Joon Seok Oh

Person

Natick, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Compositions comprising base-reactive component and processes for p...
- Patent number 11,106,137
- Issue date Aug 31, 2021
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions comprising base-reactive component and processes for p...
- Patent number 9,436,082
- Issue date Sep 6, 2016
- Rohm and Haas Electronics Materials LLC
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Base reactive photoacid generators and photoresists comprising same
- Patent number 9,156,785
- Issue date Oct 13, 2015
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT
- Publication number 20130244178
- Publication date Sep 19, 2013
- Rohm and Haas Electronic Materials L.L.C.
- Gregory P. Prokopowicz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR P...
- Publication number 20120171626
- Publication date Jul 5, 2012
- Rohm and Haas Electronic Materials L.L.C.
- Deyan WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITIONS COMPRISING SUGAR COMPONENT AND PROCESSES FOR PHOTOLITH...
- Publication number 20120156595
- Publication date Jun 21, 2012
- Rohm and Haas Electronic Materials L.L.C.
- Joon-Seok OH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
- Publication number 20120129108
- Publication date May 24, 2012
- Rohm and Haas Electronic Materials L.L.C.
- Emad AQAD
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR P...
- Publication number 20120122030
- Publication date May 17, 2012
- DOW GLOBAL TECHNOLOGIES LLC
- Deyan WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT
- Publication number 20120077120
- Publication date Mar 29, 2012
- Rohm and Haas Electronic Materials L.L.C.
- Gregory P. PROKOPOWICZ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Joon Seok Oh

Person

Patents Grantslast 30 patents

Compositions comprising base-reactive component and processes for p...

Compositions comprising base-reactive component and processes for p...

Base reactive photoacid generators and photoresists comprising same

Patents Applicationslast 30 patents

PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT

COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR P...

COMPOSITIONS COMPRISING SUGAR COMPONENT AND PROCESSES FOR PHOTOLITH...

BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME

COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR P...

PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT