Joseph T. Hillman

Person

Scottsdale, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for controlling the movement of CVD reaction b...
- Patent number 7,521,089
- Issue date Apr 21, 2009
- Tokyo Electron Limited
- Joseph T. Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of inhibiting copper corrosion during supercritical CO2 clea...
- Patent number 7,442,636
- Issue date Oct 28, 2008
- Tokyo Electron Limited
- Joseph Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for supercritical carbon dioxide processing of fluoro-carbon...
- Patent number 7,307,019
- Issue date Dec 11, 2007
- Tokyo Electron Limited
- Kohei Kawamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for processing a substrate using supercritical ca...
- Patent number 7,250,374
- Issue date Jul 31, 2007
- Tokyo Electron Limited
- Glenn Gale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Redistribution of copper deposited films
- Patent number 6,730,605
- Issue date May 4, 2004
- Tokyo Electron Limited
- Chantal Arena-Foster
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of passivating and stabilizing a Ti-PECVD process chamber an...
- Patent number 6,635,569
- Issue date Oct 21, 2003
- Tokyo Electron Limited
- Michael S. Ameen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for enhancing the adhesion of a barrier layer to a dielectric
- Patent number 6,632,737
- Issue date Oct 14, 2003
- Tokyo Electron Limited
- Joseph T. Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for stabilizing the internal surface of a PECVD process chamber
- Patent number 6,626,186
- Issue date Sep 30, 2003
- Tokyo Electron Limited
- Joseph Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing conformal nitrified tantalum silicide films b...
- Patent number 6,586,330
- Issue date Jul 1, 2003
- Tokyo Electron Limited
- Audunn Ludviksson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for incorporating silicon into CVD metal films
- Patent number 6,562,708
- Issue date May 13, 2003
- Tokyo Electron Limited
- Joseph T. Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for delivery of precursor vapor from low vapor...
- Patent number 6,548,112
- Issue date Apr 15, 2003
- Tokyo Electron Limited
- Joseph T. Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Optimized liners for dual damascene metal wiring
- Patent number 6,508,919
- Issue date Jan 21, 2003
- Tokyo Electron Limited
- Thomas J. Licata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improving the adhesion and durability of CVD tantalum an...
- Patent number 6,500,761
- Issue date Dec 31, 2002
- Tokyo Electron Limited
- Cory Wajda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for pretreating dielectric layers to enhance the adhesion of...
- Patent number 6,482,477
- Issue date Nov 19, 2002
- Tokyo Electron Limited
- Richard C. Westhoff
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precursor deposition using ultrasonic nebulizer
- Patent number 6,471,782
- Issue date Oct 29, 2002
- Tokyo Electronic Limited
- Ching-Ping Fang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for improving the adhesion of sputtered copper films to CVD...
- Patent number 6,455,414
- Issue date Sep 24, 2002
- Tokyo Electron Limited
- Joseph T. Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing system and method for chemical vapor deposition of a met...
- Patent number 6,409,837
- Issue date Jun 25, 2002
- Tokyo Electron Limited
- Joseph T. Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for preventing the premature mixture of reacta...
- Patent number 6,368,987
- Issue date Apr 9, 2002
- Tokyo Electron Limited
- Stanislaw Kopacz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for electrically isolating an electrode in a P...
- Patent number 6,302,057
- Issue date Oct 16, 2001
- Tokyo Electron Limited
- Gerrit J. Leusink
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for single chamber processing of PECVD-Ti and CVD-TiN films...
- Patent number 6,274,496
- Issue date Aug 14, 2001
- Tokyo Electron Limited
- Gerrit J. Leusink
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature plasma-enhanced formation of integrated circuits
- Patent number 6,221,770
- Issue date Apr 24, 2001
- Tokyo Electron Limited
- Joseph T. Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for producing thin films by low temperature plasma-enhanc...
- Patent number 6,220,202
- Issue date Apr 24, 2001
- Tokyo Electron Limited
- Robert F. Foster
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Buffer chamber for integrating physical and chemical vapor depositi...
- Patent number 6,183,564
- Issue date Feb 6, 2001
- Tokyo Electron Limited
- Glyn J. Reynolds
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for preventing the premature mixture of reacta...
- Patent number 6,161,500
- Issue date Dec 19, 2000
- Tokyo Electron Limited
- Stanislaw Kopacz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for preparing and metallizing high aspect ratio silicon s...
