Jongwoo Sun

Person

Seoul, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate treating apparatus and substrate treating system having t...
- Patent number 12,087,554
- Issue date Sep 10, 2024
- Samsung Electronics Co., Ltd.
- Sungyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for monitoring substrate processing apparatus
- Patent number 12,068,140
- Issue date Aug 20, 2024
- Samsung Electronics Co., Ltd.
- Sejin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma etching
- Patent number 11,984,304
- Issue date May 14, 2024
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and semiconductor device manufacturing...
- Patent number 11,929,239
- Issue date Mar 12, 2024
- Samsung Electronics Co., Ltd.
- Sejin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing equipment including electrostatic chuck fo...
- Patent number 11,862,440
- Issue date Jan 2, 2024
- Samsung Electronics Co., Ltd.
- Jeongil Mun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming plasma processing apparatus, related apparatus, a...
- Patent number 11,715,628
- Issue date Aug 1, 2023
- Samsung Electronics Co., Ltd.
- Jeongil Mun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitively-coupled plasma substrate processing apparatus includin...
- Patent number 11,450,545
- Issue date Sep 20, 2022
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus
- Patent number 11,430,679
- Issue date Aug 30, 2022
- Samsung Electronics Co., Ltd.
- Kwangnam Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method of manufacturing semiconduct...
- Patent number 11,348,760
- Issue date May 31, 2022
- Samsung Electronics Co., Ltd.
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sensor device and etching apparatus having the same
- Patent number 11,264,291
- Issue date Mar 1, 2022
- Samsung Electronics Co., Ltd.
- Seeyub Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply assembly and substrate processing apparatus including th...
- Patent number 11,251,022
- Issue date Feb 15, 2022
- Samsung Electronics Co., Ltd.
- Kangmin Jeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing module, and se...
- Patent number 11,215,506
- Issue date Jan 4, 2022
- Samsung Electronics Co., Ltd.
- Kyeonghun Kim
- G01 - MEASURING TESTING
Information Patent Grant
Optical emission spectroscopy system, method of calibrating the sam...
- Patent number 11,092,495
- Issue date Aug 17, 2021
- Samsung Electronics Co., Ltd.
- Jeongil Mun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing module, and se...
- Patent number 10,935,429
- Issue date Mar 2, 2021
- Samsung Electronics Co., Ltd.
- Kyeonghun Kim
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing apparatus, substrate processing method, and me...
- Patent number 10,892,145
- Issue date Jan 12, 2021
- Samsung Electronics Co., Ltd.
- Sejin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection apparatus and substrate processing system incl...
- Patent number 10,861,724
- Issue date Dec 8, 2020
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching substrate
- Patent number 10,643,858
- Issue date May 5, 2020
- Samsung Electronics Co., Ltd.
- Eunwoo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment system including cover plate to insulate window
- Patent number 10,431,432
- Issue date Oct 1, 2019
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR MONITORING SUBSTRATE PROCESSING APPARATUS
- Publication number 20240371611
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- SEJIN OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA ETCHING
- Publication number 20240258084
- Publication date Aug 1, 2024
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA ETCHING
- Publication number 20220328291
- Publication date Oct 13, 2022
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING...
- Publication number 20220223385
- Publication date Jul 14, 2022
- Samsung Electronics Co., Ltd.
- Sejin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR MONITORING SUBSTRATE PROCESSING APPARATUS
- Publication number 20220199374
- Publication date Jun 23, 2022
- Samsung Electronics Co., Ltd.
- SEJIN OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING EQUIPMENT INCLUDING ELECTROSTATIC CHUCK FO...
- Publication number 20220189746
- Publication date Jun 16, 2022
- Samsung Electronics Co., Ltd.
- JEONGIL MUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHODS OF MANUFACTURING SEMICONDUC...
- Publication number 20220165550
- Publication date May 26, 2022
- Samsung Electronics Co., Ltd.
- Kyoungchon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PLASMA PROCESSING APPARATUS, RELATED APPARATUS, A...
- Publication number 20220044912
- Publication date Feb 10, 2022
- Samsung Electronics Co., Ltd.
- Jeongil MUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING MODULE, AND SE...
- Publication number 20210148760
- Publication date May 20, 2021
- Samsung Electronics Co., Ltd.
- Kyeonghun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20210142985
- Publication date May 13, 2021
- Samsung Electronics Co., Ltd.
- AKIRA KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS INCLUDING TH...
- Publication number 20210104381
- Publication date Apr 8, 2021
- Samsung Electronics Co., Ltd.
- Kangmin JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20210035830
- Publication date Feb 4, 2021
- Samsung Electronics Co., Ltd.
- Kwangnam KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING SYSTEM HAVING T...
- Publication number 20210027993
- Publication date Jan 28, 2021
- Samsung Electronics Co., Ltd.
- Sungyeon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DEVICE AND ETCHING APPARATUS HAVING THE SAME
- Publication number 20200411390
- Publication date Dec 31, 2020
- Samsung Electronics Co., Ltd.
- SEEYUB YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVELY-COUPLED PLASMA SUBSTRATE PROCESSING APPARATUS INCLUDIN...
- Publication number 20200335376
- Publication date Oct 22, 2020
- Samsung Electronics Co., Ltd.
- Jongwoo SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING MODULE, AND SE...
- Publication number 20200209063
- Publication date Jul 2, 2020
- Samsung Electronics Co., Ltd.
- Kyeonghun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...
- Publication number 20200168443
- Publication date May 28, 2020
- Samsung Electronics Co., Ltd.
- SEJIN OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL EMISSION SPECTROSCOPY SYSTEM, METHOD OF CALIBRATING THE SAM...
- Publication number 20200049560
- Publication date Feb 13, 2020
- Samsung Electronics Co., Ltd.
- Jeongil MUN
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF ETCHING SUBSTRATE
- Publication number 20190109010
- Publication date Apr 11, 2019
- Samsung Electronics Co., Ltd.
- EUNWOO LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND METHOD OF...
- Publication number 20190096636
- Publication date Mar 28, 2019
- Samsung Electronics Co., Ltd.
- Sang Ki NAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE INSPECTION APPARATUS AND SUBSTRATE PROCESSING SYSTEM INCL...
- Publication number 20190080944
- Publication date Mar 14, 2019
- Samsung Electronics Co., Ltd.
- Jongwoo SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cover Plate, Plasma Treatment System Including the Same and Plasma...
- Publication number 20170047235
- Publication date Feb 16, 2017
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS
- Publication number 20170032988
- Publication date Feb 2, 2017
- Samsung Electronics Co., Ltd.
- Myoung Soo PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS APPARATUS HAVING VIEW PORT
- Publication number 20160141148
- Publication date May 19, 2016
- Jongwoo SUN
- H01 - BASIC ELECTRIC ELEMENTS

Jongwoo Sun

Person

Patents Grantslast 30 patents

Substrate treating apparatus and substrate treating system having t...

Method and system for monitoring substrate processing apparatus

Apparatus and method for plasma etching

Plasma processing apparatus and semiconductor device manufacturing...

Semiconductor processing equipment including electrostatic chuck fo...

Method of forming plasma processing apparatus, related apparatus, a...

Capacitively-coupled plasma substrate processing apparatus includin...

Semiconductor manufacturing apparatus

Plasma processing apparatus and method of manufacturing semiconduct...

Sensor device and etching apparatus having the same

Gas supply assembly and substrate processing apparatus including th...

Substrate processing apparatus, substrate processing module, and se...

Optical emission spectroscopy system, method of calibrating the sam...

Substrate processing apparatus, substrate processing module, and se...

Substrate processing apparatus, substrate processing method, and me...

Substrate inspection apparatus and substrate processing system incl...

Method of etching substrate

Plasma treatment system including cover plate to insulate window

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR MONITORING SUBSTRATE PROCESSING APPARATUS

APPARATUS AND METHOD FOR PLASMA ETCHING

APPARATUS AND METHOD FOR PLASMA ETCHING

PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING...

METHOD AND SYSTEM FOR MONITORING SUBSTRATE PROCESSING APPARATUS

SEMICONDUCTOR PROCESSING EQUIPMENT INCLUDING ELECTROSTATIC CHUCK FO...

PLASMA PROCESSING APPARATUS AND METHODS OF MANUFACTURING SEMICONDUC...

METHOD OF FORMING PLASMA PROCESSING APPARATUS, RELATED APPARATUS, A...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING MODULE, AND SE...

PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...

GAS SUPPLY ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS INCLUDING TH...

SEMICONDUCTOR MANUFACTURING APPARATUS

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING SYSTEM HAVING T...

SENSOR DEVICE AND ETCHING APPARATUS HAVING THE SAME

CAPACITIVELY-COUPLED PLASMA SUBSTRATE PROCESSING APPARATUS INCLUDIN...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING MODULE, AND SE...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...

OPTICAL EMISSION SPECTROSCOPY SYSTEM, METHOD OF CALIBRATING THE SAM...

METHOD OF ETCHING SUBSTRATE

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND METHOD OF...

SUBSTRATE INSPECTION APPARATUS AND SUBSTRATE PROCESSING SYSTEM INCL...

Cover Plate, Plasma Treatment System Including the Same and Plasma...

PLASMA TREATMENT APPARATUS

PLASMA PROCESS APPARATUS HAVING VIEW PORT