMA...
- Publication number 20140213062
- Publication date Jul 31, 2014
- Daisuke SHIMIZU
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
MAINTAINING MASK INTEGRITY TO FORM OPENINGS IN WAFERS
- Publication number 20140065824
- Publication date Mar 6, 2014
- Daisuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCHING OXIDE LAYERS USING PROCESS GAS PULSING
- Publication number 20130224960
- Publication date Aug 29, 2013
- Applied Materials, Inc.
- Jairaj Payyapilly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF POLYMERS DEPOSITION FOR FORMING REDUCED CRITICAL DIMENSIONS
- Publication number 20130122707
- Publication date May 16, 2013
- Daisuke Shimizu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Jong Yoon Kim

Person

Patents Grantslast 30 patents

Spin-orbit torque MRAM structure and manufacture thereof

System for providing interactive participation-type drawing making...

Silicon carbon nanocomposite (SCN) material, fabrication process th...

Spin-orbit torque MRAM structure and manufacture thereof

Apparatus, system, and method for integrating conductive coil with...

Carbon layer covered mask in 3D applications

Damage free metal conductor formation

Methods for etching a structure for MRAM applications

Residual removal

Method of etching copper indium gallium selenide (CIGS) material

Methods of patterning nickel silicide layers on a semiconductor device

Damage free metal conductor formation

Silicon dioxide-polysilicon multi-layered stack etching with plasma...

Recursive pumping for symmetrical gas exhaust to control critical d...

Etching oxide-nitride stacks using C4F6H2

Method and apparatus for obtaining 3D face model using portable camera

Maintaining mask integrity to form openings in wafers

Plasma etch processes for opening mask layers

Silicon dioxide-polysilicon multi-layered stack etching with plasma...

Methods for etching materials using synchronized RF pulses

Boron-doped carbon-based hardmask etch processing

Plasma etch processes for boron-doped carbonaceous mask layers

Method for etching substrate

Maintaining mask integrity to form openings in wafers

Plasma etch reactor with distribution of etch gases across a wafer...

Halogen-free amorphous carbon mask etch having high selectivity to...

System for distributed network authentication and access control

High-speed internet access system

High-speed internet access system

High-speed internet access system

Patents Applicationslast 30 patents

FABRICATION OF HIGH ASPECT RATIO ELECTRONIC DEVICES WITH MINIMAL SI...

METHODS FOR REDUCING MICRO AND MACRO SCALLOPING ON SEMICONDUCTOR DE...

SPIN-ORBIT TORQUE MRAM STRUCTURE AND MANUFACTURE THEREOF

ARTIFICIAL INTELLIGENCE SYSTEM TO PROVIDE SYNERGISTIC EDUCATION LIN...

SYSTEMS FOR PROVIDING RESPONSIVE-TYPE DRAWING MAKING SERVICE AND ME...

SYSTEM FOR PROVIDING INTERACTIVE PARTICIPATION-TYPE DRAWING MAKING...

SPIN-ORBIT TORQUE MRAM STRUCTURE AND MANUFACTURE THEREOF

MAGNETIC MEMORY AND METHOD OF FABRICATION

Methods for etching a structure for MRAM Applications

CARBON LAYER COVERED MASK IN 3D APPLICATIONS

Silicon Carbon Nanocomposite (SCN) Material, Fabrication Process Th...

DAMAGE FREE METAL CONDUCTOR FORMATION

METHOD OF ETCHING COPPER INDIUM GALLIUM SELENIDE (CIGS) MATERIAL

METHODS OF PATTERNING NICKEL SILICIDE LAYERS ON A SEMICONDUCTOR DEVICE

RESIDUAL REMOVAL

RECURSIVE PUMPING FOR SYMMETRICAL GAS EXHAUST TO CONTROL CRITICAL D...

SILICON DIOXIDE-POLYSILICON MULTI-LAYERED STACK ETCHING WITH PLASMA...

METHOD AND APPARATUS FOR PROVIDING VIRTUAL PLASTIC SURGERY SNS SERVICE

METHOD AND APPARATUS FOR OBTAINING 3D FACE MODEL USING PORTABLE CAMERA

ETCHING OXIDE-NITRIDE STACKS USING C4F6H2

PLASMA ETCH PROCESSES FOR OPENING MASK LAYERS

METHODS FOR ETCHING MATERIALS USING SYNCHRONIZED RF PULSES

RECURSIVE PUMPING FOR SYMMETRICAL GAS EXHAUST TO CONTROL CRITICAL D...

PROCESS KIT FOR EDGE CRITICAL DIMENSION UNIFORMITY CONTROL

ETCH PROCESS HAVING ADAPTIVE CONTROL WITH ETCH DEPTH OF PRESSURE AN...

BORON-DOPED CARBON-BASED HARDMASK ETCH PROCESSING

SILICON DIOXIDE-POLYSILICON MULTI-LAYERED STACK ETCHING WITH PLASMA...

MAINTAINING MASK INTEGRITY TO FORM OPENINGS IN WAFERS

METHODS FOR ETCHING OXIDE LAYERS USING PROCESS GAS PULSING

METHODS OF POLYMERS DEPOSITION FOR FORMING REDUCED CRITICAL DIMENSIONS