Joseph S. Gordon

Person

Gardiner, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask assembly and method for protecting the same from contamin...
- Patent number 7,531,275
- Issue date May 12, 2009
- Toppan Photomasks, Inc.
- Xun Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for optimizing a pellicle for off-axis transmi...
- Patent number 7,271,950
- Issue date Sep 18, 2007
- Toppan Photomasks, Inc.
- Joseph S Gordon
- G02 - OPTICS
Information Patent Grant
Photomask assembly and method for protecting the same from contamin...
- Patent number 7,094,505
- Issue date Aug 22, 2006
- Toppan Photomasks, Inc.
- Xun Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for coupling a pellicle to a photomask using a...
- Patent number 6,911,283
- Issue date Jun 28, 2005
- Dupont Photomasks, Inc.
- Joseph Stephen Gordon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for constructing a photomask assembly using an encoded mark
- Patent number 6,894,766
- Issue date May 17, 2005
- Dupont Photomasks, Inc.
- Craig A. West
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Damage resistant photomask construction
- Patent number 6,841,309
- Issue date Jan 11, 2005
- Dupont Photomasks, Inc.
- H. Ufuk Alpay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method for forming an opaque border on the same
- Patent number 6,803,158
- Issue date Oct 12, 2004
- Dupont Photomasks, Inc.
- Joseph Stephen Gordon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for using a coated fluoropolymer substrate pellicle in semic...
- Patent number 6,586,159
- Issue date Jul 1, 2003
- Dupont Photomasks, Inc.
- Joseph S. Gordon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dust cover for use in semiconductor fabrication
- Patent number 6,582,859
- Issue date Jun 24, 2003
- Dupont Photomasks, Inc.
- Joseph S. Gordon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dust cover comprising anti-reflective coating
- Patent number 6,280,885
- Issue date Aug 28, 2001
- Dupont Photomasks, Inc.
- Joseph S. Gordon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Pellicle Assembly Including a Molecular Sieve
- Publication number 20060263703
- Publication date Nov 23, 2006
- Xun Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and method for maintaining optical properties of the same
- Publication number 20060134534
- Publication date Jun 22, 2006
- Laurent Dieu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask assembly and method for protecting the same from contamin...
- Publication number 20040137339
- Publication date Jul 15, 2004
- DuPont Photomasks, Inc.
- Xun Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dust cover for use in semiconductor fabrication
- Publication number 20010010883
- Publication date Aug 2, 2001
- Joseph S. Gordon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for using a coated fluoropolymer substrate pellicle in semic...
- Publication number 20010010882
- Publication date Aug 2, 2001
- Du-Pont Photomasks, Inc. Delaware Corporation
- Joseph S. Gordon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Joseph S. Gordon

Person

Patents Grantslast 30 patents

Photomask assembly and method for protecting the same from contamin...

Apparatus and method for optimizing a pellicle for off-axis transmi...

Photomask assembly and method for protecting the same from contamin...

Method and apparatus for coupling a pellicle to a photomask using a...

Method for constructing a photomask assembly using an encoded mark

Damage resistant photomask construction

Photomask and method for forming an opaque border on the same

Method for using a coated fluoropolymer substrate pellicle in semic...

Dust cover for use in semiconductor fabrication

Dust cover comprising anti-reflective coating

Patents Applicationslast 30 patents

Pellicle Assembly Including a Molecular Sieve

Photomask and method for maintaining optical properties of the same

Photomask assembly and method for protecting the same from contamin...

Dust cover for use in semiconductor fabrication

Method for using a coated fluoropolymer substrate pellicle in semic...