Joseph A. DiRegolo

Person

Livermore, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Measurement and control of wafer tilt for x-ray based metrology
- Patent number 11,513,085
- Issue date Nov 29, 2022
- KLA Corporation
- Barry Blasenheim
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for characterization of an x-ray beam with high...
- Patent number 11,073,487
- Issue date Jul 27, 2021
- KLA-Tencor Corporation
- Alexander Bykanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration of a small angle X-ray scatterometry based metrology sy...
- Patent number 10,481,111
- Issue date Nov 19, 2019
- KLA-Tencor Corporation
- John Hench
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Beam shaping slit for small spot size transmission small angle X-ra...
- Patent number 10,359,377
- Issue date Jul 23, 2019
- KLA-Tencor Corporation
- Alexander Bykanov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
System for electron beam detection
- Patent number 9,778,186
- Issue date Oct 3, 2017
- KLA-Tencor Corporation
- Shinichi Kojima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Linear Stage for reflective electron beam lithography
- Patent number 9,690,213
- Issue date Jun 27, 2017
- KLA-Tencor Corporation
- Upendra Ummethala
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Alignment sensor and height sensor
- Patent number 9,366,524
- Issue date Jun 14, 2016
- KLA-Tencor Corporation
- Mark A. McCord
- G01 - MEASURING TESTING
Information Patent Grant
Light collection optics for measuring flux and spectrum from light-...
- Patent number 9,347,824
- Issue date May 24, 2016
- KLA-Tencor Corporation
- Mark A. McCord
- G01 - MEASURING TESTING
Information Patent Grant
Alignment measurement system
- Patent number 9,030,661
- Issue date May 12, 2015
- KLA-Tencor Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Linear stage and metrology architecture for reflective electron bea...
- Patent number 8,724,115
- Issue date May 13, 2014
- KLA-Tencor Corporation
- Upendra Ummethala
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
CLEANROOM COMPATIBLE ROBOTIC END EFFECTOR EXCHANGE SYSTEM
- Publication number 20230298926
- Publication date Sep 21, 2023
- KLA Corporation
- Benjamin James Thomas CLARKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Measurement And Control Of Wafer Tilt For X-Ray Based Metrology
- Publication number 20210262950
- Publication date Aug 26, 2021
- KLA Corporation
- Barry Blasenheim
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Characterization Of An X-Ray Beam With High...
- Publication number 20180328868
- Publication date Nov 15, 2018
- KLA-Tencor Corporation
- Alexander Bykanov
- G01 - MEASURING TESTING
Information Patent Application
Calibration Of A Small Angle X-Ray Scatterometry Based Metrology Sy...
- Publication number 20180113084
- Publication date Apr 26, 2018
- KLA-Tencor Corporation
- John Hench
- G01 - MEASURING TESTING
Information Patent Application
Beam Shaping Slit For Small Spot Size Transmission Small Angle X-Ra...
- Publication number 20170307548
- Publication date Oct 26, 2017
- KLA-Tencor Corporation
- Alexander Bykanov
- G01 - MEASURING TESTING
Information Patent Application
System for Electron Beam Detection
- Publication number 20160011110
- Publication date Jan 14, 2016
- KLA-Tencor Corporation
- Shinichi Kojima
- G01 - MEASURING TESTING
Information Patent Application
Light Collection Optics for Measuring Flux and Spectrum from Light-...
- Publication number 20150124253
- Publication date May 7, 2015
- KLA-Tencor Corporation
- Mark A. McCord
- G01 - MEASURING TESTING
Information Patent Application
ALIGNMENT SENSOR AND HEIGHT SENSOR
- Publication number 20150097126
- Publication date Apr 9, 2015
- KLA-Tencor Corporation
- Mark A. McCORD
- G01 - MEASURING TESTING
Information Patent Application
Linear Stage and Metrology Architecture for Reflective Electron Bea...
- Publication number 20130342827
- Publication date Dec 26, 2013
- KLA-Tencor Corporation
- Upendra Ummethala
- B82 - NANO-TECHNOLOGY
Information Patent Application
Linear Stage for Reflective Electron Beam Lithography
- Publication number 20130293865
- Publication date Nov 7, 2013
- KLA-Tencor Corporation
- Upendra Ummethala
- B82 - NANO-TECHNOLOGY

Joseph A. DiRegolo

Person

Patents Grantslast 30 patents

Measurement and control of wafer tilt for x-ray based metrology

Methods and systems for characterization of an x-ray beam with high...

Calibration of a small angle X-ray scatterometry based metrology sy...

Beam shaping slit for small spot size transmission small angle X-ra...

System for electron beam detection

Linear Stage for reflective electron beam lithography

Alignment sensor and height sensor

Light collection optics for measuring flux and spectrum from light-...

Alignment measurement system

Linear stage and metrology architecture for reflective electron bea...

Patents Applicationslast 30 patents

CLEANROOM COMPATIBLE ROBOTIC END EFFECTOR EXCHANGE SYSTEM

Measurement And Control Of Wafer Tilt For X-Ray Based Metrology

Methods And Systems For Characterization Of An X-Ray Beam With High...

Calibration Of A Small Angle X-Ray Scatterometry Based Metrology Sy...

Beam Shaping Slit For Small Spot Size Transmission Small Angle X-Ra...

System for Electron Beam Detection

Light Collection Optics for Measuring Flux and Spectrum from Light-...

ALIGNMENT SENSOR AND HEIGHT SENSOR

Linear Stage and Metrology Architecture for Reflective Electron Bea...

Linear Stage for Reflective Electron Beam Lithography