Joshua LaRose

Person

Albany, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Hybrid corrective processing system and method
- Patent number 10,971,411
- Issue date Apr 6, 2021
- TEL Epion Inc.
- Joshua LaRose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for high throughput using beam scan size and beam position i...
- Patent number 10,256,095
- Issue date Apr 9, 2019
- TEL Epion Inc.
- Soo Doo Chae
- G05 - CONTROLLING REGULATING
Information Patent Grant
Hybrid corrective processing system and method
- Patent number 10,096,527
- Issue date Oct 9, 2018
- TEL Epion Inc.
- Joshua LaRose
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method of surface profile correction using gas cluster ion beam
- Patent number 9,875,947
- Issue date Jan 23, 2018
- TEL Epion Inc.
- Noel Russell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-step location specific process for substrate edge profile cor...
- Patent number 9,502,209
- Issue date Nov 22, 2016
- TEL Epion Inc.
- Hongyu H. Yue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for implementing predicted systematic error c...
- Patent number 9,123,505
- Issue date Sep 1, 2015
- TEL Epion Inc.
- Vincent Lagana-Gizzo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-step location specific process for substrate edge profile cor...
- Patent number 9,105,443
- Issue date Aug 11, 2015
- TEL Epion Inc.
- Hongyu H. Yue
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HYBRID CORRECTIVE PROCESSING SYSTEM AND METHOD
- Publication number 20190043766
- Publication date Feb 7, 2019
- TEL Epion Inc.
- Joshua LaRose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR HIGH THROUGHPUT USING BEAM SCAN SIZE AND BEAM POSITION I...
- Publication number 20170077001
- Publication date Mar 16, 2017
- TEL Epion Inc.
- Soo Doo Chae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID CORRECTIVE PROCESSING SYSTEM AND METHOD
- Publication number 20170053843
- Publication date Feb 23, 2017
- TEL Epion Inc.
- Joshua LaRose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SURFACE PROFILE CORRECTION USING GAS CLUSTER ION BEAM
- Publication number 20160322266
- Publication date Nov 3, 2016
- TEL Epion Inc.
- Noel Russell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP LOCATION SPECIFIC PROCESS FOR SUBSTRATE EDGE PROFILE COR...
- Publication number 20150348746
- Publication date Dec 3, 2015
- TEL Epion Inc.
- Hongyu H. Yue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR IMPLEMENTING PREDICTED SYSTEMATIC ERROR C...
- Publication number 20150243476
- Publication date Aug 27, 2015
- TEL Epion Inc.
- Vincent Lagana-Gizzo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP LOCATION SPECIFIC PROCESS FOR SUBSTRATE EDGE PROFILE COR...
- Publication number 20150137006
- Publication date May 21, 2015
- TEL Epion Inc.
- Hongyu H. Yue
- H01 - BASIC ELECTRIC ELEMENTS

Joshua LaRose

Person

Patents Grantslast 30 patents

Hybrid corrective processing system and method

Method for high throughput using beam scan size and beam position i...

Hybrid corrective processing system and method

Method of surface profile correction using gas cluster ion beam

Multi-step location specific process for substrate edge profile cor...

Apparatus and methods for implementing predicted systematic error c...

Multi-step location specific process for substrate edge profile cor...

Patents Applicationslast 30 patents

HYBRID CORRECTIVE PROCESSING SYSTEM AND METHOD

METHOD FOR HIGH THROUGHPUT USING BEAM SCAN SIZE AND BEAM POSITION I...

HYBRID CORRECTIVE PROCESSING SYSTEM AND METHOD

METHOD OF SURFACE PROFILE CORRECTION USING GAS CLUSTER ION BEAM

MULTI-STEP LOCATION SPECIFIC PROCESS FOR SUBSTRATE EDGE PROFILE COR...

APPARATUS AND METHODS FOR IMPLEMENTING PREDICTED SYSTEMATIC ERROR C...

MULTI-STEP LOCATION SPECIFIC PROCESS FOR SUBSTRATE EDGE PROFILE COR...