JORGE LUQUE

Person

REDWOOD CITY, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Reflectometer to monitor substrate movement
- Patent number 11,791,189
- Issue date Oct 17, 2023
- Lam Research Corporation
- Eric A. Pape
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining process rate
- Patent number 11,056,322
- Issue date Jul 6, 2021
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching systems and methods using empirical mode decomposition
- Patent number 10,504,704
- Issue date Dec 10, 2019
- Lam Research Corporation
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for detecting a process point in multi-mode pulse...
- Patent number 10,242,849
- Issue date Mar 26, 2019
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detecting partial unclamping of a substrate from an ESC of a substr...
- Patent number 10,224,187
- Issue date Mar 5, 2019
- Lam Research Corporation
- Dmitry Opaits
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for real-time monitoring of plasma chamber wal...
- Patent number 10,134,569
- Issue date Nov 20, 2018
- Lam Research Corporation
- Luc Albarede
- G02 - OPTICS
Information Patent Grant
Methods for detecting endpoint for through-silicon via reveal appli...
- Patent number 9,941,178
- Issue date Apr 10, 2018
- Lam Research Corporation
- Alan Jeffrey Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining process rate
- Patent number 9,735,069
- Issue date Aug 15, 2017
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for detecting a process point in multi-mode pulse...
- Patent number 9,640,371
- Issue date May 2, 2017
- Lam Research Corporation
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching systems and methods using empirical mode decomposition
- Patent number 9,548,189
- Issue date Jan 17, 2017
- Lam Research Corporation
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for detecting endpoint for through-silicon via...
- Patent number 9,543,225
- Issue date Jan 10, 2017
- Lam Research Corporation
- Alan Jeffrey Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch tool process indicator method and apparatus
- Patent number 8,492,174
- Issue date Jul 23, 2013
- Lam Research Corporation
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch tool process indicator method and apparatus
- Patent number 8,206,996
- Issue date Jun 26, 2012
- Lam Research Corporation
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for centering wafer on chuck
- Patent number 8,060,330
- Issue date Nov 15, 2011
- Lam Research Corporation
- Robert Griffith O'Neill
- G01 - MEASURING TESTING
Information Patent Grant
User interface for wafer data analysis and visualization
- Patent number 7,945,085
- Issue date May 17, 2011
- Lam Research Corporation
- Jorge Luque
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
User interface for wafer data analysis and visualization
- Patent number 7,738,693
- Issue date Jun 15, 2010
- Lam Research Corporation
- Jorge Luque
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
User interface for quantifying wafer non-uniformities and graphical...
- Patent number 7,239,737
- Issue date Jul 3, 2007
- Lam Research Corporation
- Jorge Luque
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process controls for improved wafer uniformity using integrated or...
- Patent number 7,018,855
- Issue date Mar 28, 2006
- Lam Research Corporation
- Gowri P. Kota
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Metrology Enclosure Including Spectral Reflectometry System for Pla...
- Publication number 20240395519
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN SITU SENSOR AND LOGIC FOR PROCESS CONTROL
- Publication number 20240255858
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Ye Feng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MACHINE-LEARNING IN MULTI-STEP SEMICONDUCTOR FABRICATION PROCESSES
- Publication number 20240096713
- Publication date Mar 21, 2024
- LAM RESEARCH CORPORATION
- Yan Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REFLECTOMETER TO MONITOR SUBSTRATE MOVEMENT
- Publication number 20230420281
- Publication date Dec 28, 2023
- LAM RESEARCH CORPORATION
- Eric A. Pape
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LARGE SPOT SPECTRAL SENSING TO CONTROL SPATIAL SETPOINTS
- Publication number 20220334554
- Publication date Oct 20, 2022
- LAM RESEARCH CORPORATION
- Ye Feng
- G05 - CONTROLLING REGULATING
Information Patent Application
REFLECTOMETER TO MONITOR SUBSTRATE MOVEMENT
- Publication number 20200111696
- Publication date Apr 9, 2020
- LAM RESEARCH CORPORATION
- Eric A. Pape
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING PROCESS RATE
- Publication number 20170338160
- Publication date Nov 23, 2017
- LAM RESEARCH CORPORATION
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR DETECTING A PROCESS POINT IN MULT-MODE PULSE...
- Publication number 20170207070
- Publication date Jul 20, 2017
- LAM RESEARCH CORPORATION
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING PROCESS RATE
- Publication number 20170084503
- Publication date Mar 23, 2017
- LAM RESEARCH CORPORATION
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEMS AND METHODS USING EMPIRICAL MODE DECOMPOSITION
- Publication number 20170084433
- Publication date Mar 23, 2017
- LAM RESEARCH CORPORATION
- LUC ALBAREDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Detecting Endpoint for Through-Silicon Via Reveal Appli...
- Publication number 20170062290
- Publication date Mar 2, 2017
- LAM RESEARCH CORPORATION
- Alan Jeffrey Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEMS AND METHODS USING EMPIRICAL MODE DECOMPOSITION
- Publication number 20160314943
- Publication date Oct 27, 2016
- LAM RESEARCH CORPORATION
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Detecting a Process Point in Multi-Mode Pulse...
- Publication number 20160111261
- Publication date Apr 21, 2016
- LAM RESEARCH CORPORATION
- Yassine Kabouzi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DETECTING ENDPOINT FOR THROUGH-SILICON VIA...
- Publication number 20150311129
- Publication date Oct 29, 2015
- LAM RESEARCH CORPORATION
- Alan Jeffrey Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH TOOL PROCESS INDICATOR METHOD AND APPARATUS
- Publication number 20120231556
- Publication date Sep 13, 2012
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
User Interface for Wafer Data Analysis and Visualization
- Publication number 20100211903
- Publication date Aug 19, 2010
- LAM RESEARCH CORPORATION
- Jorge Luque
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Centering Wafer on Chuck
- Publication number 20100150695
- Publication date Jun 17, 2010
- LAM RESEARCH CORPORATION
- Robert Griffith O'Neill
- G01 - MEASURING TESTING
Information Patent Application
ETCH TOOL PROCESS INDICATOR METHOD AND APPARATUS
- Publication number 20100093115
- Publication date Apr 15, 2010
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process controls for improved wafer uniformity using integrated or...
- Publication number 20050148104
- Publication date Jul 7, 2005
- Gowri P. Kota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
User interface for wafer data analysis and visualization
- Publication number 20040119749
- Publication date Jun 24, 2004
- LAM RESEARCH CORPORATION
- Jorge Luque
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
User interface for quantifying wafer non-uniformities and graphical...
- Publication number 20040070623
- Publication date Apr 15, 2004
- LAM RESEARCH CORPORATION
- Jorge Luque
- H01 - BASIC ELECTRIC ELEMENTS

JORGE LUQUE

Person

Patents Grantslast 30 patents

Reflectometer to monitor substrate movement

Method and apparatus for determining process rate

Plasma etching systems and methods using empirical mode decomposition

System and method for detecting a process point in multi-mode pulse...

Detecting partial unclamping of a substrate from an ESC of a substr...

Method and apparatus for real-time monitoring of plasma chamber wal...

Methods for detecting endpoint for through-silicon via reveal appli...

Method and apparatus for determining process rate

System and method for detecting a process point in multi-mode pulse...

Plasma etching systems and methods using empirical mode decomposition

Systems and methods for detecting endpoint for through-silicon via...

Etch tool process indicator method and apparatus

Etch tool process indicator method and apparatus

Method and system for centering wafer on chuck

User interface for wafer data analysis and visualization

User interface for wafer data analysis and visualization

User interface for quantifying wafer non-uniformities and graphical...

Process controls for improved wafer uniformity using integrated or...

Patents Applicationslast 30 patents

Metrology Enclosure Including Spectral Reflectometry System for Pla...

IN SITU SENSOR AND LOGIC FOR PROCESS CONTROL

MACHINE-LEARNING IN MULTI-STEP SEMICONDUCTOR FABRICATION PROCESSES

REFLECTOMETER TO MONITOR SUBSTRATE MOVEMENT

LARGE SPOT SPECTRAL SENSING TO CONTROL SPATIAL SETPOINTS

REFLECTOMETER TO MONITOR SUBSTRATE MOVEMENT

METHOD AND APPARATUS FOR DETERMINING PROCESS RATE

SYSTEM AND METHOD FOR DETECTING A PROCESS POINT IN MULT-MODE PULSE...

METHOD AND APPARATUS FOR DETERMINING PROCESS RATE

PLASMA ETCHING SYSTEMS AND METHODS USING EMPIRICAL MODE DECOMPOSITION

Methods for Detecting Endpoint for Through-Silicon Via Reveal Appli...

PLASMA ETCHING SYSTEMS AND METHODS USING EMPIRICAL MODE DECOMPOSITION

System and Method for Detecting a Process Point in Multi-Mode Pulse...

SYSTEMS AND METHODS FOR DETECTING ENDPOINT FOR THROUGH-SILICON VIA...

ETCH TOOL PROCESS INDICATOR METHOD AND APPARATUS

User Interface for Wafer Data Analysis and Visualization

Method and System for Centering Wafer on Chuck

ETCH TOOL PROCESS INDICATOR METHOD AND APPARATUS

Process controls for improved wafer uniformity using integrated or...

User interface for wafer data analysis and visualization

User interface for quantifying wafer non-uniformities and graphical...