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Jos de Klerk
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Eindhoven, NL
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Patents Grants
last 30 patents
Information
Patent Grant
System to increase throughput in a dual substrate stage double expo...
Patent number
7,053,990
Issue date
May 30, 2006
ASML Holding N.V.
Daniel N. Galburt
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method to increase throughput in a dual substrate stage double expo...
Patent number
7,050,156
Issue date
May 23, 2006
ASML Holding N.V.
Daniel N. Galburt
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
System to increase throughput in a dual substrate stage double expo...
Patent number
6,965,427
Issue date
Nov 15, 2005
ASML Holding N.V.
Daniel Galburt
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method to increase throughput in a dual substrate stage double expo...
Patent number
6,876,439
Issue date
Apr 5, 2005
ASML Holding N.V.
Daniel Galburt
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
System and method to increase throughput in a dual substrate stage...
Patent number
6,781,674
Issue date
Aug 24, 2004
ASML Holding N.V.
Daniel Galburt
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
System to increase throughput in a dual substrate stage double expo...
Publication number
20050248747
Publication date
Nov 10, 2005
ASML Holding N.V.
Daniel Galburt
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
System to increase throughput in a dual substrate stage double expo...
Publication number
20050162636
Publication date
Jul 28, 2005
ASML Holding N.V.
Daniel Galburt
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
System to increase throughput in a dual substrate stage double expo...
Publication number
20040257551
Publication date
Dec 23, 2004
Daniel N. Galburt
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
System and method to increase throughput in a dual substrate stage...
Publication number
20040239902
Publication date
Dec 2, 2004
ASML Holding N.V.
Daniel Galburt
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY