Jorg Thiele

Person

Vatersetten, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Set of at least two masks for the projection of structure patterns
- Patent number 7,393,613
- Issue date Jul 1, 2008
- Infineon Technologies AG
- Wolfgang Dettmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Set of masks including a first mask and a second trimming mask with...
- Patent number 7,393,614
- Issue date Jul 1, 2008
- Infineon Technologies AG
- Roderick Köhle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography mask for imaging of convex structures
- Patent number 7,354,683
- Issue date Apr 8, 2008
- Infineon Technologies AG
- Molela Moukara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optimizing and method for producing a layout for a mask,...
- Patent number 6,745,380
- Issue date Jun 1, 2004
- Infineon Technologies AG
- Christof Tilmann Bodendorf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for optical projection systems, and a process for its production
- Patent number 6,692,875
- Issue date Feb 17, 2004
- Infineon Technologies AG
- Werner Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing masks for fabricating semiconductor structures
- Patent number 6,493,865
- Issue date Dec 10, 2002
- Infineon Technologies AG
- Werner Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Transistor arrangement, sense-amplifier arrangement and methods of...
- Publication number 20080042171
- Publication date Feb 21, 2008
- Sebastian Mosler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for optimizing the geometry of structural elements of a circ...
- Publication number 20060190850
- Publication date Aug 24, 2006
- Roderick Kohle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for compensation of the shortening of line ends during the f...
- Publication number 20050196686
- Publication date Sep 8, 2005
- Dirk Meyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing for a mask a mask layout which avoids aberrations
- Publication number 20050120326
- Publication date Jun 2, 2005
- Infineon Technolgies AG
- Armin Semmler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography mask for imaging of convex structures
- Publication number 20050095512
- Publication date May 5, 2005
- Molela Moukara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Set of at least two masks for the projection of structure patterns...
- Publication number 20040202943
- Publication date Oct 14, 2004
- Wolfgang Dettmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Set of masks for the projection of structure patterns onto a semico...
- Publication number 20040197677
- Publication date Oct 7, 2004
- Roderick Kohle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for optimizing and method for producing a layout for a mask,...
- Publication number 20030046654
- Publication date Mar 6, 2003
- Christof Tilmann Bodendorf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask for optical projection systems, and a process for its production
- Publication number 20020006554
- Publication date Jan 17, 2002
- Werner Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jorg Thiele

Person

Patents Grantslast 30 patents

Set of at least two masks for the projection of structure patterns

Set of masks including a first mask and a second trimming mask with...

Lithography mask for imaging of convex structures

Method for optimizing and method for producing a layout for a mask,...

Mask for optical projection systems, and a process for its production

Method of producing masks for fabricating semiconductor structures

Patents Applicationslast 30 patents

Transistor arrangement, sense-amplifier arrangement and methods of...

Method for optimizing the geometry of structural elements of a circ...

Method for compensation of the shortening of line ends during the f...

Method for producing for a mask a mask layout which avoids aberrations

Lithography mask for imaging of convex structures

Set of at least two masks for the projection of structure patterns...

Set of masks for the projection of structure patterns onto a semico...

Method for optimizing and method for producing a layout for a mask,...

Mask for optical projection systems, and a process for its production