Jorg Schultz

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Multi mirror system for an illumination system
- Patent number 7,583,433
- Issue date Sep 1, 2009
- Carl Zeiss SMT AG
- Martin Antoni
- G02 - OPTICS
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,443,948
- Issue date Oct 28, 2008
- Carl Zeiss SMT AG
- Jörg Schultz
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reticle-masking objective with aspherical lenses
- Patent number 7,372,634
- Issue date May 13, 2008
- Carl Zeiss SMT AG
- Johannes Wangler
- G02 - OPTICS
Information Patent Grant
EUV illumination system having a plurality of light sources for ill...
- Patent number 7,329,886
- Issue date Feb 12, 2008
- Carl Zeiss SMT AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system, particularly for EUV lithography
- Patent number 7,148,495
- Issue date Dec 12, 2006
- Carl Zeiss SMT AG
- Jörg Schultz
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reticle-masking objective with aspherical lenses
- Patent number 7,130,129
- Issue date Oct 31, 2006
- Carl Zeiss SMT AG
- Jorg Schultz
- G02 - OPTICS
Information Patent Grant
Illumination system with field mirrors for producing uniform scanni...
- Patent number 7,126,137
- Issue date Oct 24, 2006
- Carl Zeiss SMT AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system with a plurality of light sources
- Patent number 7,071,476
- Issue date Jul 4, 2006
- Carl Zeiss SMT AG
- Dirk Rothweiler
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,006,595
- Issue date Feb 28, 2006
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system, particularly for EUV lithography
- Patent number 6,859,515
- Issue date Feb 22, 2005
- Carl-Zeiss-Stiftung Trading
- Jörg Schultz
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 6,859,328
- Issue date Feb 22, 2005
- Carl Zeiss Semiconductor
- Jörg Schultz
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multi mirror system for an illumination system
- Patent number 6,840,640
- Issue date Jan 11, 2005
- Carl Zeiss SMT AG
- Martin Antoni
- G02 - OPTICS
Information Patent Grant
Illumination system with field mirrors for producing uniform scanni...
- Patent number 6,770,894
- Issue date Aug 3, 2004
- Carl Zeiss SMT AG
- Jörg Schultz
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Control of a distribution of illumination in an exit pupil of an EU...
- Patent number 6,704,095
- Issue date Mar 9, 2004
- Carl Zeiss SMT AG
- Jörg Schultz
- G02 - OPTICS
Information Patent Grant
Partial objective in an illuminating systems
- Patent number 6,680,803
- Issue date Jan 20, 2004
- Carl Zeiss SMT AG
- Jörg Schultz
- G02 - OPTICS
Information Patent Grant
Illumination system with a plurality of light sources
- Patent number 6,570,168
- Issue date May 27, 2003
- Carl-Zeiss-Stiftung
- Jörg Schultz
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Components with an anamorphotic effect for reducing an aspect ratio...
- Patent number 6,507,440
- Issue date Jan 14, 2003
- Carl-Zeiss-Stiftung
- Jörg Schultz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection-microlithographic device
- Patent number 6,445,442
- Issue date Sep 3, 2002
- Carl-Zeiss-Stiftung
- Rudolf Von Bünau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 6,438,199
- Issue date Aug 20, 2002
- Carl-Zeiss-Stiftung
- Jörg Schultz
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Illumination system, particularly for EUV lithography
- Patent number 6,400,794
- Issue date Jun 4, 2002
- Carl-Zeiss-Stiftung
- Jörg Schultz
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reticular objective for microlithography-projection exposure instal...
- Patent number 6,366,410
- Issue date Apr 2, 2002
- Carl-Zeiss-Stiftung
- Jörg Schultz
- G02 - OPTICS
Information Patent Grant
Illumination system and REMA objective with lens displacement and o...
- Patent number 6,295,122
- Issue date Sep 25, 2001
- Jörg Schultz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system particularly for EUV lithography
- Patent number 6,198,793
- Issue date Mar 6, 2001
- Carl-Zeiss-Stiftung Trading As Carl Zeiss
- Jörg Schultz
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
ILLUMINATION SYSTEM WITH VARIABLE ADJUSTMENT OF THE ILLUMINATION
- Publication number 20080225259
- Publication date Sep 18, 2008
- Carl Zeiss SMT AG
- Wolfgang Singer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Illumination system with field mirrors for producing uniform scanni...
- Publication number 20070030948
- Publication date Feb 8, 2007
- Carl Zeiss SMT AG
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE-MASKING OBJECTIVE WITH ASPHERICAL LENSES
- Publication number 20070014028
- Publication date Jan 18, 2007
- Carl Zeiss SMT AG
- Johannes Wangler
- G02 - OPTICS
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20060245540
- Publication date Nov 2, 2006
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Jorg Schultz
- G02 - OPTICS
Information Patent Application
Multi mirror system for an illumination system
- Publication number 20050083503
- Publication date Apr 21, 2005
- Carl Zeiss SMT AG
- Martin Antoni
- G02 - OPTICS
Information Patent Application
Illumination system with a plurality of light sources
- Publication number 20040256575
- Publication date Dec 23, 2004
- Carl Zeiss SMT AG
- Wolfgang Singer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Illumination system with field mirrors for producing uniform scanni...
- Publication number 20040232354
- Publication date Nov 25, 2004
- Carl Zeiss SMT AG
- Wolfgang Singer
- G02 - OPTICS
Information Patent Application
Reticle-masking objective with aspherical lenses
- Publication number 20040207928
- Publication date Oct 21, 2004
- Jorg Schultz
- G02 - OPTICS
Information Patent Application
Illumination system, particularly for EUV lithography
- Publication number 20040140440
- Publication date Jul 22, 2004
- Carl-Zeiss-Stiftung trading as Carl Zeiss
- Jorg Schultz
- B82 - NANO-TECHNOLOGY
Information Patent Application
Illumination system with variable adjustment of the illumination
- Publication number 20040119961
- Publication date Jun 24, 2004
- Carl Zeiss SMT AG
- Wolfgang Singer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Illumination system with a plurality of light sources
- Publication number 20040036037
- Publication date Feb 26, 2004
- Carl Zeiss SMT AG,
- Dirk Rothweiler
- B82 - NANO-TECHNOLOGY
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20030095622
- Publication date May 22, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Jorg Schultz
- G02 - OPTICS
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20030086524
- Publication date May 8, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Jorg Schultz
- G02 - OPTICS
Information Patent Application
Multi mirror system for an illumination system
- Publication number 20030076607
- Publication date Apr 24, 2003
- Martin Antoni
- G02 - OPTICS
Information Patent Application
Illumination system, particularly for EUV lithography
- Publication number 20030012333
- Publication date Jan 16, 2003
- Carl-Zeiss-Stiftung trading as Carl Zeiss
- Jorg Schultz
- B82 - NANO-TECHNOLOGY
Information Patent Application
Control of a distribution of illumination in an exit pupil of an EU...
- Publication number 20030002022
- Publication date Jan 2, 2003
- Jorg Schultz
- G02 - OPTICS
Information Patent Application
Partial objective in an illuminating systems
- Publication number 20020036832
- Publication date Mar 28, 2002
- Jorg Schultz
- G02 - OPTICS
Information Patent Application
Projection-microlithographic device
- Publication number 20010052969
- Publication date Dec 20, 2001
- Rudolf Von Bunau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jorg Schultz

Person

Patents Grantslast 30 patents

Multi mirror system for an illumination system

Illumination system particularly for microlithography

Reticle-masking objective with aspherical lenses

EUV illumination system having a plurality of light sources for ill...

Illumination system, particularly for EUV lithography

Reticle-masking objective with aspherical lenses

Illumination system with field mirrors for producing uniform scanni...

Illumination system with a plurality of light sources

Illumination system particularly for microlithography

Illumination system, particularly for EUV lithography

Illumination system particularly for microlithography

Multi mirror system for an illumination system

Illumination system with field mirrors for producing uniform scanni...

Control of a distribution of illumination in an exit pupil of an EU...

Partial objective in an illuminating systems

Illumination system with a plurality of light sources

Components with an anamorphotic effect for reducing an aspect ratio...

Projection-microlithographic device

Illumination system particularly for microlithography

Illumination system, particularly for EUV lithography

Reticular objective for microlithography-projection exposure instal...

Illumination system and REMA objective with lens displacement and o...

Illumination system particularly for EUV lithography

Patents Applicationslast 30 patents

ILLUMINATION SYSTEM WITH VARIABLE ADJUSTMENT OF THE ILLUMINATION

Illumination system with field mirrors for producing uniform scanni...

RETICLE-MASKING OBJECTIVE WITH ASPHERICAL LENSES

Illumination system particularly for microlithography

Multi mirror system for an illumination system

Illumination system with a plurality of light sources

Illumination system with field mirrors for producing uniform scanni...

Reticle-masking objective with aspherical lenses

Illumination system, particularly for EUV lithography

Illumination system with variable adjustment of the illumination

Illumination system with a plurality of light sources

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Multi mirror system for an illumination system

Illumination system, particularly for EUV lithography

Control of a distribution of illumination in an exit pupil of an EU...

Partial objective in an illuminating systems

Projection-microlithographic device