José Nilton FONSECA JUNIOR

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Eindhoven, NL

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Patents Grantslast 30 patents

Information Patent Grant
Gas flow optimization in reticle stage environment
- Patent number 10,031,428
- Issue date Jul 24, 2018
- ASML Netherlands B.V.
- Koen Cuypers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC APPARATUS WITH IMPROVED PATTERNING PERFORMANCE
- Publication number 20200393769
- Publication date Dec 17, 2020
- ASML NETHERLANDS B.V.
- Federico LA TORRE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Gas Flow Optimization in Reticle Stage Environment
- Publication number 20150355557
- Publication date Dec 10, 2015
- ASML NETHERLANDS B.V.
- Koen CUYPERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY