Joseph E. Oberlander

Person

Tustin, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Bottom antireflective coating compositions
- Patent number 8,088,548
- Issue date Jan 3, 2012
- AZ Electronic Materials USA Corp.
- Francis M. Houlihan
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 8,039,202
- Issue date Oct 18, 2011
- AZ Electronic Materials USA Corp.
- Yu Sui
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 7,824,837
- Issue date Nov 2, 2010
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective coating compositions
- Patent number 7,754,414
- Issue date Jul 13, 2010
- AZ Electronic Materials USA Corp.
- Joseph E. Oberlander
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative photoresist compositions
- Patent number 7,601,482
- Issue date Oct 13, 2009
- AZ Electronic Materials USA Corp.
- Georg Pawlowski
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective compositions for photoresists
- Patent number 7,264,913
- Issue date Sep 4, 2007
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive composition and use thereof
- Patent number 7,078,157
- Issue date Jul 18, 2006
- AZ Electronic Materials USA Corp.
- Hong Zhuang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for producing an image using a first minimum bottom antiref...
- Patent number 7,070,914
- Issue date Jul 4, 2006
- AZ Electronic Materials USA Corp.
- Mark O. Neisser
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist compositions comprising acetals and ketals as solvents
- Patent number 6,911,293
- Issue date Jun 28, 2005
- Clariant Finance (BVI) Limited
- Stanley F. Wanat
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 6,844,131
- Issue date Jan 18, 2005
- Clariant Finance (BVI) Limited
- Joseph E. Oberlander
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for producing acid sensitive liquid composition containing...
- Patent number 6,531,267
- Issue date Mar 11, 2003
- Clariant Finance (BVI) Limited
- Joseph E. Oberlander
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Edge bead remover for thick film photoresists
- Patent number 6,524,775
- Issue date Feb 25, 2003
- Clariant Finance (BVI) Limited
- Joseph E. Oberlander
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for stripping photoresist and organic materials from su...
- Patent number 6,368,421
- Issue date Apr 9, 2002
- Clariant Finance (BVI) Limited
- Joseph E. Oberlander
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective composition for a deep ultraviolet photoresist
- Patent number 6,114,085
- Issue date Sep 5, 2000
- Clariant Finance (BVI) Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating material for photoresists
- Patent number 6,106,995
- Issue date Aug 22, 2000
- Clariant Finance (BVI) Limited
- Sunit S. Dixit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process of controlling particle size of naphthoquinone diazide esters
- Patent number 6,077,942
- Issue date Jun 20, 2000
- Clariant Finance (BVI) Limited
- Joseph E. Oberlander
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for making a photoactive compound and photoresist therefrom
- Patent number 6,048,665
- Issue date Apr 11, 2000
- Clariant Finance (BVI) Limited
- Joseph E. Oberlander
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for measuring concentration of nonionic surfactants in an a...
- Patent number 6,017,766
- Issue date Jan 25, 2000
- Clariant Finance (BVI) Limited
- Rodica Holt
- G01 - MEASURING TESTING
Information Patent Grant
Process for making a photoactive compound and photoresist therefrom
- Patent number 5,936,071
- Issue date Aug 10, 1999
- Clariant Finance (BVI) Limited
- Joseph E. Oberlander
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresists containing novel photoactive compounds
- Patent number 5,876,897
- Issue date Mar 2, 1999
- Clariant Finance (BVI) Limited
- Dana L. Durham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive quinolone compounds and a process of preparation
- Patent number 5,866,295
- Issue date Feb 2, 1999
- Clariant Finance (BVI) Limited
- Joseph E. Oberlander
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photoresist containing dyes
- Patent number 5,225,312
- Issue date Jul 6, 1993
- Morton International, Inc.
- Sunit S. Dixit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Bottom Antireflective Coating Compositions
- Publication number 20090104559
- Publication date Apr 23, 2009
- Francis M. Houlihan
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Polysilazane-Treating Solvent and Method for Treating Polysilazane...
- Publication number 20080102211
- Publication date May 1, 2008
- Hideki Matsuo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Positive -Working Photoimageable Bottom Antireflective Coating
- Publication number 20080090184
- Publication date Apr 17, 2008
- Yu Sui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-Working Photoimageable Bottom Antireflective Coating
- Publication number 20080038666
- Publication date Feb 14, 2008
- Hengpeng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BOTTOM ANTIREFLECTIVE COATINGS
- Publication number 20080032229
- Publication date Feb 7, 2008
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTIREFLECTIVE COATING COMPOSITIONS
- Publication number 20080014529
- Publication date Jan 17, 2008
- Joseph E. Oberlander
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Treatment of Polysilazane Waste
- Publication number 20070270625
- Publication date Nov 22, 2007
- Joshua Gurman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Negative photoresist compositions
- Publication number 20070231735
- Publication date Oct 4, 2007
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Developable undercoating composition for thick photoresist layers
- Publication number 20070105040
- Publication date May 10, 2007
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for producing an image using a first minimum bottom antiref...
- Publication number 20060199103
- Publication date Sep 7, 2006
- Mark O. Neisser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative-working photoimageable bottom antireflective coating
- Publication number 20060063105
- Publication date Mar 23, 2006
- Joseph E. Oberlander
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working photoimageable bottom antireflective coating
- Publication number 20050214674
- Publication date Sep 29, 2005
- Yu Sui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bottom antireflective coatings
- Publication number 20050074688
- Publication date Apr 7, 2005
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive composition and use thereof
- Publication number 20040175653
- Publication date Sep 9, 2004
- Hong Zuang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective compositions for photoresists
- Publication number 20040101779
- Publication date May 27, 2004
- Hengpeng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative-working photoimageable bottom antireflective coating
- Publication number 20030215736
- Publication date Nov 20, 2003
- Joseph E. Oberlander
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist compositions comprising acetals and ketals as solvents
- Publication number 20030194636
- Publication date Oct 16, 2003
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for producing an image using a first minimum bottom antiref...
- Publication number 20030129547
- Publication date Jul 10, 2003
- Mark O. Neisser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working photoimageable bottom antireflective coating
- Publication number 20030129531
- Publication date Jul 10, 2003
- Joseph E. Oberlander
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for producing acid sensitive liquid composition containing...
- Publication number 20020187439
- Publication date Dec 12, 2002
- Joseph E. Oberlander
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Joseph E. Oberlander