- Patent number 6,143,128
- Issue date Nov 7, 2000
- Tokyo Electron Limited
- Michael S. Ameen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for low temperature deposition of CVD and PECV...
- Patent number 6,140,215
- Issue date Oct 31, 2000
- Tokyo Electron Limited
- Robert F. Foster
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of improving surface morphology and reducing resistivity of...
- Patent number 6,121,140
- Issue date Sep 19, 2000
- Tokyo Electron Limited
- Chantal Arena
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Elimination of titanium nitride film deposition in tungsten plug te...
- Patent number 6,093,645
- Issue date Jul 25, 2000
- Tokyo Electron Limited
- Michael S. Ameen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of eliminating edge effect in chemical vapor deposition of a...
- Patent number 6,090,705
- Issue date Jul 18, 2000
- Tokyo Electron Limited
- Chantal Arena
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of titanium nitride contact plug formation
- Patent number 6,037,252
- Issue date Mar 14, 2000
- Tokyo Electron Limited
- Joseph T. Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PHASE CHANGE BASED HEATING ELEMENT SYSTEM AND METHOD
- Publication number 20100000681
- Publication date Jan 7, 2010
- SUPERCRITICAL SYSTEMS, INC.
- Ronald T. Bertram
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IN-LINE METROLOGY FOR SUPERCRITICAL FLUID PROCESSING
- Publication number 20070012337
- Publication date Jan 18, 2007
- TOKYO ELECTRON LIMITED
- Joseph T. Hillman
- B08 - CLEANING
Information Patent Application
Phase change based heating element system and method
- Publication number 20060226117
- Publication date Oct 12, 2006
- Ronald T. Bertram
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of inhibiting copper corrosion during supercritical CO2 clea...
- Publication number 20060228874
- Publication date Oct 12, 2006
- Joseph Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Removal of porogens and porogen residues using supercritical CO2
- Publication number 20060223899
- Publication date Oct 5, 2006
- Joseph T. Hillman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Rinsing step in supercritical processing
- Publication number 20060185694
- Publication date Aug 24, 2006
- Richard Brown
- B08 - CLEANING
Information Patent Application
Cleaning step in supercritical processing
- Publication number 20060185693
- Publication date Aug 24, 2006
- Richard Brown
- B08 - CLEANING
Information Patent Application
METHOD FOR TREATING A SUBSTRATE WITH A HIGH PRESSURE FLUID USING A...
- Publication number 20060102590
- Publication date May 18, 2006
- TOKYO ELECTRON LIMITED
- Robert Kevwitch
- B08 - CLEANING
Information Patent Application
A METHOD FOR SUPERCRITICAL CARBON DIOXIDE PROCESSING OF FLUORO-CARB...
- Publication number 20060068583
- Publication date Mar 30, 2006
- TOKYO ELECTRON LIMITED
- Kohei Kawamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for processing a substrate using supercritical ca...
- Publication number 20060003592
- Publication date Jan 5, 2006
- TOKYO ELECTRON LIMITED
- Glenn Gale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Alignment means for chamber closure to reduce wear on surfaces
- Publication number 20050034660
- Publication date Feb 17, 2005
- Supercritical Systems, Inc.
- Joseph Hillman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum chuck apparatus and method for holding a wafer during high p...
- Publication number 20050035514
- Publication date Feb 17, 2005
- Supercritical Systems, Inc.
- Joseph Hillman
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
Decontamination of supercritical wafer processing equipment
- Publication number 20040231707
- Publication date Nov 25, 2004
- Paul Schilling
- B08 - CLEANING
Information Patent Application
Method and apparatus of utilizing a coating for enhanced holding of...
- Publication number 20040154647
- Publication date Aug 12, 2004
- Supercritical Systems, Inc.
- Alexei Sheydayi
- B08 - CLEANING
Information Patent Application
Method and apparatus for controlling the movement of CVD reaction b...
- Publication number 20030230322
- Publication date Dec 18, 2003
- Tokyo Electron Limited of TBS Broadcast Center
- Joseph T. Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for depositing tantalum silicide films by thermal chemical v...
- Publication number 20030211736
- Publication date Nov 13, 2003
- TOKYO ELECTRON LIMITED
- Audunn Ludviksson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Redistribution of copper deposited films
- Publication number 20020148720
- Publication date Oct 17, 2002
- TOKYO ELECTRON LIMITED
- Chantal Arena-Foster
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for depositing copper films having controlled morphology and...
- Publication number 20020137338
- Publication date Sep 26, 2002
- TOKYO ELECTRON LIMITED
- Tugrul Yasar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Joseph T. Hillman

