Joshua Mark Lukens

Person

San Diego, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Target material control in an EUV light source
- Patent number 11,963,285
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Abhiram Lakshmi Ganesh Govindaraju
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method for extending target material delivery system...
- Patent number 11,690,159
- Issue date Jun 27, 2023
- ASML Netherlands B.V.
- Bob Rollinger
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus for and method of controlling coalescence of droplets in...
- Patent number 11,240,904
- Issue date Feb 1, 2022
- ASML Netherlands B.V.
- Joshua Mark Lukens
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR AND METHOD OF ACCELERATING DROPLETS IN A DROPLET GENE...
- Publication number 20230164900
- Publication date May 25, 2023
- ASML NETHERLANDS B.V.
- Alexander Igorevich Ershov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS FOR AND METHOD OF MONITORING DROPLETS IN A DROPLET STREAM
- Publication number 20230028848
- Publication date Jan 26, 2023
- ASML NETHERLANDS B.V.
- Joshua Mark Lukens
- G01 - MEASURING TESTING
Information Patent Application
SOURCE MATERIAL DELIVERY SYSTEM, EUV RADIATION SYSTEM, LITHOGRAPHIC...
- Publication number 20230010985
- Publication date Jan 12, 2023
- ASML NETHERLANDS B.V.
- Pooriya Beyhaghi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
NOZZLE APPARATUS
- Publication number 20220295625
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Georgiy Olegovich Vaschenko
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TARGET MATERIAL CONTROL IN AN EUV LIGHT SOURCE
- Publication number 20220159817
- Publication date May 19, 2022
- ASML NETHERLANDS B.V.
- Abhiram Lakshmi Ganesh Govindaraju
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR EXTENDING TARGET MATERIAL DELIVERY SYSTEM...
- Publication number 20210392733
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Bob Rollinger
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS FOR AND METHOD OF CONTROLLING COALESCENCE OF DROPLETS IN...
- Publication number 20200344867
- Publication date Oct 29, 2020
- ASML NETHERLANDS B.V.
- Joshua Mark Lukens
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Joshua Mark Lukens

Person

Patents Grantslast 30 patents

Target material control in an EUV light source

Apparatus and method for extending target material delivery system...

Apparatus for and method of controlling coalescence of droplets in...

Patents Applicationslast 30 patents

APPARATUS FOR AND METHOD OF ACCELERATING DROPLETS IN A DROPLET GENE...

APPARATUS FOR AND METHOD OF MONITORING DROPLETS IN A DROPLET STREAM

SOURCE MATERIAL DELIVERY SYSTEM, EUV RADIATION SYSTEM, LITHOGRAPHIC...

NOZZLE APPARATUS

TARGET MATERIAL CONTROL IN AN EUV LIGHT SOURCE

APPARATUS AND METHOD FOR EXTENDING TARGET MATERIAL DELIVERY SYSTEM...

APPARATUS FOR AND METHOD OF CONTROLLING COALESCENCE OF DROPLETS IN...