Person

Patents Grantslast 30 patents

Bottom antireflective coating compositions

Positive-working photoimageable bottom antireflective coating

Positive-working photoimageable bottom antireflective coating

Antireflective coating compositions

Negative photoresist compositions

Antireflective compositions for photoresists

Photosensitive composition and use thereof

Process for producing an image using a first minimum bottom antiref...

Photoresist compositions comprising acetals and ketals as solvents

Positive-working photoimageable bottom antireflective coating

Process for producing acid sensitive liquid composition containing...

Edge bead remover for thick film photoresists

Composition for stripping photoresist and organic materials from su...

Antireflective composition for a deep ultraviolet photoresist

Antireflective coating material for photoresists

Process of controlling particle size of naphthoquinone diazide esters

Process for making a photoactive compound and photoresist therefrom

Process for measuring concentration of nonionic surfactants in an a...

Process for making a photoactive compound and photoresist therefrom

Positive photoresists containing novel photoactive compounds

Photosensitive quinolone compounds and a process of preparation

Positive photoresist containing dyes

Patents Applicationslast 30 patents

Bottom Antireflective Coating Compositions

Polysilazane-Treating Solvent and Method for Treating Polysilazane...

Positive -Working Photoimageable Bottom Antireflective Coating

Positive-Working Photoimageable Bottom Antireflective Coating

BOTTOM ANTIREFLECTIVE COATINGS

ANTIREFLECTIVE COATING COMPOSITIONS

Treatment of Polysilazane Waste

Negative photoresist compositions

Developable undercoating composition for thick photoresist layers

Process for producing an image using a first minimum bottom antiref...

Negative-working photoimageable bottom antireflective coating

Positive-working photoimageable bottom antireflective coating

Bottom antireflective coatings

Photosensitive composition and use thereof

Antireflective compositions for photoresists

Negative-working photoimageable bottom antireflective coating

Photoresist compositions comprising acetals and ketals as solvents

Process for producing an image using a first minimum bottom antiref...

Positive-working photoimageable bottom antireflective coating

Process for producing acid sensitive liquid composition containing...