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Jorg Rottstegge
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Lilienthal, DE
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Patents Grants
last 30 patents
Information
Patent Grant
Resist for photolithography having reactive groups for subsequent m...
Patent number
7,125,640
Issue date
Oct 24, 2006
Infineon Technologies AG
Jörg Rottstegge
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Chemical consolidation of photoresists in the UV range
Patent number
7,067,234
Issue date
Jun 27, 2006
Infineon Technologies AG
Jörg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Silicon-containing resist for photolithography
Patent number
7,052,820
Issue date
May 30, 2006
Infineon Technologies AG
Jörg Rottstegge
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Process for structuring a photoresist by UV at less than 160 NM and...
Patent number
7,045,274
Issue date
May 16, 2006
Infineon Technologies AG
Jörg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist based on polycondensates and having an increased resolu...
Patent number
7,041,426
Issue date
May 9, 2006
Infineon Technologies AG
Christian Eschbaumer
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Photoresists with reaction anchors for chemical consolidation of re...
Patent number
7,033,740
Issue date
Apr 25, 2006
Infineon Technologies AG
Jörg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Process for increasing the etch resistance and for reducing the hol...
Patent number
7,018,784
Issue date
Mar 28, 2006
Infineon Technologies AG
Jörg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Negative resist process with simultaneous development and chemical...
Patent number
6,998,215
Issue date
Feb 14, 2006
Infineon Technologies AG
Jörg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Silicon resist for photolithography at short exposure wavelengths a...
Patent number
6,974,655
Issue date
Dec 13, 2005
Infineon Technologies AG
Jörg Rottstegge
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Negative resist process with simultaneous development and aromatiza...
Patent number
6,946,236
Issue date
Sep 20, 2005
Infineon Technologies AG
Jörg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Process for modifying resist structures and resist films from the a...
Patent number
6,899,997
Issue date
May 31, 2005
Infineon Technologies AG
Siew Siew Yip
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Process for sidewall amplification of resist structures and for the...
Patent number
6,893,972
Issue date
May 17, 2005
Infineon Technologies AG
Jörg Rottstegge
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Fluorine-containing photoresist having reactive anchors for chemica...
Patent number
6,835,528
Issue date
Dec 28, 2004
Infineon Technologies AG
Jörg Rottstegge
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING SUBSTI...
Patent number
6,806,027
Issue date
Oct 19, 2004
Infineon Technologies AG
Christoph Hohle
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Negative resist process with simultaneous development and silylation
Patent number
6,770,423
Issue date
Aug 3, 2004
Infineon Technologies AG
Jörg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Amplification of resist structures of fluorinated resist polymers b...
Patent number
6,759,184
Issue date
Jul 6, 2004
Infineon Technologies AG
Jörg Rottstegge
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Patents Applications
last 30 patents
Information
Patent Application
Process for increasing the etch resistance and for reducing the hol...
Publication number
20040043330
Publication date
Mar 4, 2004
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Process for modifying resist structures and resist films from the a...
Publication number
20030211422
Publication date
Nov 13, 2003
Siew Siew Yip
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Fluorine-containing photoresist having reactive anchors for chemica...
Publication number
20030157432
Publication date
Aug 21, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Silicon resist for photolithography at short exposure wavelengths a...
Publication number
20030148219
Publication date
Aug 7, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist for photolithography having reactive groups for subsequent m...
Publication number
20030143484
Publication date
Jul 31, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Process for silylating photoresists in the UV range
Publication number
20030124468
Publication date
Jul 3, 2003
Jens Ferbitz
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Silicon-containing resist for photolithography
Publication number
20030108812
Publication date
Jun 12, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Process for the aromatization and cycloaliphatization of photoresis...
Publication number
20030099906
Publication date
May 29, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Silylating process for photoresists in the UV region
Publication number
20030096194
Publication date
May 22, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Chemically amplified photoresist and process for structuring substi...
Publication number
20030096190
Publication date
May 22, 2003
Christoph Hohle
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Process for sidewall amplification of resist structures and for the...
Publication number
20030091936
Publication date
May 15, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photoresists with reaction anchos for chemical consolidation of res...
Publication number
20030087182
Publication date
May 8, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Chemically amplified photoresist and process for structuring substr...
Publication number
20030082483
Publication date
May 1, 2003
Christoph Hohle
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Negative resist process with simultaneous development and silylation
Publication number
20030082488
Publication date
May 1, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photoresist based on polycondensates and having an increased resolu...
Publication number
20030082480
Publication date
May 1, 2003
Christian Eschbaumer
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Negative resist process with simultaneous development and aromatiza...
Publication number
20030073037
Publication date
Apr 17, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Amplification of resist structures of fluorinated resist polymers b...
Publication number
20030073043
Publication date
Apr 17, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Chemical consolidation of photoresists in the UV range
Publication number
20030068585
Publication date
Apr 10, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Negative resist process with simultaneous development and chemical...
Publication number
20030064327
Publication date
Apr 3, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY