Joy Cheng

Person

Taipei City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 12,360,456
- Issue date Jul 15, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., TLD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 12,253,800
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal-compound-removing solvent and method in lithography
- Patent number 12,210,286
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet photolithography method with developer composition
- Patent number 12,181,798
- Issue date Dec 31, 2024
- TAIWAIN SEMICONDUCTOR MANUFACTURING CO., LTD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet photolithography method with developer composition
- Patent number 11,822,238
- Issue date Nov 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal-compound-removing solvent and method in lithography
- Patent number 11,681,226
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Humidity control in EUV lithography
- Patent number 11,307,504
- Issue date Apr 19, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist developer and method of developing photoresist
- Patent number 11,300,878
- Issue date Apr 12, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor method of protecting wafer from bevel contamination
- Patent number 11,137,685
- Issue date Oct 5, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 11,054,742
- Issue date Jul 6, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of reducing pattern roughness in semiconductor fabrication
- Patent number 10,872,773
- Issue date Dec 22, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet photolithography method with developer composition
- Patent number 10,866,511
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal-compound-removing solvent and method in lithography
- Patent number 10,866,516
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for performing a photolithography process
- Patent number 10,796,910
- Issue date Oct 6, 2020
- Taiwan Semicondutor Manufacturing Co., Ltd.
- Tsung-Han Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material composition and methods thereof
- Patent number 10,741,410
- Issue date Aug 11, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor method of protecting wafer from bevel contamination
- Patent number 10,635,000
- Issue date Apr 28, 2020
- TAIWAIN SEMICONDUCTOR MANUFACTURING CO., LTD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal-compound-removing solvent and method in lithography
- Patent number 10,622,211
- Issue date Apr 14, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method for performing a photolithography process
- Patent number 10,573,519
- Issue date Feb 25, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsung-Han Ko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of reducing pattern roughness in semiconductor fabrication
- Patent number 10,515,812
- Issue date Dec 24, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for integrated circuit manufacturing with directed self-asse...
- Patent number 10,418,245
- Issue date Sep 17, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Jie Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Humidity control in EUV lithography
- Patent number 10,274,847
- Issue date Apr 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Directed self-assembly
- Patent number 10,081,740
- Issue date Sep 25, 2018
- International Business Machines Corporation
- Joy Cheng
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Semiconductor method of protecting wafer from bevel contamination
- Patent number 10,073,347
- Issue date Sep 11, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Additives for orientation control of block copolymers
- Patent number 10,066,040
- Issue date Sep 4, 2018
- International Business Machines Corporation
- Joy Cheng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Fluoro-alcohol additives for orientation control of block copolymers
- Patent number 10,040,879
- Issue date Aug 7, 2018
- International Business Machines Corporation
- Joy Cheng
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern decomposition method for wiring patterns with chemoepitaxy...
- Patent number 10,037,398
- Issue date Jul 31, 2018
- International Business Machines Corporation
- Markus Brink
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Directed self-assembly
- Patent number 9,884,978
- Issue date Feb 6, 2018
- International Business Machines Corporation
- Joy Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Block copolymers for directed self-assembly applications
- Patent number 9,879,152
- Issue date Jan 30, 2018
- International Business Machines Corporation
- Noel Arellano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
FinFET structures and methods of forming the same
- Patent number 9,812,358
- Issue date Nov 7, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Chun Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of patterning a film layer
- Patent number 9,684,236
- Issue date Jun 20, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ken-Hsien Hsieh
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY
- Publication number 20250172879
- Publication date May 29, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION
- Publication number 20240377731
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV METALLIC RESIST PERFORMANCE ENHANCEMENT VIA ADDITIVES
- Publication number 20240377735
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION
- Publication number 20240045327
- Publication date Feb 8, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Metallic Resist Performance Enhancement Via Additives
- Publication number 20230375924
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metal-Compound-Removing Solvent And Method In Lithography
- Publication number 20230324806
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST
- Publication number 20220244639
- Publication date Aug 4, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV Metallic Resist Performance Enhancement Via Additives
- Publication number 20210325782
- Publication date Oct 21, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metal-Compound-Removing Solvent and Method in Lithography
- Publication number 20210103220
- Publication date Apr 8, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme Ultraviolet Photolithography Method With Developer Composition
- Publication number 20210103213
- Publication date Apr 8, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Humidity Control in EUV Lithography
- Publication number 20200319565
- Publication date Oct 8, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Method of Protecting Wafer from Bevel Contamination
- Publication number 20200257203
- Publication date Aug 13, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Reducing Pattern Roughness in Semiconductor Fabrication
- Publication number 20200152468
- Publication date May 14, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Chien-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PERFORMING A PHOTOLITHOGRAPHY PROCESS
- Publication number 20200135452
- Publication date Apr 30, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Han KO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV METALLIC RESIST PERFORMANCE ENHANCEMENT VIA ADDITIVES
- Publication number 20190384173
- Publication date Dec 19, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND A COATING MATERIAL
- Publication number 20190164746
- Publication date May 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Ling Chang CHIEN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST
- Publication number 20190146337
- Publication date May 16, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20190146342
- Publication date May 16, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Humidity Control in EUV Lithography
- Publication number 20190094716
- Publication date Mar 28, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HUMIDITY CONTROL IN EUV LITHOGRAPHY
- Publication number 20190086818
- Publication date Mar 21, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PERFORMING A PHOTOLITHOGRAPHY PROCESS
- Publication number 20190080901
- Publication date Mar 14, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Han KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Method of Protecting Wafer from Bevel Contamination
- Publication number 20190064669
- Publication date Feb 28, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20190067002
- Publication date Feb 28, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Chung SU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Integrated Circuit Manufacturing with Directed Self-Asse...
- Publication number 20190035630
- Publication date Jan 31, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Jie Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MATERIAL COMPOSITION AND METHODS THEREOF
- Publication number 20180315617
- Publication date Nov 1, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren ZI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Extreme Ultraviolet Photolithography Method With Developer Composition
- Publication number 20180173096
- Publication date Jun 21, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY
- Publication number 20180040474
- Publication date Feb 8, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY
- Publication number 20180039182
- Publication date Feb 8, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
DIRECTED SELF-ASSEMBLY
- Publication number 20180030312
- Publication date Feb 1, 2018
- International Business Machines Corporation
- Joy Cheng
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN DECOMPOSITION METHOD FOR WIRING PATTERNS WITH CHEMOEPITAXY...
- Publication number 20170344691
- Publication date Nov 30, 2017
- International Business Machines Corporation
- Markus Brink
- G06 - COMPUTING CALCULATING COUNTING

Person

Patents Grantslast 30 patents

EUV metallic resist performance enhancement via additives

EUV metallic resist performance enhancement via additives

Metal-compound-removing solvent and method in lithography

Extreme ultraviolet photolithography method with developer composition

Extreme ultraviolet photolithography method with developer composition

Metal-compound-removing solvent and method in lithography

Humidity control in EUV lithography

Photoresist developer and method of developing photoresist

Semiconductor method of protecting wafer from bevel contamination

EUV metallic resist performance enhancement via additives

Methods of reducing pattern roughness in semiconductor fabrication

Extreme ultraviolet photolithography method with developer composition

Metal-compound-removing solvent and method in lithography

Method for performing a photolithography process

Material composition and methods thereof

Semiconductor method of protecting wafer from bevel contamination

Metal-compound-removing solvent and method in lithography

Method for performing a photolithography process

Methods of reducing pattern roughness in semiconductor fabrication

Method for integrated circuit manufacturing with directed self-asse...

Humidity control in EUV lithography

Directed self-assembly

Semiconductor method of protecting wafer from bevel contamination

Additives for orientation control of block copolymers

Fluoro-alcohol additives for orientation control of block copolymers

Pattern decomposition method for wiring patterns with chemoepitaxy...

Directed self-assembly

Block copolymers for directed self-assembly applications

FinFET structures and methods of forming the same

Method of patterning a film layer

Patents Applicationslast 30 patents

METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY

EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION

EUV METALLIC RESIST PERFORMANCE ENHANCEMENT VIA ADDITIVES

EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION

EUV Metallic Resist Performance Enhancement Via Additives

Metal-Compound-Removing Solvent And Method In Lithography

PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST

EUV Metallic Resist Performance Enhancement Via Additives

Metal-Compound-Removing Solvent and Method in Lithography

Extreme Ultraviolet Photolithography Method With Developer Composition

Humidity Control in EUV Lithography

Semiconductor Method of Protecting Wafer from Bevel Contamination

Methods of Reducing Pattern Roughness in Semiconductor Fabrication

METHOD FOR PERFORMING A PHOTOLITHOGRAPHY PROCESS

EUV METALLIC RESIST PERFORMANCE ENHANCEMENT VIA ADDITIVES

METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND A COATING MATERIAL

PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

Humidity Control in EUV Lithography

HUMIDITY CONTROL IN EUV LITHOGRAPHY

METHOD FOR PERFORMING A PHOTOLITHOGRAPHY PROCESS

Semiconductor Method of Protecting Wafer from Bevel Contamination

METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE

Method for Integrated Circuit Manufacturing with Directed Self-Asse...

MATERIAL COMPOSITION AND METHODS THEREOF

Extreme Ultraviolet Photolithography Method With Developer Composition

METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY

METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY

DIRECTED SELF-ASSEMBLY

PATTERN DECOMPOSITION METHOD FOR WIRING PATTERNS WITH CHEMOEPITAXY...