Joseph Lanucha

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Sunnyvale, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Reducing particulate contamination during semiconductor device proc...
- Patent number 5,622,595
- Issue date Apr 22, 1997
- Applied Materials, Inc.
- Anand Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of particle generation within a reaction chamber
- Patent number 5,456,796
- Issue date Oct 10, 1995
- Applied Materials, Inc.
- Anand Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for reducing particulate contamination during plasma process...
- Patent number 5,423,918
- Issue date Jun 13, 1995
- Applied Materials, Inc.
- Anand Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Use of electrostatic forces to reduce particle contamination in sem...
- Patent number 5,410,122
- Issue date Apr 25, 1995
- Applied Materials, Inc.
- Yuh-Jia Su
- H01 - BASIC ELECTRIC ELEMENTS