Person

Patents Grantslast 30 patents

Method and apparatus for controlling the movement of CVD reaction b...

Method of inhibiting copper corrosion during supercritical CO2 clea...

Method for supercritical carbon dioxide processing of fluoro-carbon...

System and method for processing a substrate using supercritical ca...

Redistribution of copper deposited films

Method of passivating and stabilizing a Ti-PECVD process chamber an...

Method for enhancing the adhesion of a barrier layer to a dielectric

Method for stabilizing the internal surface of a PECVD process chamber

Method for depositing conformal nitrified tantalum silicide films b...

Method for incorporating silicon into CVD metal films

Apparatus and method for delivery of precursor vapor from low vapor...

Optimized liners for dual damascene metal wiring

Method for improving the adhesion and durability of CVD tantalum an...

Method for pretreating dielectric layers to enhance the adhesion of...

Precursor deposition using ultrasonic nebulizer

Method for improving the adhesion of sputtered copper films to CVD...

Processing system and method for chemical vapor deposition of a met...

Apparatus and method for preventing the premature mixture of reacta...

Apparatus and method for electrically isolating an electrode in a P...

Method for single chamber processing of PECVD-Ti and CVD-TiN films...

Low temperature plasma-enhanced formation of integrated circuits

Apparatus for producing thin films by low temperature plasma-enhanc...

Buffer chamber for integrating physical and chemical vapor depositi...

Apparatus and method for preventing the premature mixture of reacta...

Apparatus for preparing and metallizing high aspect ratio silicon s...

Method and apparatus for low temperature deposition of CVD and PECV...

Method of improving surface morphology and reducing resistivity of...

Elimination of titanium nitride film deposition in tungsten plug te...

Method of eliminating edge effect in chemical vapor deposition of a...

Method of titanium nitride contact plug formation

Patents Applicationslast 30 patents

PHASE CHANGE BASED HEATING ELEMENT SYSTEM AND METHOD

IN-LINE METROLOGY FOR SUPERCRITICAL FLUID PROCESSING

Phase change based heating element system and method

Method of inhibiting copper corrosion during supercritical CO2 clea...

Removal of porogens and porogen residues using supercritical CO2

Rinsing step in supercritical processing

Cleaning step in supercritical processing

METHOD FOR TREATING A SUBSTRATE WITH A HIGH PRESSURE FLUID USING A...

A METHOD FOR SUPERCRITICAL CARBON DIOXIDE PROCESSING OF FLUORO-CARB...

System and method for processing a substrate using supercritical ca...

Alignment means for chamber closure to reduce wear on surfaces

Vacuum chuck apparatus and method for holding a wafer during high p...

Decontamination of supercritical wafer processing equipment

Method and apparatus of utilizing a coating for enhanced holding of...

Method and apparatus for controlling the movement of CVD reaction b...

Method for depositing tantalum silicide films by thermal chemical v...

Redistribution of copper deposited films

Method for depositing copper films having controlled morphology and...