Josephus Jacobus Smits

Person

Geldrop, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Ex-situ removal of deposition on an optical element
- Patent number 8,598,550
- Issue date Dec 3, 2013
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,289,498
- Issue date Oct 16, 2012
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ex-situ removal of deposition on an optical element
- Patent number 8,134,136
- Issue date Mar 13, 2012
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B08 - CLEANING
Information Patent Grant
Ex-situ removal of deposition on an optical element
- Patent number 7,767,989
- Issue date Aug 3, 2010
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B08 - CLEANING
Information Patent Grant
Lithographic apparatus, contaminant trap, and device manufacturing...
- Patent number 7,612,353
- Issue date Nov 3, 2009
- ASML Netherlands B.V.
- Leonid Aizikovitch Sjmaenok
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus, contaminant trap, and device manufacturing...
- Patent number 7,397,056
- Issue date Jul 8, 2008
- ASML Netherlands B.V.
- Leonid Aizikovitch Sjmaenok
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ex-situ removal of deposition on an optical element
- Patent number 7,372,058
- Issue date May 13, 2008
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B08 - CLEANING
Information Patent Grant
Lithographic apparatus, device manufacturing method, and device man...
- Patent number 7,116,399
- Issue date Oct 3, 2006
- ASML Netherlands B.V.
- Wilhelmus Josephus Box
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 6,750,949
- Issue date Jun 15, 2004
- AMSL Netherlands B.V.
- Erik Roelof Loopstra
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT
- Publication number 20120140196
- Publication date Jun 7, 2012
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- B08 - CLEANING
Information Patent Application
EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT
- Publication number 20100290015
- Publication date Nov 18, 2010
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- B08 - CLEANING
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20100002207
- Publication date Jan 7, 2010
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ex-situ removal of deposition on an optical element
- Publication number 20070069160
- Publication date Mar 29, 2007
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- B08 - CLEANING
Information Patent Application
Ex-situ removal of deposition on an optical element
- Publication number 20070069162
- Publication date Mar 29, 2007
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- B08 - CLEANING
Information Patent Application
Lithographic apparatus, contaminant trap, and device manufacturing...
- Publication number 20070023706
- Publication date Feb 1, 2007
- ASML NETHERLANDS B.V.
- Leonid Aizikovitch Sjmaenok
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic apparatus, contaminant trap, and device manufacturing...
- Publication number 20070018118
- Publication date Jan 25, 2007
- ASML NETHERLANDS B.V.
- Leonid Aizikovitch Sjmaenok
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20050018154
- Publication date Jan 27, 2005
- ASML NETHERLANDS B.V.
- Wilhelmus Josephus Box
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20030058422
- Publication date Mar 27, 2003
- Erik Roelof Loopstra
- G02 - OPTICS

Josephus Jacobus Smits

Person

Patents Grantslast 30 patents

Ex-situ removal of deposition on an optical element

Lithographic apparatus and device manufacturing method

Ex-situ removal of deposition on an optical element

Ex-situ removal of deposition on an optical element

Lithographic apparatus, contaminant trap, and device manufacturing...

Lithographic apparatus, contaminant trap, and device manufacturing...

Ex-situ removal of deposition on an optical element

Lithographic apparatus, device manufacturing method, and device man...

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT

EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Ex-situ removal of deposition on an optical element

Ex-situ removal of deposition on an optical element

Lithographic apparatus, contaminant trap, and device manufacturing...

Lithographic apparatus, contaminant trap, and device manufacturing...

Lithographic apparatus, device manufacturing method, and device man...

Lithographic apparatus and device manufacturing method