Joyce S. Oey Hewett

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for integrating multiple process controllers
- Patent number 6,801,817
- Issue date Oct 5, 2004
- Advanced Micro Devices, Inc.
- Christopher A. Bode
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Automated variation of stepper exposure dose based upon across wafe...
- Patent number 6,784,001
- Issue date Aug 31, 2004
- Advanced Micro Devices, Inc.
- Joyce S. Oey Hewett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling the duration of an endpoint polishing process...
- Patent number 6,746,958
- Issue date Jun 8, 2004
- Advanced Micro Devices, Inc.
- Joyce S. Oey Hewett
- B24 - GRINDING POLISHING
Information Patent Grant
Method for prioritizing production lots based on grade estimates an...
- Patent number 6,699,727
- Issue date Mar 2, 2004
- Advanced Micro Devices Inc.
- Anthony J. Toprac
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Methods of characterizing device performance based upon the duratio...
- Patent number 6,664,013
- Issue date Dec 16, 2003
- Advanced Micro Devices, Inc.
- Joyce S. Oey Hewett
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated method of controlling critical dimensions of features by...
- Patent number 6,632,692
- Issue date Oct 14, 2003
- Advanced Micro Devices, Inc.
- Joyce S. Oey Hewett
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling chemical mechanical polishing operations to c...
- Patent number 6,595,830
- Issue date Jul 22, 2003
- Advanced Micro Devices, Inc.
- Joyce S. Oey Hewett
- B24 - GRINDING POLISHING
Information Patent Grant
Use of endpoint system to match individual processing stations with...
- Patent number 6,588,007
- Issue date Jul 1, 2003
- Advanced Micro Devices, Inc.
- Alexander J. Pasadyn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of varying stepper exposure dose to compensate for across-wa...
- Patent number 6,576,385
- Issue date Jun 10, 2003
- Advanced Micro Devices, Inc.
- Christopher A. Bode
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated method of controlling photoresist develop time to control...
- Patent number 6,569,692
- Issue date May 27, 2003
- Advanced Micro Devices, Inc.
- Christopher A. Bode
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of modeling and controlling the endpoint of chemical mechani...
- Patent number 6,534,328
- Issue date Mar 18, 2003
- Advanced Micro Devices, Inc.
- Joyce S. Oey Hewett
- B24 - GRINDING POLISHING
Information Patent Grant
Automated variation of stepper exposure dose based upon across wafe...
- Patent number 6,365,422
- Issue date Apr 2, 2002
- Advanced Micro Devices, Inc.
- Joyce S. Oey Hewett
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method of varying stepper exposure dose to compensate for across-wa...
- Publication number 20020106821
- Publication date Aug 8, 2002
- Christopher A. Bode
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Joyce S. Oey Hewett

Person

Patents Grantslast 30 patents

Method and apparatus for integrating multiple process controllers

Automated variation of stepper exposure dose based upon across wafe...

Method of controlling the duration of an endpoint polishing process...

Method for prioritizing production lots based on grade estimates an...

Methods of characterizing device performance based upon the duratio...

Automated method of controlling critical dimensions of features by...

Method of controlling chemical mechanical polishing operations to c...

Use of endpoint system to match individual processing stations with...

Method of varying stepper exposure dose to compensate for across-wa...

Automated method of controlling photoresist develop time to control...

Method of modeling and controlling the endpoint of chemical mechani...

Automated variation of stepper exposure dose based upon across wafe...

Patents Applicationslast 30 patents

Method of varying stepper exposure dose to compensate for across-wa...