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Joseph E. Brandenburg
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Portland, OR, US
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last 30 patents
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Patent Grant
Process window-based correction for photolithography masks
Patent number
7,470,492
Issue date
Dec 30, 2008
Intel Corporation
Robert M. Bigwood
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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last 30 patents
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Patent Application
Process window-based correction for photolithography masks
Publication number
20060095887
Publication date
May 4, 2006
Robert M. Bigwood
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY